Dust-proof container having improved construction for holding a reticle therein

Abstract

Abstract A dust-proof container for keeping therein a mask or reticle usable to transfer a pattern onto a semiconductor wafer for the manufacture of integrated circuits, is disclosed. The container includes a casing within which supporting pins for supporting the mask or reticle are formed. Also, in the casing, there are provided leaf springs for pressing the mask or reticle toward the supporting pins, and a releasing mechanism for releasing the reticle pressing force of the leaf springs. The releasing mechanism is responsive to a non-mechanical signal such as an electric signal to release the reticle pressing force. A shape memory alloy may be usable in the releasing mechanism. An opening/closing mechanism is provided to open/close a door which is operable to cover an opening formed in the casing for the insertion and extraction of the mask or reticle. A shape memory alloy may be used in the opening/closing mechanism. With the dust-proof container of the present invention, the necessity of use of a mechanical-signal transmitting system such as a linkage or otherwise in the casing is avoided. This effectively prevents creation of dust or foreign particles within the casing due to mechanical friction contact. Also, the possiblity of adhesion of dust or foreign particles to the mask or reticle contained in the container can be minimized.

Inventors

• 👤 Hiroshi Nakazato
• 👤 Mamoru Iijima

Bibliographic Details