Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
237 words
A coplanar die to substrate bond method for multichip modules and the like comprising the steps of: providing a silicon wafer substrate having die openings incorporated therein, each of said die openings having a plurality of sidewalls; providing a plurality of die to be disposed in said die openings of said silicon wafer substrate, each of said plurality of die having a plurality of edges; placing said plurality of die on a plate in a predetermined relationship to each other; disposing and aligning said silicon wafer substrate on said plate with said die so that said plurality of die are disposed in said die openings of said silicon wafer substrate; applying a slurry of glass between said plurality of sidewalls of said die openings of said silicon wafer substrate and said edges of said plurality of die while still on said plate, said slurry of glass being at least partially dried to hold said plurality of die and said silicon wafer substrate together; placing said silicon wafer substrate including said plurality of die held thereto by said glass on a grooved plate having a plurality of grooves, said grooves being aligned with said sidewalls of said die openings of said silicon wafer substrate, said edges of said plurality of die and said glass therebetween; and firing said silicon wafer substrate, said plurality of die and said glass while on said grooved plate until said glass becomes fused.
Claim 2
Dependent Claim
237 words
A coplanar die to substrate bond method for multichip modules and the like comprising the steps of: providing a silicon wafer substrate having die openings incorporated therein, each of said die openings having a plurality of sidewalls; providing a plurality of die to be disposed in said die openings of said silicon wafer substrate, each of said plurality of die having a plurality of edges; placing said plurality of die on a plate in a predetermined relationship to each other; disposing and aligning said silicon wafer substrate on said plate with said die so that said plurality of die are disposed in said die openings of said silicon wafer substrate; applying a slurry of glass between said plurality of sidewalls of said die openings of said silicon wafer substrate and said edges of said plurality of die while still on said plate, said slurry of glass being at least partially dried to hold said plurality of die and said silicon wafer substrate together; placing said silicon wafer substrate including said plurality of die held thereto by said glass on a grooved plate having a plurality of grooves, said grooves being aligned with said sidewalls of said die openings of said silicon wafer substrate, said edges of said plurality of die and said glass therebetween; and firing said silicon wafer substrate, said plurality of die and said glass while on said grooved plate until said glass becomes fused.
Claim 3
Dependent Claim
26 words
The method of claim 1 wherein the placing said plurality of die on a plate step includes placing said plurality of die on a vacuum plate.
Claim 4
Dependent Claim
27 words
The method of claim 1 wherein the placing said plurality of die on a plate step includes placing said plurality of die on a boron nitrite plate.
Claim 5
Dependent Claim
28 words
The method of claim 1 wherein the placing said silicon wafer substrate on a grooved plate step includes placing said silicon wafer substrate on a grooved vacuum plate.
Claim 6
Dependent Claim
36 words
The method of claim 4 wherein the placing said silicon wafer substrate on a grooved vacuum plate step includes placing said silicon wafer substrate on a grooved vacuum plate having no vacuum in the grooves themselves.
Claim 7
Dependent Claim
29 words
The method of claim 1 wherein the placing said silicon wafer substrate on a grooved plate step includes placing said silicon wafer substrate on a boron nitrite grooved plate.
Claim 8
Dependent Claim
31 words
The method of claim 1 wherein the applying a slurry of glass, placing said silicon wafer substrate on a grooved plate and firing steps are repeated a predetermined number of times.
Claim 9
Dependent Claim
19 words
The method of claim 7 wherein subsequent firing steps may be performed at higher temperatures than previous firing steps.
Claim 10
Dependent Claim
203 words
A coplanar die to substrate bond method for multichip modules and the like comprising the steps of: providing a silicon wafer substrate having die openings incorporated therein, each of said die openings having a plurality of sidewalls; providing a plurality of die to be disposed in said die openings of said silicon wafer substrate, each of said plurality of die having a plurality of edges; placing said plurality of die in a predetermined position on a grooved plate having a plurality of grooves; disposing and aligning said silicon wafer substrate on said grooved plate with said plurality of die so that said plurality of die are disposed in said die openings of said silicon wafer substrate, said plurality of grooves of said grooved plate being aligned with said sidewalls of said die openings of said silicon wafer substrate and said edges of said plurality of die; applying a slurry of glass between said plurality of sidewalls of said plurality of die openings of said silicon wafer substrate and said edges of said plurality of die while still on said grooved plate; and firing said silicon wafer substrate, said plurality of die and said glass on said grooved plate until said glass becomes fused.
Claim 11
Dependent Claim
203 words
A coplanar die to substrate bond method for multichip modules and the like comprising the steps of: providing a silicon wafer substrate having die openings incorporated therein, each of said die openings having a plurality of sidewalls; providing a plurality of die to be disposed in said die openings of said silicon wafer substrate, each of said plurality of die having a plurality of edges; placing said plurality of die in a predetermined position on a grooved plate having a plurality of grooves; disposing and aligning said silicon wafer substrate on said grooved plate with said plurality of die so that said plurality of die are disposed in said die openings of said silicon wafer substrate, said plurality of grooves of said grooved plate being aligned with said sidewalls of said die openings of said silicon wafer substrate and said edges of said plurality of die; applying a slurry of glass between said plurality of sidewalls of said plurality of die openings of said silicon wafer substrate and said edges of said plurality of die while still on said grooved plate; and firing said silicon wafer substrate, said plurality of die and said glass on said grooved plate until said glass becomes fused.
Claim 12
Dependent Claim
28 words
The method of claim 9 wherein the placing said plurality of die on a grooved plate step includes placing said plurality of die on a grooved vacuum plate.
Claim 13
Dependent Claim
36 words
The method of claim 10 wherein the placing said plurality of die on a grooved vacuum plate step includes placing said plurality of die on a grooved vacuum plate having no vacuum in the grooves themselves.
Claim 14
Dependent Claim
29 words
The method of claim 9 wherein the placing said plurality of die on a grooved plate step includes placing said plurality of die on a boron nitrite grooved plate.
Claim 15
Dependent Claim
22 words
The method of claim 9 wherein the applying a slurry of glass and firing steps are repeated a predetermined number of times.
Claim 16
Dependent Claim
19 words
The method of claim 13 wherein subsequent firing steps may be performed at higher temperatures than previous firing steps.