US4792687A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Freeman ion source
Assignee: Individual
•
Filing: 1987-04-30
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Granted: 1988-12-20
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Expires: 2007-04-30
Abstract
Abstract Specially shaped filaments improve the performance of Freeman ion sources. There are many different filament shapes covered by this invention. These shapes have two features in common--they have flat surfaces or facets, and two of these facets must join to form a knife edge. It is the purpose of these facets to direct negative ions away from the extraction slit. These negative ions are emitted from the filament normal to the surface. If the knife edge is directed toward the slit, very little of the negative ion flux can enter the extraction slit. In effect, the filament becomes invisible at the slit as far as negative ion flux is concerned. A converse application in which a large negative ion flux is desirable, requires shaping of the filament with a smooth concave surface in order to maximize the cathode surface normal to the extraction slit.
Inventors
- 👤 Richard M. Mobley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 13:47
CPC Classifications
H; H01; H01J; H01J27/00; H01J27/02; H01J27/022; H01J27/08; H01J27/14
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
161 words
An ion source, comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatures; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a negative polarity to said extraction electrode with respect to said arc chamber, whereby positive ions in said arc discharge may be extracted through said extraction slit; said filament having surfaces so arranged that substantially no normal to any said surface passes through said extraction slit, whereby substantially no negative ions formed at said surfaces pass through said extraction slit.
Claim 2
Dependent Claim
161 words
An ion source, comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatures; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a negative polarity to said extraction electrode with respect to said arc chamber, whereby positive ions in said arc discharge may be extracted through said extraction slit; said filament having surfaces so arranged that substantially no normal to any said surface passes through said extraction slit, whereby substantially no negative ions formed at said surfaces pass through said extraction slit.
Claim 3
Dependent Claim
21 words
An ion source according to claim 1, wherein said filament has an edge aligned with and pointing toward said extraction slit.
Claim 4
Dependent Claim
24 words
An ion source according to claim 2, wherein said edge is formed by the junction of two substantially planar surfaces at an apex ridge.
Claim 5
Dependent Claim
71 words
An ion source according to claim 1, wherein said filament is supported upon supports, wherein said electric field means maintains a positive potential on said arc chamber with respect to a cathode potential on said filament and supports so as to maintain said arc discharge, and wherein said filament and supports have surfaces so arranged that substantially no normal to any said surface at cathode potential passes through said extraction slit.
Claim 6
Independent Claim
238 words
A method of producing boron ions with an ion source comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatues; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a negative polarity to said extraction electrode with respect to said arc chamber, whereby positive ions in said arc discharge may be extracted through said extraction slit; said filament having surfaces so arranged that substantially no normal to any said surface passes through said extraction slit, whereby substantially no negative ions formed at said surfaces pass through said extraction slit, said method comprising producing an arc discharge in boron trifluoride between said arc chamber having an extraction slit and said filament contained therein and, in so doing, maintaining said magnetic field parallel to said filament; producing boron ions by impact of BF 2 + and BF + on cathode surfaces; said surfaces having normals thereto substantially none of which pass through said slit; and extracting boron ions through said slit.
Claim 7
Independent Claim
238 words
A method of producing boron ions with an ion source comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatues; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a negative polarity to said extraction electrode with respect to said arc chamber, whereby positive ions in said arc discharge may be extracted through said extraction slit; said filament having surfaces so arranged that substantially no normal to any said surface passes through said extraction slit, whereby substantially no negative ions formed at said surfaces pass through said extraction slit, said method comprising producing an arc discharge in boron trifluoride between said arc chamber having an extraction slit and said filament contained therein and, in so doing, maintaining said magnetic field parallel to said filament; producing boron ions by impact of BF 2 + and BF + on cathode surfaces; said surfaces having normals thereto substantially none of which pass through said slit; and extracting boron ions through said slit.
Claim 8
Independent Claim
213 words
A method of enhancing the production of elemental ion species relative to molecular ion species (when using materials such as BF 3 , SF 6 , UF 6 , SiF 4 in an ion source comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatures; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a negative polarity to said extraction electrode with respect to said arc chamber, whereby positive ions in said arc discharge may be extracted through said extraction slit) comprising maximizing the area of the surface of said filament for a given cross-sectional area of said filament, maximizing the areas of the surfaces of other metal parts at the potential of said filament, and arranging the said surfaces so that substantially no normal to any said surface passes through said extraction slit.
Claim 9
Independent Claim
213 words
A method of enhancing the production of elemental ion species relative to molecular ion species (when using materials such as BF 3 , SF 6 , UF 6 , SiF 4 in an ion source comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatures; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a negative polarity to said extraction electrode with respect to said arc chamber, whereby positive ions in said arc discharge may be extracted through said extraction slit) comprising maximizing the area of the surface of said filament for a given cross-sectional area of said filament, maximizing the areas of the surfaces of other metal parts at the potential of said filament, and arranging the said surfaces so that substantially no normal to any said surface passes through said extraction slit.
Claim 10
Dependent Claim
155 words
An ion source for producing a large negative ion flux comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatures; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a positive polarity to said extraction electrode with respect to said arc chamber, whereby negative ions in said arc discharge may be extracted through said extraction slit; said filament having a smooth concave surface adapted to maximize the cathode surface having normals passing through the extraction slit.
Claim 11
Dependent Claim
155 words
An ion source for producing a large negative ion flux comprising in combination an arc chamber having an extraction slit; a straight filament supported within said arc chamber near said extraction slit and aligned therewith; means for applying a magnetic field within said arc chamber parallel to said filament; a filament power supply adapted to heat said filament to electron-emitting temperatures; an arc power supply adapted to maintain an arc discharge within said arc chamber by applying a negative polarity to said filament with respect to said arc chamber; an extraction electrode outside said arc chamber and aligned with said extraction slit; a power supply adapted to apply a positive polarity to said extraction electrode with respect to said arc chamber, whereby negative ions in said arc discharge may be extracted through said extraction slit; said filament having a smooth concave surface adapted to maximize the cathode surface having normals passing through the extraction slit.
References Cited (Backward Citations)
US4467240A
Cited
US4542321A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-12-20 | 1992-06-20 | 1992-12-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-12-20 | 1996-06-20 | 1996-12-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-12-20 | 2000-06-20 | 2000-12-20 | $7700.00 | Window Closed / Lapsed |