US4810620A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Nickel plated tape
Assignee: National Semiconductor Corp
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Filing: 1987-08-27
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Granted: 1989-03-07
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Expires: 2007-08-27
Abstract
Abstract An improved copper bump tape for tape automated bonding inhibits electromigration of the copper after bonding to a semiconductor device. The improved tape is characterized by the plating of a migration resistant metal onto the inner ends of connector beams of the tape. The migration resistant metal is coated onto all surfaces of the connector bump, except for the surface which is to be bonded to the semiconductor device. In this way, the surfaces of the bump which remain exposed after connection to the semiconductor are inhibited from electromigration.
Inventors
- 👤 Hem P. Takiar
- 👤 P. Shah Divyesh
- 👤 Robert E. Hilton
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 08:19
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0446
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
114 words
A process for fabricating copper bump tape, said process comprising: applying a photoresist layer to both sides of the tape; exposing the photoresist to form a pattern which defines a bump on the inner ends of connector beams on the tape; developing the photoresist to expose the inner ends of the connector beams, except for a surface which defines the bump; etching the copper tape to form the bump; plating a layer of a migration resistant metal onto the copper while the photoresist remains in place, whereby the exposed surfaces of the bump are coated with the migration resistant metal, but the surface protected by photoresist is not coated; and removing the remaining photoresist.
Claim 2
Dependent Claim
114 words
A process for fabricating copper bump tape, said process comprising: applying a photoresist layer to both sides of the tape; exposing the photoresist to form a pattern which defines a bump on the inner ends of connector beams on the tape; developing the photoresist to expose the inner ends of the connector beams, except for a surface which defines the bump; etching the copper tape to form the bump; plating a layer of a migration resistant metal onto the copper while the photoresist remains in place, whereby the exposed surfaces of the bump are coated with the migration resistant metal, but the surface protected by photoresist is not coated; and removing the remaining photoresist.
Claim 3
Dependent Claim
17 words
A process as in claim 1, wherein the migration resistant metal is nickel or a nickel alloy.
Claim 4
Dependent Claim
23 words
A process as in claim 1, wherein the migration resistant metal is plated to a thickness in the range of 0.1μ to 10μ.
Claim 5
Dependent Claim
11 words
A process as in claim 3, wherein the thickness is 0.25μ.
References Cited (Backward Citations)
US4210926A
Cited
US4209355A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-03-06 | 1992-09-05 | 1993-03-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-03-06 | 1996-09-05 | 1997-03-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-03-06 | 2000-09-05 | 2001-03-07 | $7700.00 | Window Closed / Lapsed |