US4650315A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Optical lithographic system
Assignee: SVG LITHOGRAPHY Inc A CORP OF
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Filing: 1985-05-10
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Granted: 1987-03-17
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Expires: 2005-05-10
Abstract
Abstract The present invention is directed to an improvement in optical lithographic systems which includes in combination a ring field projection system and an optical condenser system for illuminating the ring field in the projection system, the condenser system being constructed and arranged to have lateral color of the right sign and magnitude to complement the radial variation in imagery with wavelength of the ring field projection system.
Inventors
- 👤 David A. Markle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 16:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70225
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
64 words
An optical lithographic system comprising, in combination: a ring field projection system containing one or more refractive components; an optical condenser system for illuminating the ring field in the projection system; said optical condenser system being constructed and arranged to have lateral color of the right sign and magnitude to complement the radial variation in imagery with wavelength of the ring field projection system.
Claim 2
Dependent Claim
64 words
An optical lithographic system comprising, in combination: a ring field projection system containing one or more refractive components; an optical condenser system for illuminating the ring field in the projection system; said optical condenser system being constructed and arranged to have lateral color of the right sign and magnitude to complement the radial variation in imagery with wavelength of the ring field projection system.
Claim 3
Dependent Claim
36 words
An optical lithographic system according to claim 1 wherein said ring field projection system includes at least one convex and one concave mirror, said mirrors being nearly concentrically arranged along an optical axis, and refracting means.
Claim 4
Dependent Claim
18 words
An optical lithographic system according to claim 1 wherein said ring field projection system is a one-to-one system.
Claim 5
Dependent Claim
19 words
An optical lithographic system according to claim 1 wherein said optical condenser system is a ring field illumination system.
Claim 6
Dependent Claim
22 words
An optical lithographic system according to claim 4 wherein said ring field illumination system includes a thick lens and a spherical mirror.
Claim 7
Dependent Claim
130 words
An optical lithographic system comprising, in combination: a ring field projection system containing one or more refractive components; an optical condenser system for projecting a light image of a slit in the ring field in the projection system; said ring field projection system including means for defining an object plane where a mask is mountable and means for defining an image plane for receiving a real image of an object in the object plane and where a wafer is mountable, said object plane being disposed to receive said light image of the slit; said optical condenser system being constructed and arranged so that the radial position of the slit image in the object plane varies to complement the radial variation in imagery with wavelength of the ring field projection system.
Claim 8
Dependent Claim
130 words
An optical lithographic system comprising, in combination: a ring field projection system containing one or more refractive components; an optical condenser system for projecting a light image of a slit in the ring field in the projection system; said ring field projection system including means for defining an object plane where a mask is mountable and means for defining an image plane for receiving a real image of an object in the object plane and where a wafer is mountable, said object plane being disposed to receive said light image of the slit; said optical condenser system being constructed and arranged so that the radial position of the slit image in the object plane varies to complement the radial variation in imagery with wavelength of the ring field projection system.
Claim 9
Dependent Claim
19 words
An optical lithographic system according to claim 6 wherein the mask and/or the wafer is mounted for scanning movement.
Claim 10
Dependent Claim
39 words
An optical lithographic system according to claim 7 wherein said ring field projection system includes at least one convex and one concave spherical mirror, said mirrors having their centers of curvature disposed along an optical axis, and refracting means.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-03-16 | 1990-09-15 | 1991-03-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-03-16 | 1994-09-15 | 1995-03-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-03-16 | 1998-09-15 | 1999-03-17 | $7700.00 | Window Closed / Lapsed |