US4738907A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for manufacturing a photomask
Assignee: Mitsubishi Electric Corp
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Filing: 1986-03-20
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Granted: 1988-04-19
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Expires: 2006-03-20
Abstract
Abstract A photomask manufacturing process including step of forming on a transparent silica glass substrate a silicide film in which an alloy comprising two or more metal elements is silicidized. A resist is applied onto the silicide film and then a patterning mask is provided by light or electron beam, followed by developing step. Exposed portion of the silicide film is etched away using a dry etching process.
Inventors
- 👤 Akira Shigetomi
- 👤 Shuichi Matsuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 18:06
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
100 words
A process for manufacturing a photomask comprising the steps of: preparing a transparent glass substrate; forming on said transparent glass substrate a silicide film in which an alloy comprising two or more metal elements is silicidized; applying a resist on said metal silicide film; drawing a desired mask pattern on the resist by using light or electron beam and developing the pattern so that some portion of the applied resist can be removed and the corresponding portion of the silicide film can be exposed; and etching away the exposed portion of said silicide film by means of dry etching process.
Claim 2
Dependent Claim
100 words
A process for manufacturing a photomask comprising the steps of: preparing a transparent glass substrate; forming on said transparent glass substrate a silicide film in which an alloy comprising two or more metal elements is silicidized; applying a resist on said metal silicide film; drawing a desired mask pattern on the resist by using light or electron beam and developing the pattern so that some portion of the applied resist can be removed and the corresponding portion of the silicide film can be exposed; and etching away the exposed portion of said silicide film by means of dry etching process.
Claim 3
Dependent Claim
28 words
A process for manufacturing a photomask in accordance with claim 1, wherein said transparent glass substrate is a silica glass substrate, and said alloy is a titanium-molybdenum alloy.
Claim 4
Dependent Claim
28 words
A process for manufacturing a photomask in accordance with claim 1, wherein said transparent glass substrate is a silica glass substrate, and said alloy is a titanium-molybdenum-tungsten alloy.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-04-19 | 1991-10-19 | 1992-04-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-04-19 | 1995-10-19 | 1996-04-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-04-19 | 1999-10-19 | 2000-04-19 | $7700.00 | Window Closed / Lapsed |