Abstract A monolithic surface acoustic wave convolver has a structure of piezoelectric layer/insulative layer/p(n)-type semiconductive layer/n(p)-type semiconductive layer/n + (p + )-type semiconductive substrate in which the p(n)-type semiconductive layer has a uniform thickness, and its acceptor (donor) concentration and thickness are selected to allow a depletion layer to expand throughout it under zero bias. The p(n)-type semiconductive layer and n(p)-type semiconductive layer are made by epitaxially growing the n(p)-type semiconductive layer on the n + (p + )-type semiconductive substrate and subsequently change the conductivity of the surface portion of the epitaxial layer by impurity diffusion or ion implantation.
A surface acoustic wave device comprising: a low-resistance semiconductive substrate in a first conductivity; a semiconductive layer in the first conductivity provided on said substrate; a semiconductive layer in a second conductivity provided on said first conductivity semiconductive substrate; an insulative layer provided on said second conductivity semiconductive layer; a piezoelectric layer provided on said insulative layer; a gate electrode provided on said piezoelectric layer; two comb-shaped electrodes provided on opposite sides of said gate electrode; and a bias voltage source connected to said gate electrode, said second conductivity semiconductive layer having an impurity concentration and a thickness which allow a depletion layer to expand throughout it when a bias voltage supplied from said bias voltage source is zero.
Claim 2
Dependent Claim
119 words
A surface acoustic wave device comprising: a low-resistance semiconductive substrate in a first conductivity; a semiconductive layer in the first conductivity provided on said substrate; a semiconductive layer in a second conductivity provided on said first conductivity semiconductive substrate; an insulative layer provided on said second conductivity semiconductive layer; a piezoelectric layer provided on said insulative layer; a gate electrode provided on said piezoelectric layer; two comb-shaped electrodes provided on opposite sides of said gate electrode; and a bias voltage source connected to said gate electrode, said second conductivity semiconductive layer having an impurity concentration and a thickness which allow a depletion layer to expand throughout it when a bias voltage supplied from said bias voltage source is zero.
Claim 3
Dependent Claim
47 words
A surface acoustic wave device of claim 1 wherein said substrate is an n + -type semiconductor, said first conductivity semiconductive layer is an n-type semiconductive epitaxial layer, and said second conductivity semiconductive layer is the surface of said epitaxial layer changed to a p-type semiconductive layer.
Claim 4
Dependent Claim
47 words
A surface acoustic wave device of claim 2 wherein said substrate is a p + -type semiconductor, said first conductivity semiconductive layer is a p-type semiconductive epitaxial layer, and said second conductivity semiconductive layer is the surface of said epitaxial layer changed to an n-type semiconductive layer.