US4686168A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fluoroalkyl acrylate resist material and process for forming fine resist pattern
Assignee: Daikin Industries Ltd
•
Filing: 1985-03-11
•
Granted: 1987-08-11
•
Expires: 2005-03-11
Abstract
Abstract A resist material of positive type having a high sensitivity, a high resolving power and an excellent adhesion property to substrates, which comprises a copolymer of a fluoroalkyl acrylate having the general formula: ##STR1## wherein R 1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, with an acrylic comonomer selected from the group consisting of a glycidyl acrylate, an acrylic acid, an acrylamide and an α-cyanoacrylate.
Inventors
- 👤 Tsuneo Fujii
- 👤 Hiroshi Inukai
- 👤 Takayuki Deguchi
- 👤 Toshihiko Amano
- 👤 Masami Kakuchi
- 👤 Hiroshi Asakawa
- 👤 Osamu Kogure
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 23:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24826
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
206 words
A process for forming fine resist patterns which comprises irradiating portions of a positive resist film with high energy rays, the positive resist film being made of a copolymer of a fluoroalkyl acrylate having the general formula (I): ##STR8## wherein R 1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, and an acrylic comonomer selected from the group consisting of a glycidyl acrylate having the general formula (II): ##STR9## wherein R 3 is hydrogen atom, methyl group or ethyl group, an acrylic acid having the general formula (III): ##STR10## wherein R 3 is as defined above, an acrylamide having the general formula (IV): ##STR11## wherein R 3 is as defined above, and an α-cyanoacrylate having the general formula (V): ##STR12## wherein R 4 is hydrogen atom or an alkyl group having 1 to 5 carbon atoms, the ratio of the fluoroalkyl acrylate (I) to the acrylic comonomer being from 80:20 to 99.9:0.1 by mole and conducting development with a developer to remove only the irradiated portions of the positive resist film.
Claim 2
Dependent Claim
206 words
A process for forming fine resist patterns which comprises irradiating portions of a positive resist film with high energy rays, the positive resist film being made of a copolymer of a fluoroalkyl acrylate having the general formula (I): ##STR8## wherein R 1 is methyl group, ethyl group, a halogen-substituted methyl or ethyl group, a halogen atom or hydrogen atom, R 2 is a bivalent hydrocarbon group having 1 to 6 carbon atoms, and R f is a fluoroalkyl group having 1 to 15 carbon atoms, and an acrylic comonomer selected from the group consisting of a glycidyl acrylate having the general formula (II): ##STR9## wherein R 3 is hydrogen atom, methyl group or ethyl group, an acrylic acid having the general formula (III): ##STR10## wherein R 3 is as defined above, an acrylamide having the general formula (IV): ##STR11## wherein R 3 is as defined above, and an α-cyanoacrylate having the general formula (V): ##STR12## wherein R 4 is hydrogen atom or an alkyl group having 1 to 5 carbon atoms, the ratio of the fluoroalkyl acrylate (I) to the acrylic comonomer being from 80:20 to 99.9:0.1 by mole and conducting development with a developer to remove only the irradiated portions of the positive resist film.
Claim 3
Dependent Claim
34 words
The process of claim 1, wherein said copolymer is a copolymer of the fluoroalkyl acrylate (I) with an acrylic comonomer selected from the group consisting of the glycidyl acrylate (II) and the α-cyanoacrylate (V).
Claim 4
Dependent Claim
17 words
The process of claim 2, wherein the developer is an alcohol having 3 to 8 carbon atoms.
Claim 5
Dependent Claim
66 words
The process of claim 2, wherein the developer is a mixture of an alcohol having 3 to 8 carbon atoms with an organic solvent selected from the group consisting of a ketone, an alkyl cellosolve having a C 1 to C 5 alkyl group and an alkyl alkanate having a C 1 to C 5 alkyl group and a C 1 to C 5 alkanate group.
Claim 6
Dependent Claim
48 words
The process of claim 2, wherein the developer is a mixture of an alcohol selected from the group consisting of isopropyl alcohol and n-propyl alcohol with a solvent selected from the group consisting of methyl isobutyl ketone, methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate and ethyl cellosolve acetate.
Claim 7
Dependent Claim
34 words
The process of claim 1, wherein said copolymer is a copolymer of the fluoroalkyl acrylate (I) with an acrylic comonomer selected from the group consisting of the acrylic acid (III) and the acrylamide (IV).
Claim 8
Dependent Claim
17 words
The process of claim 6, wherein the developer is an alcohol having 2 to 8 carbon atoms.
Claim 9
Dependent Claim
31 words
The process of claim 6, wherein the developer is a mixture of an alcohol having 2 to 8 carbon atoms with a hydrocarbon having 5 to 11 carbon atoms or water.
Claim 10
Dependent Claim
42 words
The process of claim 6, wherein the developer is a mixture of an alcohol selected from the group consisting of isopropyl alcohol and n-propyl alcohol with a solvent selected from the group consisting of hexane, heptane, octane, nonane, benzene, cyclohexane and water.
References Cited (Backward Citations)
US4262081A
Cited
US4421843A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-08-10 | 1991-02-09 | 1991-08-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-08-10 | 1995-02-09 | 1995-08-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-08-10 | 1999-02-09 | 1999-08-11 | $7700.00 | Window Closed / Lapsed |