US4840918A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of noise reduction in CCD solid state imagers
Assignee: Eastman Kodak Co
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Filing: 1988-05-09
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Granted: 1989-06-20
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Expires: 2008-05-09
Abstract
Abstract A method to reduce the dark current in CCD solid state imagers is disclosed. This method involves sintering an unpatterned Al film on top of an oxide layer at 450° C. for a time to generate sufficient numbers of atomic hydrogen atoms to diffuse through the oxide layer and passivate the silicon surface states.
Inventors
- 👤 Yea-Dean Sheu
- 👤 Gilbert Hawkins
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 02:31
CPC Classifications
H; H10; H10D; H10D44/00; H10D44/01; H10D44/041; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01332; H10D64/01336; H10D64/01338; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/28; H10F30/2823; H10F39/00; H10F39/10; H10F39/12; H10F39/15; H10F39/153; H10D64/01346; Y; Y10; Y10S; Y10S438/00; Y10S438/91
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
68 words
A method of passivating the surface states of an active layer in a solid state device comprising the steps of: (a) forming an unpatterned Al layer over an oxide layer of the device having trace water; (b) sintering the unpatterned Al layer to generate sufficient hydrogen atoms from trace water in the oxide layer to passivate surface states on the gate oxide/silicon interface in the device active areas.
Claim 2
Independent Claim
68 words
A method of passivating the surface states of an active layer in a solid state device comprising the steps of: (a) forming an unpatterned Al layer over an oxide layer of the device having trace water; (b) sintering the unpatterned Al layer to generate sufficient hydrogen atoms from trace water in the oxide layer to passivate surface states on the gate oxide/silicon interface in the device active areas.
Claim 3
Independent Claim
88 words
A method of passivating the surface states of a silicon layer of a CCD solid state imager, comprising the steps of: (a) forming a blanket Al layer over an oxide layer of the CCD so that the Al layer is in contact with trace water in an underlying layer; and (b) sintering the Al film at a temperature selected so that sufficient numbers of hydrogen atoms from the trace water are formed and they diffuse through the oxide layer to passivate the surface states of the silicon layer.
Claim 4
Independent Claim
88 words
A method of passivating the surface states of a silicon layer of a CCD solid state imager, comprising the steps of: (a) forming a blanket Al layer over an oxide layer of the CCD so that the Al layer is in contact with trace water in an underlying layer; and (b) sintering the Al film at a temperature selected so that sufficient numbers of hydrogen atoms from the trace water are formed and they diffuse through the oxide layer to passivate the surface states of the silicon layer.
Claim 5
Dependent Claim
12 words
The method of claim 2 wherein the sintering temperature is 450° C.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-06-19 | 1992-12-19 | 1993-06-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-06-19 | 1996-12-19 | 1997-06-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-06-19 | 2000-12-19 | 2001-06-20 | $7700.00 | Window Closed / Lapsed |