Thin film deposition

Claim 2

Apparatus for depositing a mono or multimolecular layer film on a substrate, said apparatus comprising a receptacle for receiving a liquid sub-phase for carrying a molecular layer film on the surface thereof, barrier means for enclosing a portion of the surface area of said liquid sub-phase, said barrier means including a fixed barrier member, a movable barrier member angularly movable in a substantially horizontal plane disposed above said fixed barrier member towards and away from said fixed barrier member for adjusting the effective area of said enclosed surface portion to enable lateral compression of said molecular layer film on said sub-phase surface, and means for dipping said substrate through said molecular layer film on said liquid sub-phase surface whereby to deposit a molecular layer of said film of said substrate.

Claim 3

Apparatus as claimed in claim 1 wherein said barrier means is adapted to enable said movable barrier member to be swept across said surface portion whereof to remove contaminants from said surface portion prior to addition of said molecular layer film.

Claim 4

Apparatus as claimed in claim 2 wherein said movable barrier member has a lower edge and said fixed first barrier member has an upper edge, and said lower edge of said movable barrier member is in substantially the same horizontal plane as said upper edge of said fixed barrier member, and said barrier means has means for adjusting the vertical position of said barrier means for lowering said edges below but not through the surface of the liquid sub-phase.

Claim 5

Apparatus as claimed in claim 1 wherein said dipping means (6) has support means for supporting said substrate and is operable to reciprocate said support means in a generally vertical path for driving said substrate through said film a preselected number of times.

Claim 6

Apparatus as claimed in claim 4 wherein said dipping means has means for sinusoidally varying the speed of said support means for providing a smooth transition in the reversal of direction of movement of the substrate.

Claim 7

Apparatus as claimed in claim 4 wherein the stroke of said dipping means is adjustable in the range 0-5 cm.

Claim 8

Apparatus as claimed in claim 1 further comprising a housing for supporting said receptacle, means for circulating fluid between said housing and said receptacle for controlling the temperature of said liquid sub-phase, and means for monitoring the temperature of said sub-phase and controlling the temperature of said fluid in dependence thereon whereby to maintain the temperature of said liquid sub-phase at a preselected value.

Claim 9

Apparatus as claimed in claim 1 further comprising means for monitoring the surface pressure of said molecular layer film on said liquid sub-phase and adjusting the angular position of said movable barrier member in dependence of said monitored surface pressure to adjust said surface pressure to a preselected value.

Claim 10

Apparatus as claimed in claim 8 wherein said monitoring means comprises means for partially projecting through the surface of the liquid sub-phase and means for measuring the force applied to said projecting means by said liquid sub-phase.

Claim 11

Apparatus as claimed in claim 1 wherein said movable barrier member has a pivot joint disposed along said fixed barrier member for movement of said movable barrier member between a position parallel to said fixed barrier member and a position disposed in angular relation to said fixed barrier member.

Claim 12

Apparatus as claimed in claim 1 wherein said fixed barrier member and said movable barrier member are rigid members.

Claim 13

Apparatus for depositing a mono or multimolecular layer film on a substrate, said apparatus comprising a housing, a receptacle supported by said housing for receiving a liquid sub-phase for carrying a molecular layer film on the surface thereof, said housing and said receptacle defining a space therebetween for containing fluid, barrier means for enclosing a portion of the surface area of said liquid sub-phase, said barrier means including a fixed barrier member, a movable barrier member angularly movable in a substantially horizontal plane towards and away from said fixed barrier member for adjusting the area of said surface area portion to enable lateral compression of said film on said sub-phase surface, said moveable barrier member having a lower edge and said fixed barrier member having an upper edge, and wherein said lower edge of said moveable barrier member is in substantially the same horizontal plane as said upper edge of said fixed barrier member, means for supporting said barrier means in said receptacle for enabling adjustment of the vertical position of said barrier means for lowering said edges below but not through the surface of said liquid sub-phase, and means for dipping said substrate through said molecular layer film on said liquid sub-phase surface whereby to deposit a molecular layer of said film on said substrate.

Claim 14

Apparatus for depositing a mono or multimolecular layer film on a substrate, said apparatus comprising a housing, a receptacle supported by said housing for receiving a liquid sub-phase for carrying a molecular layer film on the surface thereof, said housing and said receptacle defining a space therebetween for containing fluid, barrier means for enclosing a portion of the surface area of said liquid sub-phase, said barrier means including a fixed barrier member, a movable barrier member angularly movable in a substantially horizontal plane towards and away from said fixed barrier member for adjusting the area of said surface area portion to enable lateral compression of said film on said sub-phase surface, said moveable barrier member having a lower edge and said fixed barrier member having an upper edge, and wherein said lower edge of said moveable barrier member is in substantially the same horizontal plane as said upper edge of said fixed barrier member, means for supporting said barrier means in said receptacle for enabling adjustment of the vertical position of said barrier means for lowering said edges below but not through the surface of said liquid sub-phase, and means for dipping said substrate through said molecular layer film on said liquid sub-phase surface whereby to deposit a molecular layer of said film on said substrate.