Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
207 words
A method of manufacturing a nonlinear semiconductor element comprising the steps of: (a) forming a first conductive layer, which will ultimately serve as a first electrode, on a substrate having an insulating surface; (b) forming a first non-single crystal semiconductor layer laminate member on the substrate so that it continuously extends on the first conductive layer, where the forming of the first non-single-crystal semiconductor layer laminate member includes the substeps of: (1) forming at least a first non-single-crystal semiconductor of a predetermined conductivity type on the substrate and extending on the first conductive layer, (2) forming an i-type second non-single-crystal semiconductor layer on the first non-single-crystal semiconductor layer, said i-type layer containing an additive selected from the group consisting of carbon, nitrogen, oxygen, boron, and mixtures thereof, and (3) forming a third non-single-crystal semiconductor layer of said predetermined conductivity type on the i-type second non-single-crystal semiconductor layer; (c) forming a second conductive layer, which will ultimately serve as a second electrode, in a predetermined pattern on the first non-single-crystal semiconductor layer laminate member in opposing relation to the first conductive layer; and (d) selectively etching away the first non-single-crystal semiconductor layer laminate member through the patterned second conductive layer to obtain a second non-single-crystal semiconductor laminate member.
Claim 2
Independent Claim
207 words
A method of manufacturing a nonlinear semiconductor element comprising the steps of: (a) forming a first conductive layer, which will ultimately serve as a first electrode, on a substrate having an insulating surface; (b) forming a first non-single crystal semiconductor layer laminate member on the substrate so that it continuously extends on the first conductive layer, where the forming of the first non-single-crystal semiconductor layer laminate member includes the substeps of: (1) forming at least a first non-single-crystal semiconductor of a predetermined conductivity type on the substrate and extending on the first conductive layer, (2) forming an i-type second non-single-crystal semiconductor layer on the first non-single-crystal semiconductor layer, said i-type layer containing an additive selected from the group consisting of carbon, nitrogen, oxygen, boron, and mixtures thereof, and (3) forming a third non-single-crystal semiconductor layer of said predetermined conductivity type on the i-type second non-single-crystal semiconductor layer; (c) forming a second conductive layer, which will ultimately serve as a second electrode, in a predetermined pattern on the first non-single-crystal semiconductor layer laminate member in opposing relation to the first conductive layer; and (d) selectively etching away the first non-single-crystal semiconductor layer laminate member through the patterned second conductive layer to obtain a second non-single-crystal semiconductor laminate member.
Claim 3
Dependent Claim
21 words
A method as in claim 1 wherein said predetermined conductivity type of said first and third non-single-crystal semiconductor layers is P-type.
Claim 4
Dependent Claim
21 words
A method as in claim 1 where said predetermined conductivity type of said first and third non-single-crystal semiconductor layers is N-type.
Claim 5
Dependent Claim
14 words
A method as in claim 3 including doping said i-type layer with said boron.
Claim 6
Independent Claim
265 words
A method of manufacturing a liquid crystal display panel comprising the steps of: (a) preparing a first substrate member by forming a first conductive layer serving as a first electrode on a first substrate having an insulating surface; (b) forming a first non-single-crystal semiconductor layer laminate layer on the first substrate member which continuously extends on the first conductive layer, where the forming of the first non-single-crystal semiconductor laminate member includes the substeps of: (1) forming at least a first non-single-crystal semiconductor of a predetermined conductivity type on the substrate and extending on the first conductive layer, (2) forming an i-type second non-single-crystal semiconductor layer on the first non-single-crystal semiconductor layer, said i-type layer containing an additive selected from the group consisting of carbon, nitrogen, oxygen, boron, and mixtures thereof, and (3) forming a third non-single-crystal semiconductor layer of said predetermined conductivity type on the i-type second non-single-crystal semiconductor layer; (c) forming a second conductive layer, which will ultimately serve as a second electrode, in a liquid pattern on the first non-single-crystal semiconductor layer laminate layer in opposing relation to the first conductive layer; (d) selectively etching away the first non-single-crystal semiconductor layer laminate member through the patterned second conductive layer to obtain a second non-single-crystal semiconductor laminate member; (e) preparing a second substrate member by forming on a second substrate an insulating surface and a third conductive layer; (f) positioning said first and second substrate members with respect to each other so that a gap is present therebetween; and (g) filling liquid crystal in said gap defined by the first and second substrate members.
Claim 7
Independent Claim
265 words
A method of manufacturing a liquid crystal display panel comprising the steps of: (a) preparing a first substrate member by forming a first conductive layer serving as a first electrode on a first substrate having an insulating surface; (b) forming a first non-single-crystal semiconductor layer laminate layer on the first substrate member which continuously extends on the first conductive layer, where the forming of the first non-single-crystal semiconductor laminate member includes the substeps of: (1) forming at least a first non-single-crystal semiconductor of a predetermined conductivity type on the substrate and extending on the first conductive layer, (2) forming an i-type second non-single-crystal semiconductor layer on the first non-single-crystal semiconductor layer, said i-type layer containing an additive selected from the group consisting of carbon, nitrogen, oxygen, boron, and mixtures thereof, and (3) forming a third non-single-crystal semiconductor layer of said predetermined conductivity type on the i-type second non-single-crystal semiconductor layer; (c) forming a second conductive layer, which will ultimately serve as a second electrode, in a liquid pattern on the first non-single-crystal semiconductor layer laminate layer in opposing relation to the first conductive layer; (d) selectively etching away the first non-single-crystal semiconductor layer laminate member through the patterned second conductive layer to obtain a second non-single-crystal semiconductor laminate member; (e) preparing a second substrate member by forming on a second substrate an insulating surface and a third conductive layer; (f) positioning said first and second substrate members with respect to each other so that a gap is present therebetween; and (g) filling liquid crystal in said gap defined by the first and second substrate members.
Claim 8
Dependent Claim
21 words
A method as in claim 5 where said predetermined conductivity type of said first and third non-single-crystal semiconductor layers is P-type.
Claim 9
Dependent Claim
21 words
A method as in claim 5 where said predetermined conductivity type of said first and third non-single-crystal semiconductor layers is N-type.
Claim 10
Dependent Claim
14 words
A method as in claim 5 including doping said i-type layer with said boron.