US4765744A
Expired / Lapsed
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Method for testing a photomask
Assignee: Fujitsu Ltd
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Filing: 1987-03-05
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Granted: 1988-08-23
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Expires: 2007-03-05
Abstract
Abstract A photomask comprises a tested pattern (P 1 , P 2 ) and a synchronization pattern (SP 1 ˜SP 8 ). The synchronization pattern is used for synchronizing a scanning signal (S 9 ), obtained from the tested pattern, with a reference signal (S 10 ), based on a reference pattern data stored on a magnetic tape (7).
Inventors
- 👤 Kenichi Kobayashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 00:37
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/38; G03F1/44; G01; G01N; G01N21/00; G01N21/84; G01N21/88; G01N21/95; G01N21/956; G03F1/68; G03F1/82; G03F1/84; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
329 words
A method for testing a photomask comprising the steps of: (a) forming a synchronization pattern surrounding a photomask pattern including first through fourth linear synchronization patterns having an elongated shape formed continuously in first and second directions, the first linear synchronization pattern extending in the first direction, the second linear synchronization pattern formed continuously from an end of the first linear synchronization pattern and extending in the second direction which is perpendicular to the first direction, the third linear synchronization pattern formed continuously from an end of the second linear synchronization pattern and extending in the first direction so as to be parallel to the first linear synchronization pattern, and the fourth linear synchronization pattern formed parallel to the second linear synchronization pattern, a space being formed between each of the first and third linear synchronization patterns and the fourth linear synchronization pattern; (b) storing a reference data, corresponding to a normal mask pattern, into a first storing means; (c) mounting the photomask on a stage; (d) optically scanning the first through fourth linear synchronization patterns and the photomask by driving the stage along the second direction and generating a scanning signal including a synchronization signal for each scanning operation, for detecting whether the photomask is upside down by detecting the space between the fourth linear synchronization pattern and each of the first and third linear synchronization patterns, the scanning direction being reversed at the end of each scanning operation; (e) detecting a start of a pattern generating area along the second direction by driving the stage along the first direction; (f) reading the reference data corresponding to the scanning signal from the first storing means in response to the synchronization signal, for generating a reference signal; (g) comparing the scanning signal with the reference signal; and (h) storing a position of the stage into a second storing means when the scanning signal is inconsistent with the reference signal, to form a failure map in the second storing means.
Claim 2
Independent Claim
329 words
A method for testing a photomask comprising the steps of: (a) forming a synchronization pattern surrounding a photomask pattern including first through fourth linear synchronization patterns having an elongated shape formed continuously in first and second directions, the first linear synchronization pattern extending in the first direction, the second linear synchronization pattern formed continuously from an end of the first linear synchronization pattern and extending in the second direction which is perpendicular to the first direction, the third linear synchronization pattern formed continuously from an end of the second linear synchronization pattern and extending in the first direction so as to be parallel to the first linear synchronization pattern, and the fourth linear synchronization pattern formed parallel to the second linear synchronization pattern, a space being formed between each of the first and third linear synchronization patterns and the fourth linear synchronization pattern; (b) storing a reference data, corresponding to a normal mask pattern, into a first storing means; (c) mounting the photomask on a stage; (d) optically scanning the first through fourth linear synchronization patterns and the photomask by driving the stage along the second direction and generating a scanning signal including a synchronization signal for each scanning operation, for detecting whether the photomask is upside down by detecting the space between the fourth linear synchronization pattern and each of the first and third linear synchronization patterns, the scanning direction being reversed at the end of each scanning operation; (e) detecting a start of a pattern generating area along the second direction by driving the stage along the first direction; (f) reading the reference data corresponding to the scanning signal from the first storing means in response to the synchronization signal, for generating a reference signal; (g) comparing the scanning signal with the reference signal; and (h) storing a position of the stage into a second storing means when the scanning signal is inconsistent with the reference signal, to form a failure map in the second storing means.
Claim 3
Dependent Claim
27 words
A photomask as set forth in claim 1, wherein said step (a) includes forming the first through fourth linear synchronization patterns on the periphery of the photomask.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-08-23 | 1992-02-22 | 1992-08-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-08-23 | 1996-02-22 | 1996-08-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-08-23 | 2000-02-22 | 2000-08-23 | $7700.00 | Window Closed / Lapsed |