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US4749449A Expired / Lapsed US ⏱️ 0.0 years remaining

Metallization utilizing a catalyst which is removed or deactivated from undesired surface areas

Assignee: EIDP Inc
•
Filing: 1987-06-05
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Granted: 1988-06-07
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Expires: 2007-06-05
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Abstract

Abstract Metallization of nonconductive through holes with pattern plating of a conductive surface is undertaken by removing or deactivating a catalyst from undesired areas prior to electroplating onto the catalyzed surface.

Inventors

  • 👤 Kevin D. Scott

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 15:25
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/40; H05K3/42; H05K3/423; H05K3/424; C; C25; C25D; C25D5/00; C25D5/02; C25D5/022; C25D5/54; C25D5/56; C25F; C25F1/00; H05K2203/00; H05K2203/07; H05K2203/0703; H05K2203/0706; H05K2203/0716; H05K3/10; H05K3/108; H05K3/425; H05K3/427

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 193 words
A process of electroplating an adherent electrically conductive coating onto a catalyzed nonconductive surface wherein the improvement comprises plating the conductive coating on at least one catalyzed through hole wall in a conductive layer and an insulating layer to form an electrically conductive pathway through the hole and plating the conductive coating in a pattern on a surface of the conductive layer comprising the steps of: (a) forming at least one through hole through two layers of an article comprising a conductive layer and an insulating layer; (b) forming a resist image on the surface of the conductive layer; (c) applying all essential components of a catalyst system to the resist, exposed surface of the conductive layer and through hole wall; (d) applying a removing or deactivating substance to the surface of the resist which does not substantially penetrate into the through hole and which removes or deactivates catalyst on the surface of the resist without substantially affecting the catalyst present on the surface of the through hole; (e) electroplating the through hole with an adherent conductive layer to form an electrically conductive pathway without plating an adherent conductive layer on the resist.
Claim 2
Dependent Claim 193 words
A process of electroplating an adherent electrically conductive coating onto a catalyzed nonconductive surface wherein the improvement comprises plating the conductive coating on at least one catalyzed through hole wall in a conductive layer and an insulating layer to form an electrically conductive pathway through the hole and plating the conductive coating in a pattern on a surface of the conductive layer comprising the steps of: (a) forming at least one through hole through two layers of an article comprising a conductive layer and an insulating layer; (b) forming a resist image on the surface of the conductive layer; (c) applying all essential components of a catalyst system to the resist, exposed surface of the conductive layer and through hole wall; (d) applying a removing or deactivating substance to the surface of the resist which does not substantially penetrate into the through hole and which removes or deactivates catalyst on the surface of the resist without substantially affecting the catalyst present on the surface of the through hole; (e) electroplating the through hole with an adherent conductive layer to form an electrically conductive pathway without plating an adherent conductive layer on the resist.
Claim 3
Dependent Claim 15 words
The process of claim 1 wherein a cleaner-conditioner is a portion of the catalyst system.
Claim 4
Dependent Claim 12 words
The process of claim 1 wherein the adherent conductive coating is copper.
Claim 5
Dependent Claim 17 words
The process of claim 1 wherein at least one hundred holes are present and are electroplated simultaneously.
Claim 6
Dependent Claim 15 words
The process of claim 1 wherein the resist is removed after the step of electroplating.
Claim 7
Dependent Claim 35 words
The process of claim 1 wherein a photosensitive precursor is employed which is imagewise exposed to actinic radiation to form the resist with unexposed photosensitive precursor removed to allow the through hole to be electroplated.
Claim 8
Dependent Claim 22 words
The process of claim 1 wherein the through hole is formed in at least two conductive layers separated by the insulating layer.

References Cited (Backward Citations)

US3099608A Cited
GB2123036A Cited
DE3304004A1 Cited
US4683036A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-06-07 1991-12-07 1992-06-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-06-07 1995-12-07 1996-06-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-06-07 1999-12-07 2000-06-07 $7700.00 Window Closed / Lapsed

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