US4763972A
Expired / Lapsed
US
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Differential absorption polarizer, a method of forming same and device implementing said method
Assignee: Thales SA
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Filing: 1986-09-24
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Granted: 1988-08-16
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Expires: 2006-09-24
Abstract
Abstract A differential absorption polarizer is constructed to be used in accordance with integrated optics. This polarizer includes, on a waveguide layer formed on a substrate, a layer of dielectric material whose surface has hollows and bosses and therefore several inclined zones. The hollows and bosses define minimum (em) and maximum (eM) thicknesses of the layer, which bracket the resonance thickness of the dielectric for the polarization there to be absorbed. The dielectric material layer is coated with a metal layer.
Inventors
- 👤 Michel Papuchon
- 👤 Alain Enard
- 👤 Sylvie Vatoux
- 👤 Michel Werner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 21:09
CPC Classifications
G; G02; G02B; G02B6/00; G02B6/10; G02B6/105; G02B6/12; G02B6/126; Y; Y10; Y10S; Y10S359/00; Y10S359/90
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
152 words
A differential absorption polarizer constructed in integrated optics, comprising: a substrate of a first index having on one face a first layer of a guide material of a second index, for guiding at least one transverse magnetic TM polarization of a wave S; a second layer of a dielectric material of a third index whose face opposite the common face with the first guide material has several zones inclined with respect to the plane of the face, for each of said inclined zones,the value of the lowest thickness (em) of the dielectric material and the value of the highest thickness (eM) of the same dielectric material bracketing the value of the resonance thickness (er) of the dielectric material for said transverse magnetic TM polarization mode and wherein said inclined zones form an irregular surface; a third layer of a metal material deposited on the face of the dielectric layer having inclined zones.
Claim 2
Dependent Claim
152 words
A differential absorption polarizer constructed in integrated optics, comprising: a substrate of a first index having on one face a first layer of a guide material of a second index, for guiding at least one transverse magnetic TM polarization of a wave S; a second layer of a dielectric material of a third index whose face opposite the common face with the first guide material has several zones inclined with respect to the plane of the face, for each of said inclined zones,the value of the lowest thickness (em) of the dielectric material and the value of the highest thickness (eM) of the same dielectric material bracketing the value of the resonance thickness (er) of the dielectric material for said transverse magnetic TM polarization mode and wherein said inclined zones form an irregular surface; a third layer of a metal material deposited on the face of the dielectric layer having inclined zones.
Claim 3
Dependent Claim
21 words
The absorption polarizer as claimed in claim 1, wherein the inclined zones have substantially the same slope and the same shape.
Claim 4
Dependent Claim
23 words
The absorption polarizer as claimed in claim 1, wherein the inclined zones have a regular pitch (p) at the surface of the dielectric.
Claim 5
Dependent Claim
21 words
The absorption polarizer as claimed in claim 1, wherein the inclined zones form an undulating surface on the dielectric material layer.
Claim 6
Dependent Claim
17 words
The absorption polarizer as claimed in claim 4, wherein the undulating surface has a generaly sinusoidal shape.
Claim 7
Dependent Claim
16 words
The absorption polarizer as claimed in claim 1, wherein the dielectric material layer comprises an oxide.
Claim 8
Dependent Claim
19 words
The absorption polarizer as claimed in claim 6, wherein said oxide is a mixture of silica and titanium oxide.
Claim 9
Dependent Claim
104 words
A method of constructing a differential absorption polarizer as claimed in claim 1, including a first phase of depositing on a substrate a layer of a guide material for guiding a transverse magnetic polarization mode (TM) of a wave, a second phase of depositing on the guide material layer a layer of a dielectric material, a third phase of depositing on the dielectric material layer a layer of a metal material, further comprising, between said second and third phases, an additional phase for forming a plurality of inclined zones at the surface of the dielectric material layer so as to have an irregular surface.
Claim 10
Dependent Claim
46 words
The method of constructing a polarizer as claimed in claim 8, wherein the second phase of depositing a layer of a dielectric material comprises a step of depositing a layer of an organometallic liquid followed by an evaporation and oxidation step by heating said liquid layer.
Claim 11
Dependent Claim
37 words
The method of constructing a polarizer as claimed in claim 9, wherein the additional forming phase comprises a stamping operation of said dielectric material layer after preliminary heating of the liquid layer and before complete hardening thereof.
Claim 12
Dependent Claim
21 words
The method for constructing a polarizer as claimed in claim 8, wherein the additional forming phase comprises an ionic shaping operation.
Claim 13
Dependent Claim
38 words
The method of constructing a polarizer as claimed in claim 11, wherein the ionic shaping operation takes place through a masking grid so that etching by the ions at the surface of the dielectric layer takes place non-uniformly.
Claim 14
Dependent Claim
17 words
The method of constructing a polarizer as claimed in claim 9, wherein the organometalic liquid comprises titanium.
Claim 15
Dependent Claim
17 words
The method of constructing a polarizer as claimed in claim 9, wherein the organometallic liquid comprises silicon.
Claim 16
Dependent Claim
19 words
The method of constructing a polarizer as claimed in claim 9, wherein the organometallic liquid comprises titanium and silicon.
Claim 17
Dependent Claim
48 words
A device for the ionic etching of said dielectric layer as claimed in claim 8, comprising an ion gun emitting a beam of ions towards said face of the dielectric layer, and further comprising a grid inserted between the ion gun and said face of the dielectric layer.
Claim 18
Dependent Claim
34 words
The ionic etching device according to claim 16, wherein said grid has a series of rectilinear wires disposed parallel in a plane substantially parallel to the plane of the face of the dielectric layer.
Claim 19
Dependent Claim
16 words
The ionic etching device as claimed in claim 17, wherein said wires are made from tungsten.
References Cited (Backward Citations)
US3918136A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-08-16 | 1992-02-15 | 1992-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-08-16 | 1996-02-15 | 1996-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-08-16 | 2000-02-15 | 2000-08-16 | $7700.00 | Window Closed / Lapsed |