Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
113 words
A process for producing relatively large-area, lightweight arrays of amorphous semiconductor alloy photovoltaic cells comprising: continuously depositing a thin semiconductor alloy film on an endless traveling surrogate substrate having a coefficient of thermal expansion different from that of said alloy film; continuously applying a transparent support material to the surface of said deposited thin semiconductor alloy film opposite said traveling surrogate substrate; continuously exposing said deposited thin semiconductor alloy film and traveling surrogate substrate to a thermal shock to continuously separate said alloy film and support material from said surrogate substrate; and cleaning said traveling surrogate substrate after separating said alloy film from it and before deposition an alloy film on it again.
Claim 2
Dependent Claim
113 words
A process for producing relatively large-area, lightweight arrays of amorphous semiconductor alloy photovoltaic cells comprising: continuously depositing a thin semiconductor alloy film on an endless traveling surrogate substrate having a coefficient of thermal expansion different from that of said alloy film; continuously applying a transparent support material to the surface of said deposited thin semiconductor alloy film opposite said traveling surrogate substrate; continuously exposing said deposited thin semiconductor alloy film and traveling surrogate substrate to a thermal shock to continuously separate said alloy film and support material from said surrogate substrate; and cleaning said traveling surrogate substrate after separating said alloy film from it and before deposition an alloy film on it again.
Claim 3
Dependent Claim
23 words
The process of claim 1 including cleaning said surrogate substrate by establishing an etching glow discharge between a cathode and said surrogate substrate.
Claim 4
Dependent Claim
31 words
The process of claim 1 including depositing said alloy film continuously by establishing and maintaining a glow discharge in at least one gaseous mixture containing at least one semiconductor precursor gas.
Claim 5
Dependent Claim
68 words
The process of claim 3 including depositing said alloy film in a plurality of layers by establishing and maintaining a plurality of glow discharges in a plurality of gaseous mixtures, each gas mixture containing at least one semiconductor precursor gas for depositing a thin film semiconductor alloy layer and some of said gas mixtures containing a dopant precursor gas for depositing a doped thin film semiconductor alloy layer.
Claim 6
Dependent Claim
43 words
The process of claim 4 including depositing, in sequence, a layer of said alloy film of a first conductivity type, a layer of substantially intrinsic conductivity type, an a layer of a second conductivity type opposite from that of said first conductivity type.
Claim 7
Dependent Claim
12 words
The process of claim 1 wherein said surrogate substrate comprises stainless steel.
Claim 8
Dependent Claim
27 words
The process of claim 1 including continuously passing said deposited alloy film and said traveling surrogate substrate through a low temperature fluid to create said thermal shock.
Claim 9
Dependent Claim
13 words
The process of claim 7 wherein said low temperature fluid comprises liquid nitrogen.
Claim 10
Dependent Claim
22 words
The process of claim 1 including continuously depositing a transparent, electrically conducting layer on said alloy film before applying said support material.
Claim 11
Dependent Claim
30 words
The process of claim 9 including etching said transparent, electrically conducting layer from the side of said alloy film opposite said support material to remove electrical defects from said array.
Claim 12
Dependent Claim
29 words
The process of claim 9 including applying an electrically insulating liquid to the side of said alloy film opposite said support material to remove electrical defects from said array.
Claim 13
Dependent Claim
126 words
Apparatus for producing relatively large-area, lightweight arrays of thin film semiconductor alloy photovoltaic cells comprising: means for continuously depositing a thin film of semiconductor alloy material on an endless surrogate substrate traveling through said apparatus, said surrogate substrate having a coefficient of thermal expansion different from that of said alloy film; means for driving said endless band; means for continuously applying a transparent support material to be deposited film opposite said traveling surrogate substrate; means for continuously applying a thermal shock to said deposited thin film semiconductor alloy film and said surrogate substrate to separate said alloy film and support material from said surrogate support continuously; and means for continuously cleaning said endless band after said alloy film and support material are separated from said band.
Claim 14
Dependent Claim
126 words
Apparatus for producing relatively large-area, lightweight arrays of thin film semiconductor alloy photovoltaic cells comprising: means for continuously depositing a thin film of semiconductor alloy material on an endless surrogate substrate traveling through said apparatus, said surrogate substrate having a coefficient of thermal expansion different from that of said alloy film; means for driving said endless band; means for continuously applying a transparent support material to be deposited film opposite said traveling surrogate substrate; means for continuously applying a thermal shock to said deposited thin film semiconductor alloy film and said surrogate substrate to separate said alloy film and support material from said surrogate support continuously; and means for continuously cleaning said endless band after said alloy film and support material are separated from said band.
Claim 15
Dependent Claim
29 words
The apparatus of claim 12 wherein said means for cleaning includes an electrode and means for establishing and maintaining an etching glow discharge between said electrode and said band.
Claim 16
Dependent Claim
56 words
The apparatus of claim 12 wherein said means for continuously depositing a thin film semiconductor alloy film comprises at least one glow discharge deposition chamber containing a cathode for establishing a glow discharge plasma between said cathode and surrogate substrate in a gas mixture admitted to said chamber and containing at least one semiconductor precursor gas.
Claim 17
Dependent Claim
51 words
The apparatus of claim 12, including at least three glow discharge deposition chambers disposed sequentially, said first and third chambers being dedicated to depositing opposite conductivity type layers of a thin film semiconductor alloy, said second chamber being dedicated to depositing a substantially intrinsic layer of a thin film semiconductor alloy.
Claim 18
Dependent Claim
31 words
The apparatus of claim 12 wherein said means for applying a thermal shock comprises a reservoir for containing a low temperature fluid bath through which said traveling surrogate substrate may pass.