Etching of vacuum metallized indium

Claim 2

In a process of manufacturing a corrosion resistant vacuum metallized article in which a dielectric substrate surface has vacuum deposition thereon of a corrosive metal and wherein vacuum deposition of the metal continues only until there is formation of discrete islands of said metal which visually appear as a continuous film while having channels between discrete islands to maintain electrically non-conductive the film over the substrate, the improvement comprising: etching the vacuum deposited material with a solvent which dissolves residuals of metal from the channels to clear the channels so as to expose clean bonding surfaces on the substrate at the base of the channels and applying a clear resinous protective dielectric top coat to both the surfaces of the discrete islands and to the clean bonding surfaces and drying the top coat to form a protective film encapsulating said discrete islands and bonded to the substrate at the base of the channels by a bond force throughout the surface extent of the channel base greater than two orders of magnitude in strength as compared to the bond force between the top coat and the discrete islands.

Claim 3

In the process of claim 1, etching with a solvent having a pH in the range of 0.50 to 13.0.

Claim 4

In the process of claim 1, etching with a solvent of sodium hydroxide solution having a concentration of NaOH in the range of 5% to 15%.

Claim 5

In the process of claim 1, the vacuum deposition of formation of the discrete islands continuing until the islands have an average diameter of less than 3500° A, the visually continuous film transmits less that 25% of the visible light incident thereon at an angle greater than 60%; applying the etchant at a concentration, etch time and etch temperature to reduce the diameter of said islands to produce an increase in dispersity between such islands while maintaining the reflectance from the islands between 50 and 60 compared to a pre-etch reflectance in the order of 65 throughout a preselected range of light wave lengths.

Claim 6

In the combination of claim 4, etching the islands with a 10% sodium hydroxide solution for an etch time of 60-90 seconds at an etch temperature of 150°-160° F.

Claim 7

In the combination of claim 1, rinsing the etch material from the part prior to application of the top coat through at least two rinses, applying the last rinse as deionized water and thereafter rapidly blowing all of the last rinse material from the part to prevent the occurrence of rinse streaks on the metal film prior to application of the top coat thereon.

Claim 8

In the combination of claim 4, rinsing the etch material from the part prior to application of the top coat through at least two rinses, applying the last rinse as deionized water and thereafter rapidly blowing all of the last rinse material from the part to prevent the occurrence of rinse streaks on the metal film prior to application of the top coat thereon.

Claim 9

In the combination of claim 5, rinsing the etch material from the part prior to application of the top coat through at least two rinses, applying the last rinse as deionized water and thereafter rapidly blowing all of the last rinse material from the part to prevent the occurrence of rinse streaks on the metal film prior to application of the top coat thereon.

Claim 10

In a process of manufacturing a corrosion resistant vacuum metallized article in which: a dielectric substrate surface has vacuum deposition thereon of a metal selected from the group consisting of indium and alloys thereof consisting predominantly of indium and wherein the vacuum deposition continues only until there is formation of discrete islands of said metal which visually appear as a continuous film while having channels between discrete islands to maintain electrically non-conductive the film over the substrate, the improvement comprising: etching the vacuum deposited material with a solvent which dissolves residuals of indium from the channels to clear the channels so as to expose clean bonding surfaces on the substrate at the base of the channels and applying a clear resinous protective dielectric top coat to both the surfaces of the discrete islands and to the clean bonding surfaces and drying the top coat to form a protective film encapsulating said discrete islands and bonded to the substrate at the base of the channels by a bond force throughout the surface extent of the channel base greater than two orders of magnitude in strength as compared to the bond force between the top coat and the discrete islands.

Claim 11

In a process of manufacturing a corrosion resistant vacuum metallized article in which: a dielectric substrate surface has vacuum deposition thereon of a metal selected from the group consisting of indium and alloys thereof consisting predominantly of indium and wherein the vacuum deposition continues only until there is formation of discrete islands of said metal which visually appear as a continuous film while having channels between discrete islands to maintain electrically non-conductive the film over the substrate, the improvement comprising: etching the vacuum deposited material with a solvent which dissolves residuals of indium from the channels to clear the channels so as to expose clean bonding surfaces on the substrate at the base of the channels and applying a clear resinous protective dielectric top coat to both the surfaces of the discrete islands and to the clean bonding surfaces and drying the top coat to form a protective film encapsulating said discrete islands and bonded to the substrate at the base of the channels by a bond force throughout the surface extent of the channel base greater than two orders of magnitude in strength as compared to the bond force between the top coat and the discrete islands.

Claim 12

In the process of claim 9, etching with a solvent having a pH in the range of 0.50 to 13.0.

Claim 13

In the process of claim 9, etching with a solvent of sodium hydroxide solution having a concentration of NaOH in the range of 5% to 15%.

Claim 14

In the process of claim 9, the vacuum deposition of formation of the discrete islands continuing until the islands have an average diameter of less than 3500° A, the visually continuous film transmits less that 25% of the visible light incident thereon at an angle greater than 60%; applying the etchant at a concentration, etch time and etch temperature to reduce the diameter of said islands to produce an increase in dispersity between such islands while maintaining the reflectance from the islands between 50 and 60 compared to a pre-etch reflectance in the order of 65 throughout a preselected range of light wave lengths.

Claim 15

In the combination of claim 9, etching the islands with a 10% sodium hydroxide solution for an etch time of 60-90 seconds at an etch temperature of 150°-160° F.

Claim 16

In the combination of claim 9, rinsing the etch material from the part prior to application of the top coat through at least two rinses, applying the last rinse as deionized water and thereafter rapidly blowing all of the last rinse material from the part to prevent the occurrence of rinse streaks on the metal film prior to application of the top coat thereon.

Claim 17

In the combination of claim 9, rinsing the etch material from the part prior to application of the top coat through at least two rinses, applying the last rinse as deionized water and thereafter rapidly blowing all of the last rinse material from the part to prevent the occurrence of rinse streaks on the metal film prior to application of the top coat thereon.

Claim 18

In the combination of claim 9, rinsing the etch material from the part prior to application of the top coat through at least two rinses, applying the last rinse as deionized water and thereafter rapidly blowing all of the last rinse material from the part to prevent the occurrence of rinse streaks on the metal film prior to application of the top coat thereon.