US4701608A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection aligner with a sensor for monitoring light quantity
Assignee: Hitachi Ltd
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Filing: 1986-01-29
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Granted: 1987-10-20
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Expires: 2006-01-29
Abstract
Abstract A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.
Inventors
- 👤 Koyo Morita
- 👤 Keizo Nomura
- 👤 Hiroshi Nishizuka
- 👤 Tai Hoshi
- 👤 Yoichiro Tamiya
- 👤 Terushige Asakawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 21:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358; G03F7/70058; G03F7/70066; G03F7/702; G03F7/70233; G03F7/70483; G03F7/7055; G03F7/70558; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
134 words
A projection aligner for transferring a pattern of a mask to a wafer to focus an image of the pattern of the mask, on the wafer, comprising: light source means for exposing the wafer with an elongated strip-shaped exposure light thereof; a focusing optical system for focusing the image of the pattern of the mask on the wafer with the strip-shaped light of the light source means; and at least one sensor means for monitoring a quantity of the strip-shaped light of the light source means at a plurality of positions in or proximate to an optical path between the light source means and the wafer, so as to detect the distribution of the light in the elongated direction of the strip-shaped light at a position substantially corresponding to the mask or the wafer.
Claim 2
Dependent Claim
134 words
A projection aligner for transferring a pattern of a mask to a wafer to focus an image of the pattern of the mask, on the wafer, comprising: light source means for exposing the wafer with an elongated strip-shaped exposure light thereof; a focusing optical system for focusing the image of the pattern of the mask on the wafer with the strip-shaped light of the light source means; and at least one sensor means for monitoring a quantity of the strip-shaped light of the light source means at a plurality of positions in or proximate to an optical path between the light source means and the wafer, so as to detect the distribution of the light in the elongated direction of the strip-shaped light at a position substantially corresponding to the mask or the wafer.
Claim 3
Dependent Claim
37 words
A projection aligner according to claim 1, wherein the at least one sensor means detects the quantity of the light which is to be incident on the wafer prior to the light being reflected from the wafer.
Claim 4
Dependent Claim
24 words
A projection aligner according to claim 2, wherein the wafer is disposed at a remote position from the mask when exposed to the light.
Claim 5
Dependent Claim
15 words
A projection aligner according to claim 1, wherein a plurality of sensor means are provided.
Claim 6
Dependent Claim
171 words
A projection aligner for transferring a pattern of a mask to focus an image of the pattern of the mask, on the wafer, by exposing the wafer to an elongated strip-shaped exposure light traversing the wafer in a direction on a surface of the wafer being scanned in a direction substantially orthogonal to the traversing direction so as to expose their entire area of the surface of the wafer, comprising; light source means for exposing the wafer with the elongated strip-shaped light thereof; a focusing optical system for focusing the image of the pattern of the mask, on the wafer with the strip-shaped light of the light source means; and at least one sensor means for monitoring a quantity of the strip-shaped light at a plurality of positions in or proximate to an optical path between the light source means and the wafer so as to detect the distribution of the light in the elongated direction of the strip-shaped light at a position substantially corresponding to the mask or the wafer.
Claim 7
Dependent Claim
171 words
A projection aligner for transferring a pattern of a mask to focus an image of the pattern of the mask, on the wafer, by exposing the wafer to an elongated strip-shaped exposure light traversing the wafer in a direction on a surface of the wafer being scanned in a direction substantially orthogonal to the traversing direction so as to expose their entire area of the surface of the wafer, comprising; light source means for exposing the wafer with the elongated strip-shaped light thereof; a focusing optical system for focusing the image of the pattern of the mask, on the wafer with the strip-shaped light of the light source means; and at least one sensor means for monitoring a quantity of the strip-shaped light at a plurality of positions in or proximate to an optical path between the light source means and the wafer so as to detect the distribution of the light in the elongated direction of the strip-shaped light at a position substantially corresponding to the mask or the wafer.
Claim 8
Dependent Claim
37 words
A projection aligner according to claim 5, wherein the at least one sensor means detects the quantity of the light which is to be incident on the wafer prior to the light being reflected from the wafer.
Claim 9
Dependent Claim
25 words
A projection aligner according to claim 6, wherein the wafer is disposed at a remote position from the mask when being exposed to the light.
Claim 10
Dependent Claim
15 words
A projection aligner according to claim 5, wherein a plurality of sensor means are provided.
Claim 11
Dependent Claim
43 words
A projection aligner according to claim 7, further comprising controlling means for adjusting the quantity of the light corresponding to a plurality of positions in the strip-shaped exposure light on the basis of the detected data of the at least one sensor means.
Claim 12
Dependent Claim
27 words
A projection aligner according to claim 9, wherein the controlling means controls at least a portion of a width of an aperture defining the strip-shaped exposure light.
Claim 13
Dependent Claim
35 words
A projection aligner according to claim 7, wherein the at least one sensor means detects the quantity of the light at a position at which an image is formed at the exposure of the wafer.
Claim 14
Dependent Claim
178 words
A projection aligner for transferring a pattern of a mask to a wafer to focus an image of the pattern of the mask, on the wafer, comprising: light source means for exposing the wafer with an elongated strip-shaped light thereof; a focusing optical system for focusing the image of the pattern of the mask on the wafer with the strip-shaped light of the light source means; at least one sensor means for monitoring a quantity of the strip-shaped light at a plurality of positions in or proximate to an optical path of the strip-shaped light to be incident on the wafer between the light source means and the wafer, so as to detect the distribution of the light in the elongated direction of the strip-shaped light at a position substantially corresponding to the position of the mask or the wafer; and changing means for changing the optical path of the strip-shaped light relative to the wafer so that the optical path of the strip-shaped light incident on the wafer traverses the surface of the wafer to be exposed.
Claim 15
Dependent Claim
178 words
A projection aligner for transferring a pattern of a mask to a wafer to focus an image of the pattern of the mask, on the wafer, comprising: light source means for exposing the wafer with an elongated strip-shaped light thereof; a focusing optical system for focusing the image of the pattern of the mask on the wafer with the strip-shaped light of the light source means; at least one sensor means for monitoring a quantity of the strip-shaped light at a plurality of positions in or proximate to an optical path of the strip-shaped light to be incident on the wafer between the light source means and the wafer, so as to detect the distribution of the light in the elongated direction of the strip-shaped light at a position substantially corresponding to the position of the mask or the wafer; and changing means for changing the optical path of the strip-shaped light relative to the wafer so that the optical path of the strip-shaped light incident on the wafer traverses the surface of the wafer to be exposed.
Claim 16
Dependent Claim
28 words
A projection aligner according to claim 12, wherein the at least one sensor means detects the quantity of the light to the light being reflected from the wafer.
Claim 17
Dependent Claim
25 words
A projection aligner according to claim 13, wherein the wafer is disposed at a remote position from the mask when being exposed to the light.
Claim 18
Dependent Claim
26 words
A projection aligner according to claim 14, wherein the at least one sensor means monitors the quantity of the light during the exposure of the wafer.
Claim 19
Dependent Claim
43 words
A projection aligner according to claim 14, further comprising controlling means for adjusting the quantity of the light corresponding to a plurality of positions in the strip-shaped exposure light on the basis of the detected data of the at least one sensor means.
Claim 20
Dependent Claim
26 words
A projection aligner according to claim 16, wherein the controlling means controls at least a portion of a width of an aperture defining the strip-shaped exposure.
Claim 21
Dependent Claim
36 words
A projection aligner according to claim 14, wherein the at least one sensor means detects the quantity of the light at a position at which an image is formed at the exposure light of the wafer.
Claim 22
Dependent Claim
38 words
A projection aligner according to claim 1, wherein the at least one sensor means is displaceable in the elongated direction of the strip-shaped light so as to detect the quantity of the light at the plurality of positions.
Claim 23
Dependent Claim
38 words
A projection aligner according to claim 5, wherein the at least one sensor means is displaceable in the elongated direction of the strip-shaped light so as to detect the quantity of the light at the plurality of positions.
Claim 24
Dependent Claim
38 words
A projection aligner according to claim 12, wherein the at least one sensor means is displaceable in the elongated direction of the strip-shaped light so as to detect the quantity of the light at the plurality of positions.
References Cited (Backward Citations)
US3422442A
Cited
DE2009284A1
Cited
GB1354044A
Cited
US3949226A
Cited
DE2346720A1
Cited
GB1513433A
Cited
DE2600933A1
Cited
CH608898A5
Cited
DE2635112A1
Cited
US4161363A
Cited
US4163150A
Cited
GB2013910A
Cited
DE2951233A1
Cited
GB2046943A
Cited
EP0021363A1
Cited
DE3103222A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-10-19 | 1991-04-20 | 1991-10-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-10-19 | 1995-04-20 | 1995-10-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-10-19 | 1999-04-20 | 1999-10-20 | $7700.00 | Window Closed / Lapsed |