Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
253 words
In an electron beam test probe system for measuring the potential of a selected region on the surface of a specimen, said electron beam test probe system having a means for generating an electron beam, an apparatus for producing a pulsed electron beam comrising: beam blocking means including an aperture means defining a region through which said electron beam must pass to reach said specimen; means for defining a beam channel through which said electron beam passes prior to passing through the region of space defined by said aperture means and a second channel intersecting said beam channel to form a region common to both said channels, the walls of said beam and second channels being made of a conducting material; a linear conductor coaxial with said second channel, said linear conductor and said second channel forming a coaxial transmission line wherein the axis common to said second channel and said linear conductor being positioned such that said electron beam does not intersect said common axis; and transmission line driving means coupled to said linear conductor and said second channel for generating a potential between said linear conductor and said second channel; wherein an electrostatic deflection field is generated in said first channel when a potential is generated between said linear conductor and said second channel, said electron beam being prevented from passing through said region of space defined by said aperture means unless the potential generated between said linear conductor and said second channel is between predetermined first and second potential values.
Claim 2
Dependent Claim
253 words
In an electron beam test probe system for measuring the potential of a selected region on the surface of a specimen, said electron beam test probe system having a means for generating an electron beam, an apparatus for producing a pulsed electron beam comrising: beam blocking means including an aperture means defining a region through which said electron beam must pass to reach said specimen; means for defining a beam channel through which said electron beam passes prior to passing through the region of space defined by said aperture means and a second channel intersecting said beam channel to form a region common to both said channels, the walls of said beam and second channels being made of a conducting material; a linear conductor coaxial with said second channel, said linear conductor and said second channel forming a coaxial transmission line wherein the axis common to said second channel and said linear conductor being positioned such that said electron beam does not intersect said common axis; and transmission line driving means coupled to said linear conductor and said second channel for generating a potential between said linear conductor and said second channel; wherein an electrostatic deflection field is generated in said first channel when a potential is generated between said linear conductor and said second channel, said electron beam being prevented from passing through said region of space defined by said aperture means unless the potential generated between said linear conductor and said second channel is between predetermined first and second potential values.
Claim 3
Dependent Claim
272 words
In an electron beam test probe system for measuring the potential of a selected region on the surface of a specimen, said electron beam test probe system having a means for generating an electron beam, an apparatus for producing a pulsed electron beam comprising: beam blocking means including an aperture means defining a region through which said electron beam must pass to reach said specimen; means for defining a beam channel through which said electron beam passes prior to passing through the region of space defined by said aperture means and a second channel intersecting said beam channel to form a region common to both said channels, the walls of said beam and second channels being made of a conducting material; a linear conductor coaxial with said second channel, said linear conductor and said second channel forming a coaxial transmission line wherein said linear conductor is positioned a predetermined distance from said beam channel; and transimission line driving means coupled to said linear conductor and said second channel for generating a potential between said linear conductor and said second channel; wherein said electron beam will not pass through said region of space defined by said aperture means unless the potential generated between said linear conductor and said second channel is between predetermined first and second potential values; and wherein said beam and second channels are cylindrical, each said channel having a circular cross-section, said beam and second channels intersecting at a substantially right angle, the minimum distance between the axes of said beam and second channels being greater than the radius of the cross-section of the said channel having the largest cross-section.
Claim 4
Dependent Claim
272 words
In an electron beam test probe system for measuring the potential of a selected region on the surface of a specimen, said electron beam test probe system having a means for generating an electron beam, an apparatus for producing a pulsed electron beam comprising: beam blocking means including an aperture means defining a region through which said electron beam must pass to reach said specimen; means for defining a beam channel through which said electron beam passes prior to passing through the region of space defined by said aperture means and a second channel intersecting said beam channel to form a region common to both said channels, the walls of said beam and second channels being made of a conducting material; a linear conductor coaxial with said second channel, said linear conductor and said second channel forming a coaxial transmission line wherein said linear conductor is positioned a predetermined distance from said beam channel; and transimission line driving means coupled to said linear conductor and said second channel for generating a potential between said linear conductor and said second channel; wherein said electron beam will not pass through said region of space defined by said aperture means unless the potential generated between said linear conductor and said second channel is between predetermined first and second potential values; and wherein said beam and second channels are cylindrical, each said channel having a circular cross-section, said beam and second channels intersecting at a substantially right angle, the minimum distance between the axes of said beam and second channels being greater than the radius of the cross-section of the said channel having the largest cross-section.
Claim 5
Dependent Claim
18 words
The apparatus of claim 1 wherein said linear conductor is suspended by insulating spacers in said second channel.
Claim 6
Dependent Claim
14 words
The apparatus of claim 1 wherein the surface of said beam channel is gold.
Claim 7
Dependent Claim
14 words
The apparatus of claim 1 wherein the surface of said beam channel is silver.
Claim 8
Dependent Claim
154 words
The apparatus of claim 1 wherein said electron beam test probe system further comprises means for applying a test signal pattern to said specimen and a detector for detecting the secondary electrons produced in response to said electron beam bombarding said specimen, said apparatus further comprising: means for causing said transmission line driving means to apply a potential between said linear conductor and said second channel, said potential having a first phase in which said potential passes through said first predetermined potential and then through said second predetermined potential values at first and second predetermined times relative to said test signal pattern and a second phase in which said potential passes through said second predetermined potential and then through said first predetermined potential at third and fourth predetermined times relative to said test signal pattern; and means for preventing said secondary electron detector from detecting secondary electrons between said third and fourth predetermined times.