US4670969A
Expired / Lapsed
US
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Method of making silicon diaphragm pressure sensor
Assignee: Hitachi Ltd
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Filing: 1985-01-25
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Granted: 1987-06-09
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Expires: 2005-01-25
Abstract
Abstract A method of making a silicon diaphragm pressure sensor includes forming an oxide film on one surface of a monocrystalline silicon substrate. A polycrystalline silicon layer is formed on the oxide film. The oxide film may be partly removed before the formation of the polycrystalline silicon layer. The polycrystalline silicon layer is heated and melt to recrystallize the same, thereby converting the polycrystalline silicon layer into a monocrystalline silicon layer. On the monocrystalline silicon layer may be epitaxially grown an additional monocrystalline silicon layer. By using the oxide film as an etching stopper, a predetermined portion of the substrate is etched over a range from the other surface of the substrate to the oxide film, thereby providing a diaphragm of the pressure sensor.
Inventors
- 👤 Kazuji Yamada
- 👤 Yutaka Kobayashi
- 👤 Kanji Kawakami
- 👤 Satoshi Shimada
- 👤 Masanori Tanabe
- 👤 Shigeyuki Kobori
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 16:52
CPC Classifications
G; G01; G01L; G01L9/00; G01L9/0041; G01L9/0042; G01P; G01P15/00; G01P15/02; G01P15/08; G01P15/0802; G01P2015/0805; G01P2015/0822; G01P2015/084; Y; Y10; Y10S; Y10S148/00; Y10S148/012; Y10S148/159; Y10S148/168; Y10T; Y10T29/00; Y10T29/42; Y10T29/49; Y10T29/49002; Y10T29/49082; Y10T29/49103
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
141 words
A method of making a silicon diaphragm pressure sensor comprising: a first step of preparing a monocrystalline silicon substrate having first and second major surfaces and forming an oxide film of a predetermined thickness on the first major surface; a second step of forming a polycrystalline silicon layer on said oxide film; a third step of converting said polycrystalline silicon layer into a monocrystalline silicon layer by heating and melting said polycrystalline silicon layer to recrystallize the same; a fourth step of epitaxially growing an additional monocrystalline silicon layer on said monocrystalline silicon layer; and a fifth step of etching a predetermined portion of said substrate extending over a range from the second major surface of said substrate to the first major surface thereof while using said oxide film as an etching stopper, thereby providing a diaphragm of the pressure sensor.
Claim 2
Independent Claim
141 words
A method of making a silicon diaphragm pressure sensor comprising: a first step of preparing a monocrystalline silicon substrate having first and second major surfaces and forming an oxide film of a predetermined thickness on the first major surface; a second step of forming a polycrystalline silicon layer on said oxide film; a third step of converting said polycrystalline silicon layer into a monocrystalline silicon layer by heating and melting said polycrystalline silicon layer to recrystallize the same; a fourth step of epitaxially growing an additional monocrystalline silicon layer on said monocrystalline silicon layer; and a fifth step of etching a predetermined portion of said substrate extending over a range from the second major surface of said substrate to the first major surface thereof while using said oxide film as an etching stopper, thereby providing a diaphragm of the pressure sensor.
Claim 3
Dependent Claim
56 words
A method according to claim 1 further comprising a step of selectively diffusing an impurity of an opposite conductivity type to that of said additional monocrystalline silicon layer from the surface of said additional monocrystalline silicon layer to form therein a diffused region of a predetermined pattern which serves as a piezo-resistor of the pressure sensor.
Claim 4
Dependent Claim
60 words
A method according to claim 1, wherein said additional monocrystalline silicon layer is epitaxially grown on said monocrystalline silicon layer after an impurity of an opposite conductivity type to that of said monocrystalline silicon layer is selectively diffused from the surface of said monocrystalline silicon layer to form therein a diffused layer which is to serve as a buried layer.
Claim 5
Independent Claim
160 words
A method of making a silicon diaphragm pressure sensor comprising: a first step of preparing a monocrystalline silicon substrate having first and second major surfaces and forming an oxide film of a predetermined thickness on the first major surface; a second step of partly removing said oxide film to partially expose the first major surface of said substrate; a third step of forming a polycrystalline silicon layer on said oxide film; a fourth step of converting said polycrystalline silicon layer into a monocrystalline silicon layer by heating and melting said polycrystalline silicon layer to recrystallize the same: a fifth step of epitaxially growing an additional monocrystalline silicon layer on said monocrystalline silicon layer; and a sixth step of etching a predetermined portion of said substrate extending over a range from the second major surface of said substrate to the first major surface thereof while using said oxide film as an etching stopper, thereby providing a diaphragm of the pressure sensor.
Claim 6
Independent Claim
160 words
A method of making a silicon diaphragm pressure sensor comprising: a first step of preparing a monocrystalline silicon substrate having first and second major surfaces and forming an oxide film of a predetermined thickness on the first major surface; a second step of partly removing said oxide film to partially expose the first major surface of said substrate; a third step of forming a polycrystalline silicon layer on said oxide film; a fourth step of converting said polycrystalline silicon layer into a monocrystalline silicon layer by heating and melting said polycrystalline silicon layer to recrystallize the same: a fifth step of epitaxially growing an additional monocrystalline silicon layer on said monocrystalline silicon layer; and a sixth step of etching a predetermined portion of said substrate extending over a range from the second major surface of said substrate to the first major surface thereof while using said oxide film as an etching stopper, thereby providing a diaphragm of the pressure sensor.
Claim 7
Dependent Claim
35 words
A method according to claim 2, further comprising a step of forming a passivating oxide film on that surface of said additional monocrystalline silicon layer in which said diffused region as the piezo-resistor is formed.
Claim 8
Dependent Claim
56 words
A method according to claim 4, further comprising a step of selectively diffusing an impurity of an opposite conductivity type to that of said additional monocrystalline silicon layer from the surface of said additional monocrystalline silicon layer to form therein a diffused region of a predetermined pattern which serves as a piezo-resistor of the pressure sensor.
Claim 9
Dependent Claim
35 words
A method according to claim 6, further comprising a step of forming a passivating oxide film on that surface of said additional monocrystalline silicon layer in which said diffused region as the piezo-resistor is formed.
Claim 10
Independent Claim
196 words
A method of making a silicon diaphragm pressure sensor comprising: a first step of forming an etch-resistant oxide film on one surface of a monocrystalline silicon substrate; a second step of forming a polycrystalline silicon layer on said etch-resistant oxide film; a third step of recrystallizing said polycrystalline silicon layer into a monocrystalline silicon layer; a fourth step of epitaxially growing an additional monocrystalline silicon layer of one conductivity type on said monocrystalline silicon layer; a fifth step of selectively diffusing an impurity of an opposite conductivity type to said one conductivity type into said additional monocrystalline silicon layer to form therein a piezo-resistor of the pressure sensor; a sixth steo of forming a passivating oxide film on said additional monocrystalline silicon layer; and a seventh step of selectively etching a predetermined central portion of said monocrystalline silicon substrate from a surface thereof opposite to said one surface until said one surface is reached to define a diaphragm of the pressure sensor which includes said etch-resistant oxide film, said monocrystalline silicon layer, said additional monocrystalline silicon layer and said passivating oxide film and which is peripherally supported by the remaining portion of said monocrystalline silicon substrate.
Claim 11
Independent Claim
196 words
A method of making a silicon diaphragm pressure sensor comprising: a first step of forming an etch-resistant oxide film on one surface of a monocrystalline silicon substrate; a second step of forming a polycrystalline silicon layer on said etch-resistant oxide film; a third step of recrystallizing said polycrystalline silicon layer into a monocrystalline silicon layer; a fourth step of epitaxially growing an additional monocrystalline silicon layer of one conductivity type on said monocrystalline silicon layer; a fifth step of selectively diffusing an impurity of an opposite conductivity type to said one conductivity type into said additional monocrystalline silicon layer to form therein a piezo-resistor of the pressure sensor; a sixth steo of forming a passivating oxide film on said additional monocrystalline silicon layer; and a seventh step of selectively etching a predetermined central portion of said monocrystalline silicon substrate from a surface thereof opposite to said one surface until said one surface is reached to define a diaphragm of the pressure sensor which includes said etch-resistant oxide film, said monocrystalline silicon layer, said additional monocrystalline silicon layer and said passivating oxide film and which is peripherally supported by the remaining portion of said monocrystalline silicon substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1990-06-08 | 1990-12-08 | 1991-06-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-06-08 | 1994-12-08 | 1995-06-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-06-08 | 1998-12-08 | 1999-06-09 | $7700.00 | Window Closed / Lapsed |