US4849079A
Expired / Lapsed
US
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Process for preparing low electrical contact resistance composition
Assignee: International Business Machines Corp
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Filing: 1988-04-26
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Granted: 1989-07-18
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Expires: 2008-04-26
Abstract
Abstract A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an M x G 100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substances coated with the composition and process for depositing the composition on substrates.
Inventors
- 👤 Jerome J. Cuomo
- 👤 Eric P. Dibble
- 👤 Solomon L. Levine
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 13:58
CPC Classifications
H; H01; H01H; H01H1/00; H01H1/02; H01H1/021; H01H1/023; C; C23; C23C; C23C14/00; C23C14/06; C23C14/0688; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
131 words
A process for depositing a layer containing particles of a metal G in a matrix of a metallic compound represented by the formula MT onto a substrate which comprises: providing a substrate; providing a target source of M x G 100-x separate from said substrate; subjecting said target source to reactive sputtering with a gas containing a source of N, C, or mixtures thereof and flowing in the direction towards the substrate to thereby deposit said layer on said substrate wherein; M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof; T is selected from the group of N, C, and mixtures thereof; G is a metal selected from the group of gold, platinum, and palladium; X is an integer from about 65 to about 95.
Claim 2
Dependent Claim
131 words
A process for depositing a layer containing particles of a metal G in a matrix of a metallic compound represented by the formula MT onto a substrate which comprises: providing a substrate; providing a target source of M x G 100-x separate from said substrate; subjecting said target source to reactive sputtering with a gas containing a source of N, C, or mixtures thereof and flowing in the direction towards the substrate to thereby deposit said layer on said substrate wherein; M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof; T is selected from the group of N, C, and mixtures thereof; G is a metal selected from the group of gold, platinum, and palladium; X is an integer from about 65 to about 95.
Claim 3
Dependent Claim
13 words
The process of claim 1 wherein said gas includes an inert ionizable gas.
Claim 4
Dependent Claim
14 words
The process of claim 2 wherein said inert ionizable gas includes krypton or argon.
Claim 5
Dependent Claim
12 words
The process of claim 2 wherein said inert ionizable gas includes krpton.
Claim 6
Dependent Claim
11 words
The process of claim 2 wherein said gas further includes nitrogen.
Claim 7
Dependent Claim
18 words
The process of claim 5 wherein said gas contains about 10% to about 85% by volume of nitrogen.
Claim 8
Dependent Claim
18 words
The process of claim 5 wherein said gas contains about 10% to about 40% by volume of nitrogen.
Claim 9
Dependent Claim
15 words
The process of claim 1 wherein said layer is about 100 to 10,000 angstroms thick.
Claim 10
Dependent Claim
15 words
The process of claim 1 wherein said layer is about 5,000 to 10,000 angstroms thick.
Claim 11
Dependent Claim
21 words
The process of claim 1 wherein said substrate is selected from the group of silicon, polycrystalline silicon, sapphire, copper, and beryllium-copper.
Claim 12
Dependent Claim
10 words
The process of claim 1 wherein said substrate is beryllium-copper.
Claim 13
Dependent Claim
21 words
The process of claim 1 wherein said target source is selected from the group of zirconium-palladium, titanium-gold, zirconium-gold, hafnium-gold, and titanium-platinum.
Claim 14
Dependent Claim
11 words
The process of claim 1 wherein said layer contains a nitride.
Claim 15
Dependent Claim
11 words
The process of claim 1 wherein said target source is titanium-gold.
Claim 16
Dependent Claim
11 words
The process of claim 1 wherein said target source is zirconium-palladium.
Claim 17
Dependent Claim
12 words
The process of claim 1 wherein said layer contains titanium-nitride and gold.
Claim 18
Dependent Claim
12 words
The process of claim 1 wherein said layer contains zirconium-nitride and palladium.
Claim 19
Dependent Claim
13 words
The process of claim 1 wherein x is about 70 to about 80.
Claim 20
Dependent Claim
10 words
The process of claim 1 wherein x is about 75.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-07-17 | 1993-01-16 | 1993-07-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-07-17 | 1997-01-16 | 1997-07-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-07-17 | 2001-01-16 | 2001-07-18 | $7700.00 | Window Closed / Lapsed |