Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
217 words
A substrate processing apparatus including input and output chambers for loading and unloading substrates into and out of the apparatus and at least one substrate processing chamber connected to said input and output chambers for applying a plurality of processings to the substrates, said apparatus comprising: at least one separation chamber connected to the input and output chambers; a plurality of substrate processing chambers connected to said separation chamber for processing the substrates therein, said input and output chambers and said substrate processing chambers being arranged about said separation chamber; and gate valves respectively provided between said separation chamber and said input and output chambers and between said separation chamber and said respective substrate processing chambers for selective communication of the chambers between which the gate valves are arranged; said separation chamber being able to transfer the substrates therethrough, to temporarily maintain the substrates therein, and to distribute the substrates into the respective processing chambers; wherein the dimension of said separation chamber is enlargeable to accommodate a plurality of substrate processing chambers to be arranged thereabout; and wherein at least one partition is provided in said enlarged separation chamber to divide the same into a plurality of smaller separation chambers, the partition being provided with a gate valve for selectively providing passage between the smaller separation chambers.
Claim 2
Dependent Claim
217 words
A substrate processing apparatus including input and output chambers for loading and unloading substrates into and out of the apparatus and at least one substrate processing chamber connected to said input and output chambers for applying a plurality of processings to the substrates, said apparatus comprising: at least one separation chamber connected to the input and output chambers; a plurality of substrate processing chambers connected to said separation chamber for processing the substrates therein, said input and output chambers and said substrate processing chambers being arranged about said separation chamber; and gate valves respectively provided between said separation chamber and said input and output chambers and between said separation chamber and said respective substrate processing chambers for selective communication of the chambers between which the gate valves are arranged; said separation chamber being able to transfer the substrates therethrough, to temporarily maintain the substrates therein, and to distribute the substrates into the respective processing chambers; wherein the dimension of said separation chamber is enlargeable to accommodate a plurality of substrate processing chambers to be arranged thereabout; and wherein at least one partition is provided in said enlarged separation chamber to divide the same into a plurality of smaller separation chambers, the partition being provided with a gate valve for selectively providing passage between the smaller separation chambers.
Claim 3
Dependent Claim
69 words
A substrate processing apparatus as set forth in claim 1, wherein said gate valves provided between said separation chamber and said substrate processing chamber are so constructed that when any one of the gate valves is operated, all the other gate valves are kept closed, and after a predetermined delay time has expired since any one of the gate valves was closed, any other gate valve may be opened.
Claim 4
Dependent Claim
32 words
A substrate processing apparatus as set forth in claim 1, wherein said plurality of substrate processing chambers include a film forming chamber, a pretreatment chamber, a post-treatment chamber and an etching chamber.
Claim 5
Dependent Claim
28 words
A substrate processing apparatus as set forth in claim 3, wherein said film forming chamber comprises means selected from sputtering, chemical vapor depositing, vapor depositing and ECR depositing.
Claim 6
Dependent Claim
25 words
A substrate processing apparatus as set forth in claim 3, wherein said pretreatment chamber comprises means selected from heating, sputtering etching and reactive ion etching.
Claim 7
Dependent Claim
17 words
A substrate processing apparatus as set forth in claim 3, wherein said post-treatment chamber comprises heating means.