← Back to Patent Explorer
US4871581A Expired / Lapsed US ⏱️ 0.0 years remaining

Carbon deposition by ECR CVD using a catalytic gas

Assignee: Semiconductor Energy Laboratory Co Ltd
•
Filing: 1988-07-08
•
Granted: 1989-10-03
•
Expires: 2008-07-08
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A material consisting mainly of carbon can be formed on a surface by virtue of a microwave energy. A catalyst gas is introduced into a reaction chamber for ECR CVD, along with a carbon compound gas. The catalyst gas consists of a gaseous compound of germanium such as GeH 4 and GeF 4 .

Inventors

  • 👤 Shumpei Yamazaki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 03:57
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/511; C23C16/22; C23C16/26; Y; Y10; Y10T; Y10T428/00; Y10T428/30

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 93 words
A method of depositing a material consisting mainly of carbon comprising the steps of: placing an object for deposition in a reaction chamber; introducing a carbon compound gas into said reaction chamber; and inputting a power to said reaction chamber in order to decompose said carbon compound gas and deposit the carbon product of the decomposition on the surface of said object, wherein a catalytic gas is introduced into said reaction chamber in order to expedite the deposition of said carbon product, said catalytic gas being the halide or the hydride of germanium.
Claim 2
Independent Claim 93 words
A method of depositing a material consisting mainly of carbon comprising the steps of: placing an object for deposition in a reaction chamber; introducing a carbon compound gas into said reaction chamber; and inputting a power to said reaction chamber in order to decompose said carbon compound gas and deposit the carbon product of the decomposition on the surface of said object, wherein a catalytic gas is introduced into said reaction chamber in order to expedite the deposition of said carbon product, said catalytic gas being the halide or the hydride of germanium.
Claim 3
Dependent Claim 12 words
The method of claim 1, wherein said input power is microwave power.
Claim 4
Dependent Claim 17 words
The method of claim 2, wherein the frequency of said microwave is not lower than 500 MHz.
Claim 5
Dependent Claim 28 words
The method of claim 3, wherein said carbon compound gas is diluted with hydrogen or a gaseous oxide or is introduced together with hydrogen or a gaseous oxide.
Claim 6
Dependent Claim 27 words
The method of claim 4, wherein said catalytic gas is diluted with hydrogen or a gaseous oxide or is introduced together with hydrogen or a gaseous oxide.
Claim 7
Dependent Claim 24 words
The method of claim 5, wherein said reaction chamber is subjected to a magnetic field substantially in the propagating direction of said microwave energy.
Claim 8
Dependent Claim 21 words
The method of claim 1, wherein said carbon product is deposited to form a non-fibrous, non-filamentary diamond coating on said object.
Claim 9
Independent Claim 155 words
A method of depositing a material consisting mainly of carbon comprising the steps of: placing an object for deposition in a reaction chamber; introducing a carbon compound gas into said reaction chamber; and inputting a power to said reaction chamber in order to decompose said carbon compound gas and deposit the carbon product of the decomposition on the surface of said object, wherein a catalytic gas is introduced into said reaction chamber in order to expedite the deposition of said carbon product, said input power is microwave power with the frquency of said microwave not being lower than 500 MHz; said carbon compound gas is diluted with hydrogen or a gaseous oxide or is introduced together with hydrogen or a gaseous oxide, said catalytic gas is diluted with hydrogen or a gaseous oxide or is introduced together with hydrogen or a gaseous oxide, and said catalytic gas is the halide or the hydride of germanium.
Claim 10
Independent Claim 155 words
A method of depositing a material consisting mainly of carbon comprising the steps of: placing an object for deposition in a reaction chamber; introducing a carbon compound gas into said reaction chamber; and inputting a power to said reaction chamber in order to decompose said carbon compound gas and deposit the carbon product of the decomposition on the surface of said object, wherein a catalytic gas is introduced into said reaction chamber in order to expedite the deposition of said carbon product, said input power is microwave power with the frquency of said microwave not being lower than 500 MHz; said carbon compound gas is diluted with hydrogen or a gaseous oxide or is introduced together with hydrogen or a gaseous oxide, said catalytic gas is diluted with hydrogen or a gaseous oxide or is introduced together with hydrogen or a gaseous oxide, and said catalytic gas is the halide or the hydride of germanium.

References Cited (Backward Citations)

US4434188A Cited
JPS5918197A Cited
JPS60103099A Cited
JPS61132507A Cited
JPS61151095A Cited
JPS61266618A Cited
JPH06136200A Cited
JPH06296397A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-10-02 1993-04-03 1993-10-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-10-02 1997-04-03 1997-10-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-10-02 2001-04-03 2001-10-03 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag