US4749278A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Arrangement for aligning a mask and a substrate relative to each other
Assignee: US Philips Corp
•
Filing: 1986-07-21
•
Granted: 1988-06-07
•
Expires: 2006-07-21
Abstract
Abstract An arrangement is described for aligning a mask (1) and a substrate (3) relative to each other by means of grating marks (M 1 , M 2 ; P 1 , P 2 ) in the mask and in the substrate. A diaphragm (32) is arranged in the path of the alignment beam (b') behind the mask grating (M 2 ) and transmits only specific diffraction orders of the gratings (P 2 , M 2 ), so that the alignment signal (S A ) contains less undesired components and becomes more accurate.
Inventors
- 👤 Jan E. van der Werf
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 05:02
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7049
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
190 words
In an arrangement for aligning a mask and a substrate relative to each other, said mask and substrate being provided with alignment marks of diffraction gratings, said arrangement comprising: radiation source means for producing an alignment beam, first lens system means for imaging a substrate grating onto a mask grating, radiation-sensitive detection means receiving said radiation after being diffracted in specific diffraction orders by both said substrate grating and said mask grating for measuring registration of said substrate grating and said mask grating, and diaphragm means arranged before said radiation-sensitive detection means for selecting radiation diffracted in said specific diffraction orders by said substrate grating and said mask grating, wherein the improvement comprises second lens system means arranged between said mask and said radiation-sensitive detection means for providing a pupil image of said first lens system means, wherein said diaphragm means is disposed after said mask in the plane of said pupil image, and wherein said diaphragm means has a plurality of apertures for only passing subbeams of the first diffraction order from said substrate grating for zero order radiation and for first order radiation diffracted by said mask grating.
Claim 2
Dependent Claim
190 words
In an arrangement for aligning a mask and a substrate relative to each other, said mask and substrate being provided with alignment marks of diffraction gratings, said arrangement comprising: radiation source means for producing an alignment beam, first lens system means for imaging a substrate grating onto a mask grating, radiation-sensitive detection means receiving said radiation after being diffracted in specific diffraction orders by both said substrate grating and said mask grating for measuring registration of said substrate grating and said mask grating, and diaphragm means arranged before said radiation-sensitive detection means for selecting radiation diffracted in said specific diffraction orders by said substrate grating and said mask grating, wherein the improvement comprises second lens system means arranged between said mask and said radiation-sensitive detection means for providing a pupil image of said first lens system means, wherein said diaphragm means is disposed after said mask in the plane of said pupil image, and wherein said diaphragm means has a plurality of apertures for only passing subbeams of the first diffraction order from said substrate grating for zero order radiation and for first order radiation diffracted by said mask grating.
References Cited (Backward Citations)
US4251160A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-06-07 | 1991-12-07 | 1992-06-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-06-07 | 1995-12-07 | 1996-06-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-06-07 | 1999-12-07 | 2000-06-07 | $7700.00 | Window Closed / Lapsed |