US4874686A
Expired / Lapsed
US
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Photosensitive lithographic plate necessitating no dampening water
Assignee: Fujifilm Holdings Corp
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Filing: 1989-03-13
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Granted: 1989-10-17
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Expires: 2009-03-13
Abstract
Abstract The present invention relates to a photosensitive lithographic plate necessitating no damping water, which plate has an excellent image reproducibility and stability in the lapse of time. The plate comprises, on a support, a photosensitive layer and a silicone rubber layer in this order, the silicone rubber layer being formed by addition reaction of an SiH group with a --CH═CH- group to cause crosslinking, and the photosensitive layer comprising: (1) a polymer comprising at least a structural formula (I): ##STR1## wherein R represents a hydrogen atom or a methyl group; R 1 , R 2 , R 3 , R 4 and R 5 each represents a member selected from the group consisting of a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, a nitro group, a cyano group, an amido group, an amino group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylamino group, an arylamino group, an alkylsulfonyl group and an arylsulfo group; and Z represents an oxygen atom, a sulfur atom, --NH-, --NR 6 (R 6 represents an alkyl group), --OCH 2 CH 2 O- or --OCH 2 CH(OH)-, and (2) a photopolymerization initiator.
Inventors
- 👤 Yoshihiko Urabe
- 👤 Tatsuji Higashi
- 👤 Hiroshi Takahashi
- 👤 Nobuyuki Kita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 12:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0752; G03F7/038; G03F7/0388
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
185 words
A photosensitive lithographic plate necessitating no dampening water and comprising, on a support, a photosensitive layer and a silicone rubber layer in this order, said rubber layer being formed by addition reaction of SiH group with a --CH═CH-- group to cause crosslinking, characterized in that said photosensitive layer comprises the following components: (1) a polymer comprising at least a structural unit of the following general formula (I): ##STR15## wherein R represents a hydrogen atom or a methyl group; R 1 , R 2 , R 3 , R 4 and R 5 each represents a member selected from the group consisting of a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, a or anitro group, a cyano group, an amido group, an amino group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylamino group, an arylmino group, an alkylsulfonyl group and an arylsulfo group; and Z represents an oxygen atom, a sulfur atom, --NH--, --NR 6 -- (R 6 represents an alkyl group), --OCH 2 CH 2 O-- or --OCH 2 CH(OH)--, and (2) a photopolymerization initiator.
Claim 2
Dependent Claim
185 words
A photosensitive lithographic plate necessitating no dampening water and comprising, on a support, a photosensitive layer and a silicone rubber layer in this order, said rubber layer being formed by addition reaction of SiH group with a --CH═CH-- group to cause crosslinking, characterized in that said photosensitive layer comprises the following components: (1) a polymer comprising at least a structural unit of the following general formula (I): ##STR15## wherein R represents a hydrogen atom or a methyl group; R 1 , R 2 , R 3 , R 4 and R 5 each represents a member selected from the group consisting of a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, a or anitro group, a cyano group, an amido group, an amino group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylamino group, an arylmino group, an alkylsulfonyl group and an arylsulfo group; and Z represents an oxygen atom, a sulfur atom, --NH--, --NR 6 -- (R 6 represents an alkyl group), --OCH 2 CH 2 O-- or --OCH 2 CH(OH)--, and (2) a photopolymerization initiator.
Claim 3
Dependent Claim
139 words
The photosensitive lithographic plate of claim 1, wherein said polymer is produced by copolymerizing (a) a monomer represented by the following formula: ##STR16## wherein R represents a hydrogen atom or a methyl group; R 1 , R 2 , R 3 , R 4 and R 5 each represents a member selected from the group consisting of a hydrogen atom, a halogen atom, a carboxyl group, a sulfo group, a nitro group, a cyano group, an amido group, an amino group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylamino group, an arylamino group, an alkylsulfonyl group and an arylsulfo group; and Z represents an oxygen atom, a sulfur atom, --NH13 , --NR 6 (R 6 represents an alkyl group), --OCH 2 CH 2 O-- or --OCH 2 CH(OH)--, and (b) a copolymerizable monomer.
Claim 4
Dependent Claim
21 words
The photosensitive lithographic plate of claim 2, wherein said monomer (a) is selected from the group consisting of allylacrylate, allymethacryate, ##STR17##
Claim 5
Dependent Claim
50 words
The photosensitive lithographic plate of claim 2, wherein said monomer (b) is selected from the group consisting of acrylic acid, methacrylic acid, itaconic acid, crotonic acid, an alkyl acrylate, an alkyl methacrylate, benzyl methacrylate, 2-hydroxyethyl methacrylate, acrylonitrile, acrylamide, methacryloyloxyethyl phthalate, tetrahydroxyfurfuryl methacrylate, dicyclopentenyloxyethyl methacrylate, N,N'-diethylaminoethyl methacrylate, styrene, vinyltoluene and hydroxystyrene.
Claim 6
Dependent Claim
17 words
The photosensitive lithographic plate of claim 4, wherein said monomer (b) is an unsaturated carboxylic acid monomer.
Claim 7
Dependent Claim
23 words
The photosensitive lithographic plate of claim 1, wherein the amount of said structural unit is 10 to 90 molar % of the polymer.
Claim 8
Dependent Claim
19 words
The photosensitive lithographic plate of claim 6, wherein said amount is 40 to 90 molar % of the polymer.
Claim 9
Dependent Claim
18 words
The photosensitive lithographic plate of claim 1, wherein the molecular weight of said polymer is 10,000 to 500,000.
Claim 10
Dependent Claim
15 words
The photosensitive lithographic plate of claim 8 wherein said molecular weight is 20,000 to 200,000.
Claim 11
Dependent Claim
27 words
The photosensitive lithographic plate of claim 1, wherein said photosensitive layer further comprises (3) a monomer or oligomer having at least one photopolymerizable ethylenically unsaturated double bond.
Claim 12
Dependent Claim
27 words
The photosensitive lithographic plate of claim 1, wherein said photopolymerization initiator (2) is contained in the photosensitive layer in an amount of 0.1 to 20% by weight.
Claim 13
Dependent Claim
27 words
The photosensitive lithographic plate of claim 11, wherein said photopolymerization initiator (2) is contained in the photosensitive layer in an amount of 1 to 10% by weight.
References Cited (Backward Citations)
GB1442374A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-10-16 | 1993-04-17 | 1993-10-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-10-16 | 1997-04-17 | 1997-10-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-10-16 | 2001-04-17 | 2001-10-17 | $7700.00 | Window Closed / Lapsed |