Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
231 words
A method for depositing a chemically bonded carbon based film having a diamond structure on a substrate, comprising the steps of: positioning an electrically grounded substrate within a deposition chamber; preparing the substrate to have an atomically clean surface and maintaining said surface in an atomically clean state during deposition by maintaining the pressure within the deposition chamber at or below 1×10 -9 torr; generating from a carbon containing material a source of gaseous ions in an ionization region maintained at 1-300eV above the grounded substrate; directing ions from the ionization region into electromagnetic mass analyser; selecting 12 C + ions to exit from the mass analyser; directing said 12 C + ion beam through a bend by passing said beam through a parallel plate condenser to eliminate line-of-sight neutral particles from said ion beam; directing said 12 C + ion beam through a decelerator lens immediately in front of said substrate; impinging said ion beam on the atomically clean substrate surface at a beam energy sufficient to form a carbon layer bound to said substrate surface by carbide bonding; and impinging said ion beam on said carbide bound carbon layer at a beam energy of at least about 10 eV for a time sufficient to overlay said carbide bound carbon layer with a diamond layer of the thickness desired, said diamond layer being substantially free from included hydrogen or oxygen.
Claim 2
Independent Claim
231 words
A method for depositing a chemically bonded carbon based film having a diamond structure on a substrate, comprising the steps of: positioning an electrically grounded substrate within a deposition chamber; preparing the substrate to have an atomically clean surface and maintaining said surface in an atomically clean state during deposition by maintaining the pressure within the deposition chamber at or below 1×10 -9 torr; generating from a carbon containing material a source of gaseous ions in an ionization region maintained at 1-300eV above the grounded substrate; directing ions from the ionization region into electromagnetic mass analyser; selecting 12 C + ions to exit from the mass analyser; directing said 12 C + ion beam through a bend by passing said beam through a parallel plate condenser to eliminate line-of-sight neutral particles from said ion beam; directing said 12 C + ion beam through a decelerator lens immediately in front of said substrate; impinging said ion beam on the atomically clean substrate surface at a beam energy sufficient to form a carbon layer bound to said substrate surface by carbide bonding; and impinging said ion beam on said carbide bound carbon layer at a beam energy of at least about 10 eV for a time sufficient to overlay said carbide bound carbon layer with a diamond layer of the thickness desired, said diamond layer being substantially free from included hydrogen or oxygen.
Claim 3
Dependent Claim
26 words
The method of claim 2 wherein the ion beam is impinged upon said substrate at an energy of from about 10 eV to about 250 eV.
Claim 4
Dependent Claim
22 words
The method of claim 3 wherein the energy of the impinging ion beam is from about 30 eV to about 175 eV.
Claim 5
Dependent Claim
29 words
The method of claim 2 wherein the substrate is Al, Ba, Ca, Fe, Mn, Mo, Ni, Si, Sr, Ta, Th, Ti, W, V, Zr, an alloy or mixture thereof.
Claim 6
Dependent Claim
23 words
The method of claim 2 wherein the substrate is Cr, Co, Cu, Pb, Mg, Pd, Pt, Sn, Zn, an alloy or mixture thereof.
Claim 7
Dependent Claim
15 words
The mehod of claim 3 wherein the substrate is Ni, Si, Au, Ta, or W.
Claim 8
Dependent Claim
54 words
A carbon based film deposited by ion beam deposition upon a substrate, comprising: an anterior carbon layer substantially free of hydrogen or oxygen and having a diamond microstructure which anterior layer overlays and is chemically bonded to a posterior atomic layer of carbon that is chemically bound to said substrate surface by carbide bonding.
Claim 9
Dependent Claim
54 words
A carbon based film deposited by ion beam deposition upon a substrate, comprising: an anterior carbon layer substantially free of hydrogen or oxygen and having a diamond microstructure which anterior layer overlays and is chemically bonded to a posterior atomic layer of carbon that is chemically bound to said substrate surface by carbide bonding.