US4670650A
Expired / Lapsed
US
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Method of measuring resist pattern
Assignee: Hitachi Ltd
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Filing: 1985-05-24
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Granted: 1987-06-02
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Expires: 2005-05-24
Abstract
Abstract A method of measuring a resist pattern in which size and/or position of a latent image formed in the resist film by irradiation, is measured by Auger electron spectroscopy or a like method. With this method, since there is no need to develop when the resist pattern is not acceptable, manufacturing costs are decreased. By adjusting developing time by replying upon the data from the latent image, furthermore, high yield processing can be effected more precisely.
Inventors
- 👤 Toshiharu Matsuzawa
- 👤 Kozo Mochiji
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 15:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/38; G01; G01N; G01N23/00; G01N23/22; G01N23/227; G01N23/2276
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
48 words
A method of measuring a resist pattern wherein a pattern width and/or misalignment of a latent image formed in a resist film on a substrate by irradiation, is measured by determining the distribution of elements within said resist film and said latent image relying upon Auger electron spectroscopy.
Claim 2
Independent Claim
48 words
A method of measuring a resist pattern wherein a pattern width and/or misalignment of a latent image formed in a resist film on a substrate by irradiation, is measured by determining the distribution of elements within said resist film and said latent image relying upon Auger electron spectroscopy.
Claim 3
Dependent Claim
63 words
A method of measuring a resist pattern according to claim 1, wherein said substrate has a target mark, and an image of said target mark obtained by the reflection of primary electron beam incident upon the substrate is compared with the measurement of said latent image obtained by the method of said Auger electron spectroscopy, to measure alignment error of said latent image.
Claim 4
Dependent Claim
17 words
A method of measuring a resist pattern according to claim 1, wherein said resist is a photoresist.
Claim 5
Dependent Claim
31 words
A method of measuring a resist pattern according to claim 3, wherein said photoresist contains quinonediazide as a sensitizer, and said latent image is measured by determining the distribution of nitrogen.
Claim 6
Dependent Claim
19 words
A method of measuring a resist pattern according to claim 1, wherein said resist is an electron beam resist.
Claim 7
Dependent Claim
30 words
A method of measuring a resist pattern according to claim 5, wherein said electron beam resist contains polymethlpentenesulfon, and said latent image is determining by measuring the distribution of sulfur.
Claim 8
Dependent Claim
21 words
A method of measuring a resist pattern according to claim 1, wherein the pattern width of said latent image is measured.
Claim 9
Dependent Claim
19 words
A method of measuring a resist pattern according to claim 1, wherein misalignment of said latent image is measured.
Claim 10
Dependent Claim
23 words
A method of measuring a resist pattern according to claim 1, wherein the pattern width of said latent image and misalignment are measured.
Claim 11
Dependent Claim
27 words
A method of measuring a resist pattern according to claim 8, wherein said resist film is formed on a substrate that has a target mark for mask-alignment.
Claim 12
Dependent Claim
25 words
A method of measuring a resist pattern according to claim 9, wherein said resist film is formed on a substrate that has a target pattern.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-06-01 | 1990-12-01 | 1991-06-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-06-01 | 1994-12-01 | 1995-06-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-06-01 | 1998-12-01 | 1999-06-02 | $7700.00 | Window Closed / Lapsed |