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US4810095A Expired / Lapsed US ⏱️ 0.0 years remaining

Laser-beam, pattern drawing/inspecting apparatus

Assignee: Shibaura Machine Co Ltd
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Filing: 1986-11-28
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Granted: 1989-03-07
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Expires: 2006-11-28
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Abstract

Abstract A laser-beam, pattern drawing/inspecting apparatus comprises a reciprocating stage for supporting a printed substrate having an etchant-resistant resist layer coated on it, a laser-beam scanning device having a laser for selectively emitting a first laser beam and a second laser beam less intense than the first laser beam, and an optical system for guiding the first and second laser beams to the printed substrate along the same optical path, the first laser beam scanning the resist layer to draw a pattern thereon, and the second laser beam scanning the resist layer, and a pattern inspection device for receiving the second laser beam reflected from the resist layer, thereby to optically inspect the pattern drawn on the resist layer.

Inventors

  • 👤 Yasunobu Kawauchi
  • 👤 Koji Handa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 06:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70605; G03F7/70616; G02; G02B; G02B26/00; G02B26/08; G02B26/10; G02B26/12; G02B26/123; G03F7/70383

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 253 words
A laser-beam, pattern drawing/inspecting apparatus comprising: a reciprocating stage for supporting a sample having an etchant-resistant resist layer coated on it; a drive mechanism for reciprocating said stage; a laser-beam scanning device having a laser for selectively emitting a first laser beam and a second laser beam less intense than the first laser beam, and an optical system for guiding the first and second laser beams to the sample along the same optical path, said first laser beam scanning the resist layer to draw a pattern thereon, and said second laser beam scanning the resist layer; a pattern inspection device for receiving the second laser beam reflected from the resist layer, thereby to optically inspect the pattern drawn on the resist layer; wherein said laser has a laser head for emitting the first laser beam, and an inspection unit which can be set on the optical axis of the laser head and which reduces the energy of the first laser beam, thereby to provide the second laser beam, when set in the optical axis of the laser head; and wherein said inspection unit has a beam-splitting member for splitting the first laser beam into two parts and supplying the first part to said optical system and the second part along a path, and a beam-absorbing member provided in this path for absorbing the second part of the first laser beam, and a member provided in front of said optical system for changing the frequency of the first part of the first laser beam.
Claim 2
Dependent Claim 253 words
A laser-beam, pattern drawing/inspecting apparatus comprising: a reciprocating stage for supporting a sample having an etchant-resistant resist layer coated on it; a drive mechanism for reciprocating said stage; a laser-beam scanning device having a laser for selectively emitting a first laser beam and a second laser beam less intense than the first laser beam, and an optical system for guiding the first and second laser beams to the sample along the same optical path, said first laser beam scanning the resist layer to draw a pattern thereon, and said second laser beam scanning the resist layer; a pattern inspection device for receiving the second laser beam reflected from the resist layer, thereby to optically inspect the pattern drawn on the resist layer; wherein said laser has a laser head for emitting the first laser beam, and an inspection unit which can be set on the optical axis of the laser head and which reduces the energy of the first laser beam, thereby to provide the second laser beam, when set in the optical axis of the laser head; and wherein said inspection unit has a beam-splitting member for splitting the first laser beam into two parts and supplying the first part to said optical system and the second part along a path, and a beam-absorbing member provided in this path for absorbing the second part of the first laser beam, and a member provided in front of said optical system for changing the frequency of the first part of the first laser beam.

References Cited (Backward Citations)

US4271334A Cited
US4566016A Cited
US4651169A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-03-06 1992-09-05 1993-03-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-03-06 1996-09-05 1997-03-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-03-06 2000-09-05 2001-03-07 $7700.00 Window Closed / Lapsed

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