US4770974A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Microlithographic resist containing poly(1,1-dialkylsilazane)
Assignee: International Business Machines Corp
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Filing: 1987-07-27
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Granted: 1988-09-13
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Expires: 2007-07-27
Abstract
Abstract A resist composition is made resistant to reactive ion etching by admixing therewith a poly(dialkylsilazane).
Inventors
- 👤 Hiroyuki Hiraoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 11:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
74 words
A microlithographic resist composition consisting essentially of a photoresist-forming resin and admixed therewith, in an amount from about 3.6% to about 15% by weight of said resist composition, a poly(dialkyl-silazane) in which from 100% to 50% of the monomeric units have hydrogen attached directly to the nitrogen atom, with the remainder of the monomeric units having only alkyl groups attached to the nitrogen atom, and with the alkyl groups being either methyl or ethyl.
Claim 2
Dependent Claim
74 words
A microlithographic resist composition consisting essentially of a photoresist-forming resin and admixed therewith, in an amount from about 3.6% to about 15% by weight of said resist composition, a poly(dialkyl-silazane) in which from 100% to 50% of the monomeric units have hydrogen attached directly to the nitrogen atom, with the remainder of the monomeric units having only alkyl groups attached to the nitrogen atom, and with the alkyl groups being either methyl or ethyl.
Claim 3
Dependent Claim
12 words
A composition as claimed in claim 1 wherein the poly(dialkylsilazane) is poly(1,1-dimethylsilazine).
Claim 4
Dependent Claim
14 words
A composition as claimed in claim 1 wherein the resist is a positive resist.
Claim 5
Dependent Claim
14 words
A composition as claimed in claim 1 wherein the resist is a negative resist.
Claim 6
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the resist resin is a novolac resin.
Claim 7
Dependent Claim
13 words
A composition as claimed in claim 1 wherein the poly(dialkylsilazane) is a solid.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-09-13 | 1992-03-14 | 1992-09-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-09-13 | 1996-03-14 | 1996-09-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-09-13 | 2000-03-14 | 2000-09-13 | $7700.00 | Window Closed / Lapsed |