US4735877A
Expired / Lapsed
US
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Lithographic mask structure and lithographic process
Assignee: Canon Inc
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Filing: 1986-10-06
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Granted: 1988-04-05
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Expires: 2006-10-06
Abstract
Abstract There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.
Inventors
- 👤 Hideo Kato
- 👤 Yoshie Izawa
- 👤 Keiko Chiba
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 21:42
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/22; G03F7/00; G03F7/70; G03F7/70216; G03F7/7035; G03F7/70375
Claims Analysis
Total Claims: 60
Claim 1
Independent Claim
35 words
A lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance.
Claim 2
Dependent Claim
35 words
A lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance.
Claim 3
Dependent Claim
16 words
A lithographic mask structure according to claim 1, wherein the fluorescent substance is CaF 2 :Eu.
Claim 4
Dependent Claim
16 words
A lithographic mask structure according to claim 1, wherein the fluorescent substance is MgF 2 :Eu.
Claim 5
Dependent Claim
32 words
A lithographic mask structure according to claim 1, wherein the masking material support film is a laminate film of a layer of the fluorescent substance and a layer of an inorganic material.
Claim 6
Dependent Claim
14 words
A lithographic mask structure according to claim 4, wherein the inorganic material is AlN.
Claim 7
Dependent Claim
14 words
A lithographic mask structure according to claim 4, wherein the inorganic material is SiN.
Claim 8
Dependent Claim
14 words
A lithographic mask structure according to claim 4, wherein the inorganic material is BN.
Claim 9
Dependent Claim
18 words
A lithographic mask structure according to claim 4, wherein the inorganic material is Al 2 O 3 .
Claim 10
Dependent Claim
16 words
A lithographic mask structure according to claim 4, wherein the inorganic material is SiO 2 .
Claim 11
Dependent Claim
14 words
A lithographic mask structure according to claim 4, wherein the inorganic material is SiC.
Claim 12
Dependent Claim
15 words
A lithographic mask structure according to claim 4, wherein the inorganic material is aluminum oxynitride.
Claim 13
Dependent Claim
32 words
A lithography mask structure according to claim 1, wherein the masking material support film is a laminate film of a layer of the fluorescent substance and a layer of an organic material.
Claim 14
Dependent Claim
14 words
A lithographic mask structure according to claim 12, wherein the organic material is polyimide.
Claim 15
Dependent Claim
14 words
A lithographic mast structure according to claim 12, wherein the organic material is polyamide.
Claim 16
Dependent Claim
23 words
A lithographic mask structure according to claim 4, wherein the layer of the fluorescent substance has a thickness of 1 to 5 μm.
Claim 17
Dependent Claim
25 words
A lithographic mask structure according to claim 4, wherein the masking material support film has a thickness of not more than a few tens μm.
Claim 18
Dependent Claim
23 words
A lithographic mask structure according to claim 12, wherein the layer of the fluorescent substance has a thickness of 1 to 5 μm.
Claim 19
Dependent Claim
25 words
A lithographic mask structure according to claim 12, wherein the masking material support film has a thickness of not more than a few tens μm.
Claim 20
Dependent Claim
23 words
A lithographic mask structure according to claim 1, wherein fine particles of the fluorescent substance are distributed in the masking material support film.
Claim 21
Dependent Claim
20 words
A lithographic mask structure according to claim 19, wherein the fine particles have sizes of not more than 1 μm.
Claim 22
Dependent Claim
20 words
A lithographic mask structure according to claim 19, wherein the masking material support film is composed of an organic material.
Claim 23
Dependent Claim
20 words
A lithographic mask structure according to claim 19, wherein the masking material support film is composed of an inorganic material.
Claim 24
Dependent Claim
18 words
A lithographic mask structure according to claim 1, wherein the annular support substrate is in a circular form.
Claim 25
Dependent Claim
17 words
A lithographic mask structure according to claim 1, wherein the annular support substrate is composed of Si.
Claim 26
Dependent Claim
28 words
A lithographic mask structure according to claim 1, wherein the masking material support film has a masking material provided in a thin film form on the support film.
Claim 27
Dependent Claim
15 words
A lithographic mask structure according to claim 25, wherein the masking material is provided pattern-wise.
Claim 28
Dependent Claim
14 words
A lithographic mask structure according to claim 25, wherein the masking material is gold.
Claim 29
Dependent Claim
14 words
A lithographic mask structure according to claim 25, wherein the masking material is platinum.
Claim 30
Dependent Claim
14 words
A lithographic mask structure according to claim 25, wherein the masking material is tungsten.
Claim 31
Dependent Claim
14 words
A lithographic mask structure according to claim 25, wherein the masking material is tantalum.
Claim 32
Dependent Claim
14 words
A lithographic mask structure according to claim 25, wherein the masking material is copper.
Claim 33
Dependent Claim
14 words
A lithographic mask structure according to claim 25, wherein the masking material is nickel.
Claim 34
Dependent Claim
20 words
A lithographic mask structure according to claim 25, wherein the masking material has a thickness of 0.5 to 1 μm.
Claim 35
Dependent Claim
37 words
A lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film being composed of a fluorescent substance.
Claim 36
Dependent Claim
37 words
A lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film being composed of a fluorescent substance.
Claim 37
Dependent Claim
16 words
A lithographic mask structure according to claim 34, wherein the fluorescent substance is CaF 2 :Eu.
Claim 38
Dependent Claim
16 words
A lithographic mask structure according to claim 34, wherein the fluorescent substance is MgF 2 :Eu.
Claim 39
Dependent Claim
22 words
A lithographic mask structure according to claim 34, wherein the masking material support film has a thickness of 2 to 10 μm.
Claim 40
Dependent Claim
18 words
A lithographic mask structure according to claim 34, wherein the annular support substrate is in a circular form.
Claim 41
Dependent Claim
17 words
A lithographic mask structure according to claim 34, wherein the annular support substrate is composed of Si.
Claim 42
Dependent Claim
28 words
A lithographic mask structure according to claim 34, wherein the masking material support film has a masking material provided in a thin film form on the support film.
Claim 43
Dependent Claim
15 words
A lithographic mask structure according to claim 40, wherein the masking material is provided pattern-wise.
Claim 44
Dependent Claim
14 words
A lithographic mask structure according to claim 40, wherein the masking material is gold.
Claim 45
Dependent Claim
14 words
A lithographic mask structure according to claim 40, wherein the masking material is platinum.
Claim 46
Dependent Claim
14 words
A lithographic mask structure according to claim 40, wherein the masking material is tungsten.
Claim 47
Dependent Claim
14 words
A lithographic mask structure according to claim 40, wherein the masking material is tantalum.
Claim 48
Dependent Claim
14 words
A lithographic mask structure according to claim 40, wherein the masking material is copper.
Claim 49
Dependent Claim
14 words
A lithographic mask structure according to claim 40, wherein the masking material is nickel.
Claim 50
Dependent Claim
20 words
A lithographic mask structure according to claim 40, wherein the masking material has a thickness of 0.5 to 1 μm.
Claim 51
Dependent Claim
69 words
A lithographic process which comprises exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise, the masking material support film being composed of a fluorescent substance, a secondary radiation beam being generated from the fluorescent substance exposed to the radiation beam, and the photosensitive material being exposed to the secondary radiation beam and the radiation beam together.
Claim 52
Dependent Claim
69 words
A lithographic process which comprises exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise, the masking material support film being composed of a fluorescent substance, a secondary radiation beam being generated from the fluorescent substance exposed to the radiation beam, and the photosensitive material being exposed to the secondary radiation beam and the radiation beam together.
Claim 53
Dependent Claim
15 words
A lithographic process according to claim 49, wherein the radiation beam is an X-ray beam.
Claim 54
Dependent Claim
16 words
A lithographic process according to claim 49, wherein the secondary radiation beam is an ultraviolet beam.
Claim 55
Dependent Claim
15 words
A lithographic process according to claim 49, wherein the secondary radiation beam is visible light.
Claim 56
Dependent Claim
67 words
A lithographic process which comprises exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise, the masking material support film containing a fluorescent substance, a secondary radiation beam being generated from the fluorescent substance exposed to the radiation beam, and the photosensitive material being exposed to the secondary radiation beam and the radiation beam together.
Claim 57
Dependent Claim
67 words
A lithographic process which comprises exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise, the masking material support film containing a fluorescent substance, a secondary radiation beam being generated from the fluorescent substance exposed to the radiation beam, and the photosensitive material being exposed to the secondary radiation beam and the radiation beam together.
Claim 58
Dependent Claim
15 words
A lithographic process according to claim 53, wherein the radiation beam is an X-ray beam.
Claim 59
Dependent Claim
16 words
A lithographic process according to claim 53, wherein the secondary radiation beam is an ultraviolet beam.
Claim 60
Dependent Claim
15 words
A lithographic process according to claim 53, wherein the secondary radiation beam is visible light.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-04-05 | 1991-10-05 | 1992-04-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-04-05 | 1995-10-05 | 1996-04-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-04-05 | 1999-10-05 | 2000-04-05 | $7700.00 | Window Closed / Lapsed |