Plasma desmear/etchback system and method of use

Claim 2

A process for etching back the exposed edges of layers of resin in drilled, multi-layered resin/copper laminates in an evacuatable chamber having at least one ground electrode plate within the chamber and at least one radio frequency electrode plate within the chamber, comprising the steps of: heating at least one electrode plate to a temperature of at least 200 degrees Fahrenheit, said plate being a heated plate; placing at least one board to be etched on a surface of said heated plate; evacuating the air from the area surrounding the board to be etched and introducing a gas mixture to enhance the plasma etching process; activating a radio frequency generator to create a plasma flow in the chamber while continuing to maintain said at least one heated electrode plate at a temperature of at least 200 degrees Fahrenheit; and maintaining the flow of plasma for a predetermined length of time until the resin has been etched back from the surface of said exposed edges.

Claim 3

The process of claim 1 wherein said electrode plates are oriented horizontally.

Claim 4

The process of claim 1 wherein all of the electrode plates in said chamber are heated to at least 200 degrees Fahrenheit.

Claim 5

The process of claim 3 wherein said plates have a fluid passageway therein, having a fluid inlet and a fluid outlet and are heated by passing a heat transfer fluid through said passageways.

Claim 6

The process of claim 4 wherein all the fluid inlets are connected to an inlet manifold and all the fluid outlets are connected to an outlet manifold.

Claim 7

The process of claim 3 wherein said plates are heated to about 275 degrees Fahrenheit.

Claim 8

An improved plasma desmear/etchback apparatus for etching back the exposed edges of layers of resin in drilled multi-layered resin/copper laminates of the type having a plurality of ground electrode plates and a plurality of radio frequency electrode plates in parallel orientation in an evacuatable chamber, wherein the improvement comprises: a fluid passageway in at least two of said plates, said plates being heated plates and at least one of said heated plates being connected to a radio frequency source and at least one of said heated plates being a ground plate, said fluid passageway being connected to a source of temperature controlled heat transfer fluid whereby a board to be etched may be placed directly on the surface of one of said heated plates and the temperature of the plates being accurately controllable; heating means to heat the heat transfer fluid to a controllable temperature; and pump means to cause said heat transfer fluid to flow through the fluid passageway in said heated plates.

Claim 9

An improved plasma desmear/etchback apparatus for etching back the exposed edges of layers of resin in drilled multi-layered resin/copper laminates of the type having a plurality of ground electrode plates and a plurality of radio frequency electrode plates in parallel orientation in an evacuatable chamber, wherein the improvement comprises: a fluid passageway in at least two of said plates, said plates being heated plates and at least one of said heated plates being connected to a radio frequency source and at least one of said heated plates being a ground plate, said fluid passageway being connected to a source of temperature controlled heat transfer fluid whereby a board to be etched may be placed directly on the surface of one of said heated plates and the temperature of the plates being accurately controllable; heating means to heat the heat transfer fluid to a controllable temperature; and pump means to cause said heat transfer fluid to flow through the fluid passageway in said heated plates.

Claim 10

The improved plasma desmear/etchback apparatus of claim 7 wherein said electrode plates are positioned about horizontally.

Claim 11

The improved plasma desmear/etchback apparatus of claim 8 wherein there are a plurality of heated ground electrode plates and a plurality of heated radio frequency electrode plates.

Claim 12

The improved plasma desmear/etchback apparatus of claim 9 wherein each of said ground electrode plates and each of said radio frequency electrode plates have a fluid passageway therein and are heated by the passage of a heat transfer fluid therethrough.

Claim 13

The improved plasma desmear/etchback apparatus of claim 10 wherein each of said plates has a fluid inlet and a fluid outlet, and each fluid inlet of each plate is connected to a fluid inlet manifold, and each fluid outlet of each plate is connected to a fluid outlet manifold.