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US4717829A Expired / Lapsed US ⏱️ 0.0 years remaining

Platen and beam setup flag assembly for ion implanter

Assignee: Varian Semiconductor Equipment Associates Inc
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Filing: 1987-05-04
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Granted: 1988-01-05
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Expires: 2007-05-04
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Abstract

Abstract A platen and beam setup assembly for use in an ion implanter includes a platen for wafer mounting and a beam setup flag for beam measurement. The platen and the setup flag are angularly displaced with respect to a common mounting shaft perpendicular to the ion beam. The assembly can be rotated about the shaft between a first position wherein the wafer is exposed to the ion beam and a second position wherein the setup flag is exposed to the ion beam. In a preferred embodiment, the platen is positioned for wafer exchange when the setup flag is exposed to the ion beam.

Inventors

  • 👤 Norman L. Turner

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 17:11
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3171

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 114 words
Apparatus for ion beam processing of a workpiece comprising: means for generating an ion beam; a first stationary current collection means; an assembly comprising means for mounting said workpiece and a second current collection means angularly displaced from said means for mounting about a shaft perpendicular to said ion beam, said assembly being rotatable about the axis of said shaft between at least a first position wherein a workpiece mounted on said means for mounting is exposed to said ion beam and a second position wherein said second current collection means is exposed to said ion beam; and means for measuring the total current collected by said first and said second current collection means.
Claim 2
Dependent Claim 114 words
Apparatus for ion beam processing of a workpiece comprising: means for generating an ion beam; a first stationary current collection means; an assembly comprising means for mounting said workpiece and a second current collection means angularly displaced from said means for mounting about a shaft perpendicular to said ion beam, said assembly being rotatable about the axis of said shaft between at least a first position wherein a workpiece mounted on said means for mounting is exposed to said ion beam and a second position wherein said second current collection means is exposed to said ion beam; and means for measuring the total current collected by said first and said second current collection means.
Claim 3
Dependent Claim 34 words
The apparatus as defined in claim 1 wherein said means for mounting includes a platen for clamping a semiconductor wafer at its periphery, said platen including a passage for circulation of a cooling fluid.
Claim 4
Dependent Claim 25 words
The apparatus as defined in claim 3 wherein said second position of said assembly is adapted for exchange of wafers to and from said platen.
Claim 5
Dependent Claim 27 words
The apparatus as defined in claim 1 wherein said means for mounting and said second current collection means are angularly displaced by approximately 90° on said shaft.
Claim 6
Dependent Claim 33 words
The apparatus as defined in claim 1 wherein said second current collection means is centrally located with respect to the axis of said ion beam when said assembly is in said second position.
Claim 7
Dependent Claim 29 words
The apparatus as defined in claim 1 wherein said means for mounting and said second current collection means are exposed to said ion beam in substantially the same plane.
Claim 8
Dependent Claim 18 words
The apparatus as defined in claim 1 wherein said first stationary current collection means comprises a Faraday system.
Claim 9
Dependent Claim 17 words
The apparatus as defined in claim 7 wherein said second current collection means comprises a Faraday cup.

References Cited (Backward Citations)

US3901183A Cited
US3885157A Cited
US3954191A Cited
US4011449A Cited
US4013891A Cited
US4282924A Cited
US4234797A Cited
US4361762A Cited
US4595837A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-01-04 1991-07-06 1992-01-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-01-04 1995-07-06 1996-01-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-01-04 1999-07-06 2000-01-05 $7700.00 Window Closed / Lapsed

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