US4774158A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of determining an exposure dose of a photosensitive lacquer layer
Assignee: US Philips Corp
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Filing: 1986-09-22
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Granted: 1988-09-27
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Expires: 2006-09-22
Abstract
Abstract On a photosensitive lacquer present on a substrate, details having a line width in the range of 0.5 μm-2 μm have to be accurately reproduced in the lacquer layer. In order to determine the exposure does or time, the lacquer layer is exposed through a raster pattern comprising alternately transparent and non-transparent line-shaped regions of the desired width. The raster pattern is then laterally displaced over a distance equal to the line width in a direction at right angles to the longitudinal direction of the lines, after which an exposure is carried out again at the same dose. The process is repeated at a few areas, but at a different exposure dose, after which a reference exposure dose is determined in that it is ascertained what dose is required to just dissolve entirely the photosensitive lacquer layer after development.
Inventors
- 👤 Marinus H. M. Vervoordeldonk
- 👤 Rolandus P. M. J. Leerschool
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:00
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70558; G03F7/20
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
186 words
A method of determining the exposure dose or exposure time of a photosensitive lacquer layer on a substrate to obtain a lacquer pattern having line widths in the range from 0.5 μm to 2 μm comprising the steps of exposing a photosensitive lacquer layer on a substrate to a raster pattern at a given exposure dose in a first area of said photosensitive lacquer layer, said raster pattern including line-shaped regions of predetermined width, said line-shaped regions being alternately transparent and non-transparent; then laterally displacing said raster pattern over a distance equal to said predetermined width in a direction at right angles to the longitudinal direction of said line-shaped regions; thereafter carrying out another exposure of said lacquer layer at said given exposure dose; selecting a plurality of different areas of said lacquer layer and with a plurality of different exposure doses repeating said steps of exposing, then laterally displacing, and thereafter carrying out another exposure; and determining a reference exposure dose from these repeated steps by developing said lacquer layer, said reference exposure dose being sufficient to just entirely dissolve said lacquer layer after developing.
Claim 2
Independent Claim
186 words
A method of determining the exposure dose or exposure time of a photosensitive lacquer layer on a substrate to obtain a lacquer pattern having line widths in the range from 0.5 μm to 2 μm comprising the steps of exposing a photosensitive lacquer layer on a substrate to a raster pattern at a given exposure dose in a first area of said photosensitive lacquer layer, said raster pattern including line-shaped regions of predetermined width, said line-shaped regions being alternately transparent and non-transparent; then laterally displacing said raster pattern over a distance equal to said predetermined width in a direction at right angles to the longitudinal direction of said line-shaped regions; thereafter carrying out another exposure of said lacquer layer at said given exposure dose; selecting a plurality of different areas of said lacquer layer and with a plurality of different exposure doses repeating said steps of exposing, then laterally displacing, and thereafter carrying out another exposure; and determining a reference exposure dose from these repeated steps by developing said lacquer layer, said reference exposure dose being sufficient to just entirely dissolve said lacquer layer after developing.
Claim 3
Dependent Claim
88 words
A method according to claim 1, wherein the further steps are carried out of determining an exposure dose for obtaining said predetermined width for a given photosensitive lacquer layer, determining a difference between said exposure dose for obtaining said predetermined width for a given photosensitive lacquer layer and said reference exposure dose obtained under the same process conditions, and choosing for each lot of substrates to be treated an exposure dose equal to a sum of a reference exposure dose to be obtained and the difference value determined.
References Cited (Backward Citations)
US3998639A
Cited
US4021239A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-09-27 | 1992-03-28 | 1992-09-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-09-27 | 1996-03-28 | 1996-09-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-09-27 | 2000-03-28 | 2000-09-27 | $7700.00 | Window Closed / Lapsed |