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US4813050A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor laser device

Assignee: Mitsubishi Electric Corp
•
Filing: 1987-05-27
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Granted: 1989-03-14
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Expires: 2007-05-27
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Abstract

Abstract A high-power AlGaAs/GaAs laser device comprises: a ridge formed on the top surface of a substrate from one end thereof to the opposite end, wherein the width of the ridge is made narrower in regions near both the ends and wider in a middle region; a depression is formed in the wider region of the ridge; a clad layer is grown epitaxially over the top surface of the substrate; and an active layer is grown epitaxially on the clad layer, wherein the thickness of the active layer is thinner in portions just above the narrower ridge regions and relatively thicker in a portion just above the wider ridge region.

Inventors

  • 👤 Akihiro Shima
  • 👤 Wataru Susaki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 04:25
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/10; H01S5/16; H01S5/1053; H01S5/1064; H01S5/20; H01S5/22; H01S5/2201; H01S5/223; H01S5/2232; H01S5/2234; H01S5/2235

Claims Analysis

Total Claims: 12
Claim 1
Independent Claim 136 words
A semiconductor laser device having a resonant cavity and electrodes, comprising: a substrate; a ridge formed on a main surface of said substrate and extending from one end of the substrate to an opposite end thereof, wherein the width of said ridge is narrower in regions near both the ends and relatively wider in a middle region; a depression formed in the wider region of said ridge; a first clad layer formed over the main surface of said substrate including said depression; an active layer formed on said first clad layer, wherein the thickness of said active layer is formed to be thinner in portions just above said narrower ridge regions and relatively thicker in a portion just above said wider ridge region between said ends; and a second clad layer formed on said active layer.
Claim 2
Dependent Claim 136 words
A semiconductor laser device having a resonant cavity and electrodes, comprising: a substrate; a ridge formed on a main surface of said substrate and extending from one end of the substrate to an opposite end thereof, wherein the width of said ridge is narrower in regions near both the ends and relatively wider in a middle region; a depression formed in the wider region of said ridge; a first clad layer formed over the main surface of said substrate including said depression; an active layer formed on said first clad layer, wherein the thickness of said active layer is formed to be thinner in portions just above said narrower ridge regions and relatively thicker in a portion just above said wider ridge region between said ends; and a second clad layer formed on said active layer.
Claim 3
Dependent Claim 22 words
A device in accordance with claim 1, wherein: said first clad layer and said active layer are grown by liquid phase epitaxy.
Claim 4
Dependent Claim 19 words
A device in accordance with claim 1, further comprising: a slit formed along the center axis of said ridge.
Claim 5
Dependent Claim 19 words
A device in accordance with claim 3, wherein: an outer current-blocking layer is provided on said second clad layer.
Claim 6
Dependent Claim 38 words
A device in accordance with claim 3, wherein: an inner current-blocking layer, grown by liquid phase epitaxy, is provided between said substrate and said first clad layer, said slit extending through said second current-blocking layer into said ridge.
Claim 7
Dependent Claim 15 words
A device in accordance with claim 1, wherein: said device is of an AlGaAs/GaAs system.
Claim 8
Dependent Claim 19 words
A device in accordance with claim 5, wherein: an outer current-blocking layer is provided on said second clad layer.
Claim 9
Dependent Claim 15 words
A device in accordance with claim 7, wherein: said device is of an AlGaAs/GaAs system.
Claim 10
Dependent Claim 34 words
A device in accordance with claim 8, wherein: said first clad layer comprises p-AlGaAs grown by liquid epitaxy, said active layer comprises p-AlGaAs grown by liquid epitaxy, and said second clad layer comprises n-AlGaAs.
Claim 11
Dependent Claim 22 words
A device in accordance with claim 9, further comprising: a covering clad layer comprising n-AlGaAs, formed over said outer current blocking layer.
Claim 12
Dependent Claim 20 words
A device in accordance with claim 10, further comprising: a control layer comprising n-GaAs, formed over said covering clad layer.

References Cited (Backward Citations)

JPS60140774A Cited
US4679200A Cited
US4745611A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-03-13 1992-09-12 1993-03-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-03-13 1996-09-12 1997-03-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-03-13 2000-09-12 2001-03-14 $7700.00 Window Closed / Lapsed

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