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US4800527A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor memory device

Assignee: Canon Inc
•
Filing: 1987-10-23
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Granted: 1989-01-24
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Expires: 2007-10-23
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Abstract

Abstract A semiconductor memory device comprises: a charge holding capacitor formed on a semiconductor substrate; an insulating layer formed on the capacitor; and a transistor formed on a monocrystalline or substantially monocrystalline semiconductor layer, which is provided by forming, on the insulating layer, a hetero material of a nucleation density sufficiently higher than that of the insulating layer and of a size smaller enough to allow growth of a single nucleus of a semiconductor layer, followed by crystal growth around a single nucleus formed on the hetero material.

Inventors

  • 👤 Masaharu Ozaki
  • 👤 Takao Yonehara

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 12:23
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/03; H10B12/038; H10B12/30; H10B12/37; H10B12/373; H10P; H10P14/00; H10P14/20; H10P14/27; H10P14/271; H10P14/274; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/2921; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 87 words
A semiconductor memory device comprising: a charge holding capacitor formed on a semiconductor substrate; an insulating layer formed on said capacitor; and a transistor formed on a monocrystalline or substantially monocrystalline semiconductor layer which is provided by forming, on said insulating layer, a hetero material of a nucleation density sufficiently higher than that of said insulating layer and of a size small enough to allow growth of a single nucleus of a semiconductor layer, followed by crystal growth around a single nucleus formed on said hetero material.
Claim 2
Dependent Claim 87 words
A semiconductor memory device comprising: a charge holding capacitor formed on a semiconductor substrate; an insulating layer formed on said capacitor; and a transistor formed on a monocrystalline or substantially monocrystalline semiconductor layer which is provided by forming, on said insulating layer, a hetero material of a nucleation density sufficiently higher than that of said insulating layer and of a size small enough to allow growth of a single nucleus of a semiconductor layer, followed by crystal growth around a single nucleus formed on said hetero material.

References Cited (Backward Citations)

US4721987A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-01-24 1992-07-25 1993-01-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-01-24 1996-07-25 1997-01-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-01-24 2000-07-25 2001-01-24 $7700.00 Window Closed / Lapsed

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