US4741622A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for detecting diversion
Assignee: Nikon Corp
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Filing: 1986-03-03
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Granted: 1988-05-03
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Expires: 2006-03-03
Abstract
Abstract A method of detecting a registration diversion between a mask and a wafer prior to a main exposure. This method detects relative diversions between marks on the wafer and latent images of marks on the mask formed on a photosensitive layer of the wafer. The latent images of the marks on the mask are preliminarily formed on the photosensitive layer of the wafer by an exposure energy beam prior to the main exposure.
Inventors
- 👤 Kyoichi Suwa
- 👤 Masaichi Murakami
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 07:41
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F7/00; G03F7/70; G03F7/70058; G03F7/70066
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
164 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate with said mask, said substrate having a first mark means and said mask having a second mark means formed thereon to have a predetermined positional relation with said first mark means when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first mark means is covered with said photosensitive layer; projecting, after said registration, an exposure energy beam onto said substrate to be exposed through said mask to form on said photosensitive layer a latent image of said second mark means; supplying a radiation beam onto said photosensitive layer; photoelectrically detecting said latent image and said first mark means without development of said photosensitive layer; and detecting the positional relation between said first mark means and said latent image to determine said diversion.
Claim 2
Independent Claim
164 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate with said mask, said substrate having a first mark means and said mask having a second mark means formed thereon to have a predetermined positional relation with said first mark means when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first mark means is covered with said photosensitive layer; projecting, after said registration, an exposure energy beam onto said substrate to be exposed through said mask to form on said photosensitive layer a latent image of said second mark means; supplying a radiation beam onto said photosensitive layer; photoelectrically detecting said latent image and said first mark means without development of said photosensitive layer; and detecting the positional relation between said first mark means and said latent image to determine said diversion.
Claim 3
Independent Claim
179 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate with said mask, said substrate having a first mark means and said mask having a second mark means formed thereon to have a predetermined positional relation with said first mark means when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first mark means is covered with said photosensitive layer; projecting, after said registration, an exposure energy beam onto said substrate to be exposed through said mask to form of said photosensitive layer a latent image of said second mark means; supplying a radiation beam onto said photosensitive layer; photoelectrically detecting said latent image on the basis of a regular reflection of said radiation beam and said first mark means on a basis of a scattering of said radiation beam; and detecting the positional relation between said first mark means and said latent image to determine said diversion.
Claim 4
Independent Claim
179 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate with said mask, said substrate having a first mark means and said mask having a second mark means formed thereon to have a predetermined positional relation with said first mark means when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first mark means is covered with said photosensitive layer; projecting, after said registration, an exposure energy beam onto said substrate to be exposed through said mask to form of said photosensitive layer a latent image of said second mark means; supplying a radiation beam onto said photosensitive layer; photoelectrically detecting said latent image on the basis of a regular reflection of said radiation beam and said first mark means on a basis of a scattering of said radiation beam; and detecting the positional relation between said first mark means and said latent image to determine said diversion.
Claim 5
Dependent Claim
43 words
The method according to claim 2, wherein said second mark means is projected onto said substrate by a projection optical system provided between said mask and said substrate, end said radiation beam is supplied onto said photosensitive layer through said projection optical system.
Claim 6
Dependent Claim
51 words
The method according to claim 3, wherein said radiation beam forms a beam spot scanning along a scanning line on a surface of said substrate, and said positional relation is detected on the basis of a variation of said regular reflection, said scattering and a scanning position of said beam spot.
Claim 7
Dependent Claim
36 words
The method according to claim 4, wherein said exposure energy beam has a first wavelength effective in sensitizing said photosensitive layer and said radiation beam has a second wavelength which does not sensitize said photosensitive layer.
Claim 8
Dependent Claim
25 words
The method according to claim 4, wherein said exposure energy beam and said radiation beam each have a wavelength effective in sensitizing said photosensitive layer.
Claim 9
Dependent Claim
22 words
The method according to claim 2, further comprising the step of correcting said registration on the basis of said detected positional relation.
Claim 10
Dependent Claim
25 words
The method according to claim 2, wherein said latent image of said second mark means is formed near said first mark means of said substrate.
Claim 11
Independent Claim
170 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate and said mask, said substrate having a first mark means and said mask having a second mark means formed thereon to have a predetermined positional relation with said first mark means when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first mark means is covered with said photosensitive layer; projecting, after said registration, an exposure energy beam onto said substrate to be exposed through said mask to form on said photosensitive layer a latent image of said second mark means; supplying a spot of a radiation beam scanning along a scanning line on a surface of said substrate; and detecting the positional relation between said first mark means and said latent image on the basis of optical information from said surface and a scanning position of said spot.
Claim 12
Independent Claim
170 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate and said mask, said substrate having a first mark means and said mask having a second mark means formed thereon to have a predetermined positional relation with said first mark means when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first mark means is covered with said photosensitive layer; projecting, after said registration, an exposure energy beam onto said substrate to be exposed through said mask to form on said photosensitive layer a latent image of said second mark means; supplying a spot of a radiation beam scanning along a scanning line on a surface of said substrate; and detecting the positional relation between said first mark means and said latent image on the basis of optical information from said surface and a scanning position of said spot.
Claim 13
Dependent Claim
22 words
The method according to claim 9, further comprising the step of correcting said registration on the basis of said detected positional relation.
Claim 14
Dependent Claim
49 words
The method according to claim 9, further comprising the step of photoelectrically detecting a regular reflection of said radiation beam from said surface of said substrate, wherein said positional relation is detected on the basis of a variation of said regular reflection and said scanning position of said spot.
Claim 15
Dependent Claim
55 words
The method according to claim 9, further comprising the step of photoelectrically detecting a regular reflection and a scattering of said radiation beam from said surface of said substrate respectively, wherein said positional relation is detected on the basis of a variation of said regular reflection, said scattering and said scanning position of said spot.
Claim 16
Dependent Claim
43 words
The method according to claim 9, wherein said second mark means is projected onto said substrate by a projection optical system provided between said mask and said substrate, and said radiation beam is supplied onto said photosensitive layer through said projection optical system.
Claim 17
Dependent Claim
36 words
The method according to claim 13, wherein said exposure energy beam has a first wavelength effective in sensitizing said photosensitive layer and said radiation beam has a second wavelength which does not sensitize said photosensitive layer.
Claim 18
Dependent Claim
25 words
The method according to claim 13, wherein said exposure energy beam and said radiation beam each have a wavelength effective in sensitizing said photosensitive layer.
Claim 19
Dependent Claim
20 words
The method according to claim 9, wherein said latent image is formed near said first mark means of said substrate.
Claim 20
Independent Claim
198 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate with said mask, said substrate having a first alignment mark and said mask having a second alignment mark formed thereon to have a predetermined positional relation with said first alignment mark when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first alignment mark is covered with said photosensitive layer; positioning said substrate and said mask at a determined positional relation with each other; projecting an exposure energy beam effective in sensitizing said photosensitive layer onto said substrate to be exposed through said mask to form on said photosensitive layer a latent image of said alignment mark so that said photosensitive layer covering a portion corresponding to said first alignment mark is sensitized by said exposure energy beam; supplying a radiation beam effective in sensitizing said photosensitive layer onto a surface of said substrate; and detecting the positional relation between said first alignment mark and said latent image on the basis of optical information from said surface.
Claim 21
Independent Claim
198 words
A method for detecting a diversion in the registration of a substrate and a mask in an apparatus for aligning said substrate with said mask, said substrate having a first alignment mark and said mask having a second alignment mark formed thereon to have a predetermined positional relation with said first alignment mark when said substrate and said mask are brought into registration with each other, said method comprising the steps of: forming a photosensitive layer on said substrate so that said first alignment mark is covered with said photosensitive layer; positioning said substrate and said mask at a determined positional relation with each other; projecting an exposure energy beam effective in sensitizing said photosensitive layer onto said substrate to be exposed through said mask to form on said photosensitive layer a latent image of said alignment mark so that said photosensitive layer covering a portion corresponding to said first alignment mark is sensitized by said exposure energy beam; supplying a radiation beam effective in sensitizing said photosensitive layer onto a surface of said substrate; and detecting the positional relation between said first alignment mark and said latent image on the basis of optical information from said surface.
Claim 22
Dependent Claim
22 words
The method according to claim 17, further comprising the step of correcting said registration on the basis of said detected positional relation.
Claim 23
Dependent Claim
42 words
The method according to claim 17, further comprising the step of photoelectrically detecting a regular reflection of said radiation beam from said surface of said substrate, wherein said positional relation is detected on the basis of a variation of said regular reflection.
Claim 24
Dependent Claim
38 words
The method according to claim 17, further comprising the step of imaging said surface of said substrate on a imaging plane, wherein said positional relation is detected on the basis of an image formed on said imaging plane.
References Cited (Backward Citations)
US4640619A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-03 | 1991-11-02 | 1992-05-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-03 | 1995-11-02 | 1996-05-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-03 | 1999-11-02 | 2000-05-03 | $7700.00 | Window Closed / Lapsed |