US4810889A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fine circuit pattern drawing apparatus and method
Assignee: Canon Inc
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Filing: 1986-12-29
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Granted: 1989-03-07
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Expires: 2006-12-29
Abstract
Abstract An apparatus for drawing a fine circuit pattern on a wafer, includes a radiation beam generating head for generating and emitting radiation beams with which the wafer is to be patternwisely exposed; a first moving system for moving the beam generating head in a first direction; and a second moving system for moving the wafer at least in a second direction, substantially perpendicular to the first direction, while holding the wafer by attraction.
Inventors
- 👤 Takao Yokomatsu
- 👤 Hironori Yamamoto
- 👤 Mitsuaki Seki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 17:21
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0444; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70383; G03F7/704
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
79 words
An apparatus for drawing a fine circuit pattern on a wafer, said apparatus comprising: a radiation beam generating head comprising means for generating and emitting radiation beams with which the wafer is to be exposed to draw a pattern thereon; first moving means for moving said beam generating head in a first direction; and second moving means for moving the wafer at least in a second direction, substantially perpendicular to said first direction, while holding the wafer by attraction.
Claim 2
Independent Claim
79 words
An apparatus for drawing a fine circuit pattern on a wafer, said apparatus comprising: a radiation beam generating head comprising means for generating and emitting radiation beams with which the wafer is to be exposed to draw a pattern thereon; first moving means for moving said beam generating head in a first direction; and second moving means for moving the wafer at least in a second direction, substantially perpendicular to said first direction, while holding the wafer by attraction.
Claim 3
Dependent Claim
36 words
An apparatus according to claim 1, wherein said first moving means includes a carriage for carrying thereon said beam generating head, and a driving element mounted on said carriage for finely moving said beam generating head.
Claim 4
Independent Claim
77 words
An apparatus for drawing a fine circuit pattern on a wafer, said apparatus comprising: a radiation beam generating head comprising means for generating and emitting radiation beams with which the wafer is to be exposed to draw a pattern thereon; fine-driving means for finely moving said beam generating head in at least one of a Y-axis direction, a Z-axis direction and a θ-direction; and control means operable to relatively align said beam generating head with the wafer.
Claim 5
Independent Claim
77 words
An apparatus for drawing a fine circuit pattern on a wafer, said apparatus comprising: a radiation beam generating head comprising means for generating and emitting radiation beams with which the wafer is to be exposed to draw a pattern thereon; fine-driving means for finely moving said beam generating head in at least one of a Y-axis direction, a Z-axis direction and a θ-direction; and control means operable to relatively align said beam generating head with the wafer.
Claim 6
Independent Claim
104 words
A method of adjusting a positional relation between radiation beam generating means and a wafer which has an alignment mark and which is to be exposed with radiation beams generated by and emitted from the beam generating means to draw a pattern thereon, said method comprising the steps of: detecting the alignment mark formed on the wafer by use of a detecting element provided on the beam generating means as a unit; and moving the beam generating means in accordance with the detection performed in said detecting step so that a predetermined positional relation is established between the beam generating means and the wafer.
Claim 7
Independent Claim
104 words
A method of adjusting a positional relation between radiation beam generating means and a wafer which has an alignment mark and which is to be exposed with radiation beams generated by and emitted from the beam generating means to draw a pattern thereon, said method comprising the steps of: detecting the alignment mark formed on the wafer by use of a detecting element provided on the beam generating means as a unit; and moving the beam generating means in accordance with the detection performed in said detecting step so that a predetermined positional relation is established between the beam generating means and the wafer.
Claim 8
Dependent Claim
89 words
In a method of drawing a fine circuit pattern on a wafer by use of radiation beam generating means for generating and emitting radiation beams with which the wafer is to be exposed to draw a pattern thereon, the improved steps comprising: reciprocatingly moving the beam generating means while in substantially opposed relation to the wafer; and causing the beam generating means to generate and emit the radiation beams so as to expose the wafer to draw a pattern thereon, during the reciprocating movement of the beam generating means.
Claim 9
Dependent Claim
89 words
In a method of drawing a fine circuit pattern on a wafer by use of radiation beam generating means for generating and emitting radiation beams with which the wafer is to be exposed to draw a pattern thereon, the improved steps comprising: reciprocatingly moving the beam generating means while in substantially opposed relation to the wafer; and causing the beam generating means to generate and emit the radiation beams so as to expose the wafer to draw a pattern thereon, during the reciprocating movement of the beam generating means.
Claim 10
Dependent Claim
97 words
A radiation beam generating head assembly for generating and emitting radiation beams with which a wafer is to be exposed to draw a pattern therein, said beam generating head assembly comprising: a base plate; means provided on said base plate for generating and emitting the radiation beams; means provided on said base plate for detecting a positional relation between said beam generating and emitting means and the wafer when the wafer is disposed in opposition to said beam generating and emitting means; and a movable member for carrying said base plate for movement relative to the wafer.
Claim 11
Dependent Claim
97 words
A radiation beam generating head assembly for generating and emitting radiation beams with which a wafer is to be exposed to draw a pattern therein, said beam generating head assembly comprising: a base plate; means provided on said base plate for generating and emitting the radiation beams; means provided on said base plate for detecting a positional relation between said beam generating and emitting means and the wafer when the wafer is disposed in opposition to said beam generating and emitting means; and a movable member for carrying said base plate for movement relative to the wafer.
Claim 12
Dependent Claim
33 words
A radiation beam generating head system according to claim 6, wherein said detecting means includes signal outputting means and signal inputting means which are cooperable to detect a mark formed on the wafer.
Claim 13
Dependent Claim
33 words
A radiation beam generating head system according to claim 6, wherein said radiation beam generating and emitting means includes a plurality of radiation beam sources each for generating and emitting a radiation beam.
Claim 14
Dependent Claim
28 words
A radiation beam head system according to claim 6, further comprising means for adjusting an orientation relative to said movable member of said beam generating and emitting means.
Claim 15
Dependent Claim
18 words
A radiation beam generating head system according to claim 6, wherein said movable member comprises a movable carriage.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1992-03-06 | 1992-09-05 | 1993-03-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-03-06 | 1996-09-05 | 1997-03-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-03-06 | 2000-09-05 | 2001-03-07 | $7700.00 | Window Closed / Lapsed |