US4789611A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for amending a photomask
Assignee: Fujitsu Ltd
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Filing: 1986-12-11
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Granted: 1988-12-06
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Expires: 2006-12-11
Abstract
Abstract A method for amending a defective mask pattern of a photomask. A pattern component of a normal mask pattern having the same pattern layout as that of the defective mask pattern to be amended is irradiated by a spotlight. The shape of the spotlight is aligned with the shape of the pattern component which is the same pattern as the component of the defective mask pattern to be amended. At least one base mark is aligned with at least another pattern component near the irradiated portion. Then, the position of the base mark relative to the position of the irradiated portion is fixed. After that, the normal mask pattern is replaced by the defective mask pattern. The base mark is aligned with a pattern component near the defective pattern component in the same manner as the alignment of the normal mask pattern. After that, the spotlight irradiates the defective mask pattern, the luminous intensity of said spotlight being intensified so that it can amend the defective pattern component.
Inventors
- 👤 Yutaka Miyahara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 07:51
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/72; G03F1/82; G03F1/84; Y; Y10; Y10S; Y10S430/00; Y10S430/146
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
340 words
A method for amending a defective mask pattern of a photomask which comprises a plurality of same mask patterns each of which comprises a plurality of pattern components, this method comprising the steps of: (a) representing an enlarged image of a normal mask pattern having the same pattern layout as that of the defective mask pattern to be amended in a view field; (b) irradiating a pattern component of said normal mask pattern by a spotlight; (c) aligning said spotlight with one of the pattern components of said normal mask pattern, said one of the pattern components corresponding to the pattern component of the defective mask pattern to be amended, so that the shape of said spotlight coincides with that of the one of the pattern components of said normal mask pattern; (d) representing at least one base mark optically in said view field said base mark including first and second independently movable base lines; (e) aligning at least one base mark with at least one pattern component near the irradiated portion while said normal mask pattern is irradiated by the spotlight; (f) fixing the position of said base mark relative to the position of said irradiated portion in the condition that said spotlight is aligned with the pattern component of sid normal mask pattern and said base mark is aligned with said one pattern component near the irradiated portion; (g) representing the defective mask pattern formed on the same photomask on which said normal mask pattern is formed in said view field by shifting said photomask so as to replace the normal mask pattern with said defective mask pattern; (h) aligning said base mark with a pattern component near the defective pattern component in the same manner as the alignment of the normal mask pattern, with the base mark being kept fixed with respect to the spotlight in the state of step (f); and (i) irradiating the defective mask pattern with an exposure light having the same shape as that of said spotlight, thereby amending the defective pattern component.
Claim 2
Independent Claim
340 words
A method for amending a defective mask pattern of a photomask which comprises a plurality of same mask patterns each of which comprises a plurality of pattern components, this method comprising the steps of: (a) representing an enlarged image of a normal mask pattern having the same pattern layout as that of the defective mask pattern to be amended in a view field; (b) irradiating a pattern component of said normal mask pattern by a spotlight; (c) aligning said spotlight with one of the pattern components of said normal mask pattern, said one of the pattern components corresponding to the pattern component of the defective mask pattern to be amended, so that the shape of said spotlight coincides with that of the one of the pattern components of said normal mask pattern; (d) representing at least one base mark optically in said view field said base mark including first and second independently movable base lines; (e) aligning at least one base mark with at least one pattern component near the irradiated portion while said normal mask pattern is irradiated by the spotlight; (f) fixing the position of said base mark relative to the position of said irradiated portion in the condition that said spotlight is aligned with the pattern component of sid normal mask pattern and said base mark is aligned with said one pattern component near the irradiated portion; (g) representing the defective mask pattern formed on the same photomask on which said normal mask pattern is formed in said view field by shifting said photomask so as to replace the normal mask pattern with said defective mask pattern; (h) aligning said base mark with a pattern component near the defective pattern component in the same manner as the alignment of the normal mask pattern, with the base mark being kept fixed with respect to the spotlight in the state of step (f); and (i) irradiating the defective mask pattern with an exposure light having the same shape as that of said spotlight, thereby amending the defective pattern component.
Claim 3
Dependent Claim
22 words
A photomask amending method according to claim 1, in which said spotlight is derived from a light source through an optical filter.
Claim 4
Dependent Claim
29 words
A photomask amending method according to claim 2, in which said exposure light exposes a resist agent coated on said photomask so as tom amend the defective pattern component.
Claim 5
Dependent Claim
22 words
The method of claim 2, wherein the exposure light is derived from the same light source and optical filter as said spotlight.
Claim 6
Dependent Claim
19 words
A photomask amending method according to claim 1, in which a laser beam is used as said exposure light.
Claim 7
Dependent Claim
14 words
The method of claim 1, wherein the defective photomask pattern comprises a hard mask.
Claim 8
Independent Claim
17 words
The method of claims 1 or 6, wherein the defective mask pattern has a pattern component omitted.
Claim 9
Dependent Claim
23 words
The method of claim 1 or 6, wherein the defective mask pattern has a component to be amended having no clearly defined profile.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-12-06 | 1992-06-06 | 1992-12-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-12-06 | 1996-06-06 | 1996-12-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-12-06 | 2000-06-06 | 2000-12-06 | $7700.00 | Window Closed / Lapsed |