Abstract Described is a transparent electroconductive material composed of a transparent synthetic resin substrate and a transparent electroconductive film formed on the resin substrate. At least a surface portion of the resin substrate on which the electroconductive film is formed satisfies a requirement represented by the formula: F x Hv=0.4 wherein F is the mole number ( mu mole/cm2) of a basic dye that can react with or adhere to the unit area of the surface of the synthetic resin, and Hv is the Vickers hardness as determined according to JIS Z-2244. The absolute value of the photoelasticity constant of the resin substrate below the glass transition temperature thereof is not larger than 15 Brewsters. A preferred transparent electroconductive material is prepared by coating an active energy ray-curing composition satisfying a requirement represented by the above formula on a surface of the transparent synthetic resin substrate having the above-mentioned absolute value of the photoelasticity constant; curing the composition with active energy rays; and forming a transparent electroconductive film on the coating layer by a low-temperature sputtering method at a temperature lower than 100 DEG C.
A transparent electroconductive material comprising a substrate of transparent synthetic resin with a thickness of at least 0.3 mm and a transparent electroconductive film formed directly on the transparent synthetic resin substrate, said transparent synthetic resin being a methyl methacrylate copolymer derived from a monomer mixture comprising methyl methacrylate and at least one comonomer selected from the group consisting of an ester of acrylic acid with an alkylene diol and an ester of methacrylic acid with an alkylene diol and said transparent synthetic resin substrate satisfying a requirement represented by the following formula (1): F×Hv≧0.4 (1) wherein
Claim 2
Dependent Claim
97 words
A transparent electroconductive material comprising a substrate of transparent synthetic resin with a thickness of at least 0.3 mm and a transparent electroconductive film formed directly on the transparent synthetic resin substrate, said transparent synthetic resin being a methyl methacrylate copolymer derived from a monomer mixture comprising methyl methacrylate and at least one comonomer selected from the group consisting of an ester of acrylic acid with an alkylene diol and an ester of methacrylic acid with an alkylene diol and said transparent synthetic resin substrate satisfying a requirement represented by the following formula (1): F×Hv≧0.4 (1) wherein
Claim 3
Dependent Claim
68 words
F stands for the mole number (μmole/cm 2 ) of a basic dye that can react with or adhere to the unit area of the surface of the transparent synthetic resin, and Hv stands for the Vickers hardness as determined according to the method of JIS Z-2244, and the absolute value of the photoelastic resin substrate below the glass transition temperature thereof being not large than 15 Brewsters.
Claim 4
Dependent Claim
68 words
F stands for the mole number (μmole/cm 2 ) of a basic dye that can react with or adhere to the unit area of the surface of the transparent synthetic resin, and Hv stands for the Vickers hardness as determined according to the method of JIS Z-2244, and the absolute value of the photoelastic resin substrate below the glass transition temperature thereof being not large than 15 Brewsters.
Claim 5
Dependent Claim
30 words
The transparent electroconductive material according to claim 1, wherein the transparent electroconductive film is formed of a metal oxide having a surface resistivity of 10 -1 to 10 9 Ω/□.
Claim 6
Dependent Claim
21 words
The transparent electroconductive material according to claim 2 wherein the metal oxide is a mixture of indium oxide and tin oxide.
Claim 7
Dependent Claim
21 words
The transparent electroconductive material according to claim 2, wherein the metal oxide is a mixture of tin oxide and antimony oxide.