Hollow cathode gun and deposition device for ion plating process

Claim 2

A hollow cathode gun for ion plating provided with a hollow cathode applied for deposition and ionization of a substance to be deposited by ion plating through the HCD process, characterized in that said hollow cathode consists of an outer layer made from graphite and an inner layer comprising a material selected from the group consisting of Ta, W and LaB 6 , wherein a part or the whole of said inner layer is in the form of a wire.

Claim 3

A deposition device for ion plating through the HCD process comprising at least one crucible arranged to carry a substance to a deposited, at least on e hollow cathode for generation of plasma and a substrate and a vacuum chamber surrounding them, characterized in that said hollow cathode comprises an outer layer made of graphite, an inner layer concentrically arranged inside said outer layer and spaced therefrom, said inner layer comprising a material selected from the group consisting of Ta, W and LaB 6 wherein a part or the whole of said inner layer is in the form of a wire, a focusing coil surrounding the outer periphery of the outer layer and arranged so as to guide the emission of the plasma beam along an inclined and downward direction with respect to the substance housed in said crucible, and another focusing coil arranged for deflecting the emitted plasma beam in a direction normal to the surface of said substance housed in said crucible, said other focusing coil being arranged in surrounding relationship to the outer periphery of said crucible, and a beam wobbling magnetic field generator arranged in the vicinity of the crucible and controlled to wobble the deflected beam on the surface of the substance housed in the crucible to thereby eliminate obstructions between said substance and said substrate, wherein said focusing coil surrounding the outer periphery of the crucible surrounds the path of movement of the vapor of the substance and extends in a range extending from the crucible to a location near the substrate.

Claim 4

A deposition device for ion plating through the HCD process comprising at least one crucible arranged to carry a substance to a deposited, at least on e hollow cathode for generation of plasma and a substrate and a vacuum chamber surrounding them, characterized in that said hollow cathode comprises an outer layer made of graphite, an inner layer concentrically arranged inside said outer layer and spaced therefrom, said inner layer comprising a material selected from the group consisting of Ta, W and LaB 6 wherein a part or the whole of said inner layer is in the form of a wire, a focusing coil surrounding the outer periphery of the outer layer and arranged so as to guide the emission of the plasma beam along an inclined and downward direction with respect to the substance housed in said crucible, and another focusing coil arranged for deflecting the emitted plasma beam in a direction normal to the surface of said substance housed in said crucible, said other focusing coil being arranged in surrounding relationship to the outer periphery of said crucible, and a beam wobbling magnetic field generator arranged in the vicinity of the crucible and controlled to wobble the deflected beam on the surface of the substance housed in the crucible to thereby eliminate obstructions between said substance and said substrate, wherein said focusing coil surrounding the outer periphery of the crucible surrounds the path of movement of the vapor of the substance and extends in a range extending from the crucible to a location near the substrate.

Claim 5

The deposition device according to claim 2, wherein said focusing coil surrounding the outer periphery of said crucible has a diameter which gradually increases from the crucible toward the substrate so as to surround the path of movement of the vapor of the substance and extends in a range from the crucible to a location near the substrate.

Claim 6

The deposition device according to claim 2, wherein said substance is contained in at least two crucibles and at least on focusing coil is further arranged to surround the outer peripheries of the focusing coils surrounding each of said least two crucibles.

Claim 7

The deposition device according to claim 2, wherein said focusing coil is rectangular, ellipsoidal or peanut-like shaped.

Claim 8

The deposition device according to claim 2, wherein said hollow cathode includes an inlet for reaction gas and wherein said inlet is provided with a voltage applicable tube extending from said inlet and extending into the inside of said vacuum chamber.

Claim 9

The deposition device according to claim 2, wherein means are provided for forming a beam of hollow cathode discharge diffused in the form of a sheet, and wherein said beam is protruded into said vacuum chamber for promoting ionization of reaction gas.