US4794646A — Charged beam pattern defect inspection apparatus

Claim 1

Independent Claim 230 words

A charged beam pattern defect inspection apparatus for inspection and determination of pattern defects on materials such as masks or wafers comprising: a collecting charged beam irradiation apparatus including, scanning beam source means, for producing a scanning beam, scanning deflection means, for accelerating and focusing the scanning beam, and a detector for detecting phenomenon produced by incident particles such as reflected electrons, secondary electrons, cathodeluminescent light, X rays, or absorption currents; a two dimensional video memory having, an A/D converter, a memory for storing a video signal, and an address signal generator; a scanning generator for generating a scanning signal to control said scanning deflection means; a synchronous signal generator for generating a synchronous signal to be fed into said A/D converter; a video signal operator, for performing operations upon the video signal stored in said memory and for producing an output; a stage driving means, for driving a stage, the stage holding the material to be inspected, including a position detector for detecting the position of the stage; an auxilliary memory device for storing inspection data; and a control operation means, for controlling said scanning signal generator, said synchronous signal generator, said two dimensional video memory, said video signal operator, said stage driver means, and said auxiliary memory device, and for outputting the output of said video signal operator, the output is the determination of the pattern defect inspection.

Claim 2

Dependent Claim 230 words

A charged beam pattern defect inspection apparatus for inspection and determination of pattern defects on materials such as masks or wafers comprising: a collecting charged beam irradiation apparatus including, scanning beam source means, for producing a scanning beam, scanning deflection means, for accelerating and focusing the scanning beam, and a detector for detecting phenomenon produced by incident particles such as reflected electrons, secondary electrons, cathodeluminescent light, X rays, or absorption currents; a two dimensional video memory having, an A/D converter, a memory for storing a video signal, and an address signal generator; a scanning generator for generating a scanning signal to control said scanning deflection means; a synchronous signal generator for generating a synchronous signal to be fed into said A/D converter; a video signal operator, for performing operations upon the video signal stored in said memory and for producing an output; a stage driving means, for driving a stage, the stage holding the material to be inspected, including a position detector for detecting the position of the stage; an auxilliary memory device for storing inspection data; and a control operation means, for controlling said scanning signal generator, said synchronous signal generator, said two dimensional video memory, said video signal operator, said stage driver means, and said auxiliary memory device, and for outputting the output of said video signal operator, the output is the determination of the pattern defect inspection.

Claim 3

Dependent Claim 85 words

The charged beam pattern defect inspection apparatus as claimed in claim 1, wherein said video signal operator comprises: primary differential operation means, for performing a primary differential operation upon the video signal and for producing primary differential data; binarization means, for comparing the primary different data with a predetermined threshold value to binarize the primary differential data and for producing a binarized data; and difference operation means, for obtaining a difference between the binarized data and the inspection data stored in said auxiliary memory device.

Claim 4

Dependent Claim 49 words

The charged beam pattern defect inspection apparatus as claimed in claim 1, wherein said A/D converter has a quantization range of more than 4 bits and said two dimensional video memory and said video signal operator has a bit depth equal to the quantization range of said A/D converter.

Claim 5

Dependent Claim 31 words

The charged beam pattern defect inspection apparatus as claimed in claim 1 further comprises: inspection data means, for developing the inspection data stored in said auxiliary memory device from design data.

Claim 6

Dependent Claim 111 words

The charged beam pattern defect inspection apparatus as claimed in claim 4, wherein said inspection data means comprises: memory means, for storing the design data; picture data extending means, for bit map extending the design data and for storing the extended design data in a two dimensional array; expansion means, operatively connected to said picture data extending means, for expanding the extended design data; compression means, operatively connected to said picture data extending means, for compressing the extended design data; and difference means, operatively connected to said compression means and said expansion means, for subtracting the compressed design data from the expanded design data and for producing the inspection data therefrom.

Claim 7

Dependent Claim 222 words

A pattern defect inspection apparatus for inspecting and determining pattern defects on materials such as masks or wafers comprising: control means, for producing a deflection control signal, a video memory control signal and a stage control signal; scan beam source means, for producing a scan beam to scan the material to be inspected; deflection means, responsive to said control means, for accelerating and focusing the scanning beam in response to the deflection control signal; detector means, for detecting phenomenon produced by the scan beam reflected from the material to be inspected and for producing a video signal in response to the detected phenomenon; video memory means, operatively connected to said detection means and said control means, responsive to said control means, for digitizing the video signal and for storing the digital video signal in response to the video memory control signal; operator means, operatively connected to said video memory means, for performing operations upon the digital video signal and for producing a result; stage means, responsive to said control means, for holding the material to be inspected and for moving the material to a desired position in response to the stage control signal; and inspection data memory means, for storing inspection data; said control means outputs the result of the operator means, the result is the determination of the pattern defect inspection.

Claim 8

Dependent Claim 222 words

A pattern defect inspection apparatus for inspecting and determining pattern defects on materials such as masks or wafers comprising: control means, for producing a deflection control signal, a video memory control signal and a stage control signal; scan beam source means, for producing a scan beam to scan the material to be inspected; deflection means, responsive to said control means, for accelerating and focusing the scanning beam in response to the deflection control signal; detector means, for detecting phenomenon produced by the scan beam reflected from the material to be inspected and for producing a video signal in response to the detected phenomenon; video memory means, operatively connected to said detection means and said control means, responsive to said control means, for digitizing the video signal and for storing the digital video signal in response to the video memory control signal; operator means, operatively connected to said video memory means, for performing operations upon the digital video signal and for producing a result; stage means, responsive to said control means, for holding the material to be inspected and for moving the material to a desired position in response to the stage control signal; and inspection data memory means, for storing inspection data; said control means outputs the result of the operator means, the result is the determination of the pattern defect inspection.

Claim 9

Dependent Claim 85 words

The charged beam pattern defect inspection device as claimed in claim 6, wherein said operator mean comprises: primary differential operation means, for performing a primary differential operation upon the video signal and for producing primary differential data; binarization means, for comparing the primary differential data with a predetermined threshold value to binarize the primary differential data and for producing a binarized data; and difference operation means, for obtaining a difference between the binarized data and the inspection data stored in said inspection data memory means.

Claim 10

Dependent Claim 30 words

The charged beam pattern defect inspection device as claimed in claim 6, wherein said video memory means comprises: an A/D converter having a quantization range of more than 4 bits.

Claim 11

Dependent Claim 32 words

The charged beam pattern defect inspection device as claimed in claim 6 further comprises: inspection data means, for developing the inspection data stored in said inspection data memory means from design data.

Claim 12

Dependent Claim 110 words

The charged beam pattern defect inspection device as claimed in claim 9, wherein said inspection data means comprises: memory means, for storing the design data; picture data extending means, for bit map extending the design data and for storing the extended design data in a two dimensional array; expansion means, operatively connected to said picture extending means, for expanding the extended design data; compression means, operatively connected to said picture data extending means, for compressing the extended design data; and difference means, operatively connected to said compression means and said expansion means, for substracting the compressed design data from the expanded design data and for producing the inspection data therefrom.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1991-12-27	1992-06-27	1992-12-27	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	1995-12-27	1996-06-27	1996-12-27	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	1999-12-27	2000-06-27	2000-12-27	$7700.00	Window Closed / Lapsed

Charged beam pattern defect inspection apparatus

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