US4800836A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Resist coating apparatus
Assignee: Toshiba Corp
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Filing: 1988-03-24
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Granted: 1989-01-31
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Expires: 2008-03-24
Abstract
Abstract A liquid state resist is dropped to form a coating on a semiconductor substrate mounted on a rotary chuck disposed in a resist coating vessel in which a sealed solvent vapor atmosphere is created. An adjusting plate is provided in the coating vessel above the rotary chuck in a stationary or movable manner to weaken or substantially reduce a swirly flow of the solvent vapor which tends to occur in the coating vessel when the chuck is rotated. Thus a substrate coated with a resist film of uniform thickness is obtained.
Inventors
- 👤 Noboru Yamamoto
- 👤 Yasuo Matsuoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 14:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/162
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
120 words
An apparatus for coating resist on a substrate comprising: a vessel having an open top covered by a cover plate; sealing means for creating a sealed solvent vapor atmosphere in said vessel; a circular rotary chuck disposed in said vessel at substantially the central portion thereof, said chuck with the substrate supported thereon being rotatable about a vertical axis by driving means; means disposed directly above said rotary chuck and adapted to drop liquid state resist on said substrate thereby to form a resist coat thereon; and means disposed above said rotary chuck and extending in a radial direction thereof for substantially reducing swirly flow of the solvent vapour created above said rotary chuck when said rotary chuck is rotated.
Claim 2
Independent Claim
120 words
An apparatus for coating resist on a substrate comprising: a vessel having an open top covered by a cover plate; sealing means for creating a sealed solvent vapor atmosphere in said vessel; a circular rotary chuck disposed in said vessel at substantially the central portion thereof, said chuck with the substrate supported thereon being rotatable about a vertical axis by driving means; means disposed directly above said rotary chuck and adapted to drop liquid state resist on said substrate thereby to form a resist coat thereon; and means disposed above said rotary chuck and extending in a radial direction thereof for substantially reducing swirly flow of the solvent vapour created above said rotary chuck when said rotary chuck is rotated.
Claim 3
Dependent Claim
30 words
The apparatus according to claim 1 wherein said swirly flow eliminating means is a vertically orientated adjusting plate having a lower edge parallel to the surface of said rotary chuck.
Claim 4
Dependent Claim
47 words
The apparatus according to claim 2 wherein said adjusting plate is of a rectangular plate having an upper edge stationarily secured to the lower surface of the cover plate of said vessel at a position apart from and clear of the path of the resist thus dropped.
Claim 5
Dependent Claim
34 words
The apparatus according to claim 2 wherein said adjusting plate is movably supported by a moving member so that said adjusting plate is positioned above said rotary chuck when said rotary chuck is rotated.
Claim 6
Dependent Claim
23 words
The apparatus according to claim 3 wherein said adjusting plate is disposed so as to have an inclination with respect to said chuck.
Claim 7
Dependent Claim
13 words
The apparatus according to claim 5 wherein said inclination is a right angle.
Claim 8
Dependent Claim
30 words
The apparatus according to claim 6 wherein a radial length of the lower edge of said rectangular adjusting plate is substantially equal to the radius of said circular rotary chuck.
Claim 9
Dependent Claim
26 words
The apparatus according to claim 2 wherein said adjusting plate is a flat disc plate parallelly disposed above and near the upper surface of said chuck.
Claim 10
Dependent Claim
40 words
The apparatus according to claim 8 wherein said adjusting disc plate is movable and supported by a moving member at a position apart from the lower end of said resist dropping means when the resist is dropped on the substrate.
Claim 11
Dependent Claim
34 words
The apparatus according to claim 1 wherein said resist dropping means is a nozzle member disposed directly above the central portion of said rotary chuck and extending downward through the cover of said vessel.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-01-31 | 1992-08-01 | 1993-01-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-01-31 | 1996-08-01 | 1997-01-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-01-31 | 2000-08-01 | 2001-01-31 | $7700.00 | Window Closed / Lapsed |