US4829536A
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Multi-mode narrow-band oscillation excimer laser
Assignee: KOMATSU SEISAKUSHO A CORP OF JAPAN KK
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Filing: 1987-06-09
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Granted: 1989-05-09
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Expires: 2007-06-09
Abstract
Abstract Specification of an etalon included in a multimode, narrow-band oscillation excimer laster used as a light source for light exposure in photolithography are set to satisfy a relation SλWλRλ (u,v)dλ≧α, where α is an optical transfer function necessary for light exposure of resist according to a reticle pattern, Rλ(u,v) is an optical transfer function of monochromatic light for an illuminating system and a reduced-projection lens, Wλ is a weight which is applied to a waveform of a power spectrum in an oscillation laser beam at a wavelength λ. Further, an inclination angle λ of the etalon in its normal direction with respect to an optical axis when the etalon is provided between the chamber and rear mirror is set to satisfy a relation θ>tan -1 S/2A, where S is a dimension of a beam at a beam output mirror and A is a distance between the etalon and beam output mirror, and an oscillation linewidth K is set to satisfy relations K=1/λ o [1/{cos (θ+θ')}-1/cos θ} and also K≦x, where λ o is a selected wavelength when the beam is directed onto the etalon at a normal angle, θ' is a beam divergence angle, and x is an allowable linewidth of a light exposure system using the excimer laser as a light source.
Inventors
- 👤 Koichi Kajiyama
- 👤 Kaoru Saito
- 👤 Yasuhiro Nozue
- 👤 Noritoshi Ito
- 👤 Osamu Wakabayashi
- 👤 Junichi Fujimoto
- 👤 Masahiko Kowaka
- 👤 Yasao Itakura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 17:44
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70575; G03F7/70583; H; H01; H01S; H01S3/00; H01S3/10; H01S3/106; H01S3/1062; H01S3/14; H01S3/22; H01S3/223; H01S3/225
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
281 words
A multi-mode, narrow-band oscillation excimer laser for irradiating a laser beam onto a reticle pattern so as to project said reticle pattern onto a resist as a reticle pattern image, said excimer laser comprising an etalon for multi-mode and narrow band oscillation, characterized in that specifications of said etalon are set to satisfy a relation ∫.sub.λ W.sub.λ R.sub.λ (u,v)d.sub.λ ≧α, where α represents an optical transfer function necessary for sensitizing a resist according to a reticle pattern, R.sub.λ (u,v) represents a monochromatic light optical transfer function of an illuminating system and a contrating-projection lens, W.sub.λ represents a weight which is applied to a spectral waveform at a given wavelength in a power spectrum of said oscillation laser beam, and is expressed by W.sub.λ =T (λ)/∫.sub.λ T(λ)dλ, where T(λ) is a power spectrum of the oscillation laser beam and is expressed by ##EQU6## where f(λ,β) is a power spectrum of virtual free running based on an increase in a threshold value in the presence of the etalon between a chamber and a rear mirror, β is a rate of increase in the threshold value, E(K k .F tk , FSR k , λ) is a transfer function of power spectrum of light based on the single k-th etalon, F tk is a total finesse of each etalon, and FSR k is a free spectral range of each etalon, K k is a finesse coefficient, whereby said excimer laser produces a laser beam having a narrow frequency band, a high output and a spatially incoherent beam characteristic so as to make the contrast of said reticle pattern image on the resist sufficiently higher to give a preferable resolution to said reticle pattern image.
Claim 2
Dependent Claim
281 words
A multi-mode, narrow-band oscillation excimer laser for irradiating a laser beam onto a reticle pattern so as to project said reticle pattern onto a resist as a reticle pattern image, said excimer laser comprising an etalon for multi-mode and narrow band oscillation, characterized in that specifications of said etalon are set to satisfy a relation ∫.sub.λ W.sub.λ R.sub.λ (u,v)d.sub.λ ≧α, where α represents an optical transfer function necessary for sensitizing a resist according to a reticle pattern, R.sub.λ (u,v) represents a monochromatic light optical transfer function of an illuminating system and a contrating-projection lens, W.sub.λ represents a weight which is applied to a spectral waveform at a given wavelength in a power spectrum of said oscillation laser beam, and is expressed by W.sub.λ =T (λ)/∫.sub.λ T(λ)dλ, where T(λ) is a power spectrum of the oscillation laser beam and is expressed by ##EQU6## where f(λ,β) is a power spectrum of virtual free running based on an increase in a threshold value in the presence of the etalon between a chamber and a rear mirror, β is a rate of increase in the threshold value, E(K k .F tk , FSR k , λ) is a transfer function of power spectrum of light based on the single k-th etalon, F tk is a total finesse of each etalon, and FSR k is a free spectral range of each etalon, K k is a finesse coefficient, whereby said excimer laser produces a laser beam having a narrow frequency band, a high output and a spatially incoherent beam characteristic so as to make the contrast of said reticle pattern image on the resist sufficiently higher to give a preferable resolution to said reticle pattern image.
Claim 3
Dependent Claim
390 words
A multi-mode narrow-band oscillation excimer laser for irradiating a laser beam onto a reticle pattern so as to project said reticle pattern onto a resist as a reticle pattern image, said excimer laser comprising an etalon for oscillation of multimode and narrow band, characterized in that specifications of said etalon are set to satisfy a relation ∫.sub.λ W.sub.λ R.sub.λ (u,v)dλ≧α where α is an optical transfer function necessary for light exposure of resist according to a reticle pattern, R.sub.λ (u,v) is an optical transfer function of monochromatic light for an illuminating system and a reduced-projection lens, W.sub.λ is a weight which is applied to a waveform of a power spectrum in an oscillation laser beam at a wavelength λ and is expressed by W.sub.λ=T(λ)/∫.sub.λ T(λ)d.sub.λ, where T(λ) is a power spectrum of the oscillation laser beam and is expressed by ##EQU7## where f(λ,β) is a power spectrum of virtual free running based on an increase in a threshold value in the presence of the etalon between a chamber and a rear mirror, β is a rate of increase in the threshold value, E(K k .F tk , FSR k , λ) is a transfer function of a power spectrum of light based on the single k-th etalon, F tk is a total finesse of each etalon, and FSR k is a free spectral range of each etalon, K k is a finesse coefficient; and further characterized in that an inclination angle θ of the etalon is selected to be θ>tan -1 S/2A, where S is a dimension of a beam at a beam output mirror and A is a distance between the etalon and beam output mirror, and an oscillation linewidth K is set to satisfy relations K=1/λ o [1/{cos (θ+θ')}-1/cos θ] with K≦x, where λ o is a selected wavelength when the beam is directed onto the etalon at a normal angle, θ' is a beam divergence angle, and x is an allowable linewidth of a light exposure system using the excimer laser as a light source, whereby said excimer laser produces a laser beam of a desired linewidth having a narrow frequency band, a high output and a spatially incoherent beam characteristic so as to make the contrast of said reticle pattern image on the resist sufficiently higher to give a preferable resolution to said reticle pattern image.
Claim 4
Dependent Claim
390 words
A multi-mode narrow-band oscillation excimer laser for irradiating a laser beam onto a reticle pattern so as to project said reticle pattern onto a resist as a reticle pattern image, said excimer laser comprising an etalon for oscillation of multimode and narrow band, characterized in that specifications of said etalon are set to satisfy a relation ∫.sub.λ W.sub.λ R.sub.λ (u,v)dλ≧α where α is an optical transfer function necessary for light exposure of resist according to a reticle pattern, R.sub.λ (u,v) is an optical transfer function of monochromatic light for an illuminating system and a reduced-projection lens, W.sub.λ is a weight which is applied to a waveform of a power spectrum in an oscillation laser beam at a wavelength λ and is expressed by W.sub.λ=T(λ)/∫.sub.λ T(λ)d.sub.λ, where T(λ) is a power spectrum of the oscillation laser beam and is expressed by ##EQU7## where f(λ,β) is a power spectrum of virtual free running based on an increase in a threshold value in the presence of the etalon between a chamber and a rear mirror, β is a rate of increase in the threshold value, E(K k .F tk , FSR k , λ) is a transfer function of a power spectrum of light based on the single k-th etalon, F tk is a total finesse of each etalon, and FSR k is a free spectral range of each etalon, K k is a finesse coefficient; and further characterized in that an inclination angle θ of the etalon is selected to be θ>tan -1 S/2A, where S is a dimension of a beam at a beam output mirror and A is a distance between the etalon and beam output mirror, and an oscillation linewidth K is set to satisfy relations K=1/λ o [1/{cos (θ+θ')}-1/cos θ] with K≦x, where λ o is a selected wavelength when the beam is directed onto the etalon at a normal angle, θ' is a beam divergence angle, and x is an allowable linewidth of a light exposure system using the excimer laser as a light source, whereby said excimer laser produces a laser beam of a desired linewidth having a narrow frequency band, a high output and a spatially incoherent beam characteristic so as to make the contrast of said reticle pattern image on the resist sufficiently higher to give a preferable resolution to said reticle pattern image.
References Cited (Backward Citations)
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