US4798650A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of dry etching aluminum
Assignee: Fujitsu Semiconductor Ltd
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Filing: 1988-03-28
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Granted: 1989-01-17
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Expires: 2008-03-28
Abstract
Abstract A method of reactive ion etching (RIE) of aluminum or an alloy thereof (Al) in which a substrate with an Al layer coated thereon is maintained at a temperature of 60° C. or less by cooling the substrate, so that the Al layer is taperingly etched to form conductor lines having sloped sidewalls. The substrate is clamped to a cooled electrode stage by an electrostatic chuck.
Inventors
- 👤 Moritaka Nakamura
- 👤 Takashi Kurimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 11:11
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
53 words
A method of reactive ion etching of aluminum or aluminum alloy characterized in that a substrate having an aluminum or aluminum alloy layer is maintained at a temperature of 60° C. or less by cooling the substrate during etching, so that said layer is taperingly etched to form conductor lines having sloped sidewalls.
Claim 2
Independent Claim
53 words
A method of reactive ion etching of aluminum or aluminum alloy characterized in that a substrate having an aluminum or aluminum alloy layer is maintained at a temperature of 60° C. or less by cooling the substrate during etching, so that said layer is taperingly etched to form conductor lines having sloped sidewalls.
Claim 3
Dependent Claim
20 words
A method according to claim 1, wherein said substrate temperature is within a range of from 30° to 60° C.
Claim 4
Dependent Claim
26 words
A method according to claim 1, wherein said substrate is clamped to a cooled electrode stage by an electrostatic chuck in a reactive ion etching apparatus.
Claim 5
Dependent Claim
15 words
A method according to claim 3, wherein said electrode stage is a water cooled electrode.
Claim 6
Dependent Claim
16 words
A method according to claim 1, wherein a chlorine-containing gas is used as an etchant gas.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-01-17 | 1992-07-18 | 1993-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-01-17 | 1996-07-18 | 1997-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-01-17 | 2000-07-18 | 2001-01-17 | $7700.00 | Window Closed / Lapsed |