X-ray source and X-ray lithography method

Claim 2

An X-ray source comprising: a gas plenum for storing a gas; a vacuum vessel; a pair of cylindrical electrodes opposed to each other substantially in coaxial relationship in the vacuum vessel; a gas valve for injecting the stored gas between said electrodes so that a cylindrical gas jet for the production of a plasma is formed; means for applying a voltage between said electrodes to perform discharge therebetween so that a discharge plasma is produced between said electrodes, said plasma being a linear plasma which has a high temperature and a high density and which is produced by the pinch of the plasma due to its own magnetic field produced by the current flowing through the plasma, so that X-rays are emitted from said linear plasma; an X-ray extraction window located below said pair of electrodes along the axis of said pair of electrodes; and an electrically grounded beam reflector for reflecting charged particles emitted from said plasma, said plasma, and said injected gas, said beam reflector being interposed between said pair of electrodes and said X-ray extraction windowand having a reflecting plane with an X-ray passing window, said reflecting plane being inclined at a predetermined angle relative to the axis of said pair of electrodes, wherein at least one of said pair of electrodes has a center hole, and X-rays are extracted in the direction of linear plasma produced substantially along the axis of said pair of electrodes.

Claim 3

An X-ray source as claimed in claim 1, wherein the pressure in said gas plenum is so controlled that the maximum gas molecular density of said gas jet does not exceed 10 19 cm -3 .

Claim 4

An X-ray source as claimed in claim 1, wherein said gas valve is a fast acting puff valve which is opened by an electromagnetic force and which is closed by the weight of said gas valve.

Claim 5

An X-ray source as claimed in claim 1, wherein one of said pair of electrodes on the side that said X-rays are extracted is grounded, while a negative potential is applied to the other electrode.

Claim 6

An X-ray source as claimed in claim 1, wherein one of said pair of electrodes is in the form of a hollow cylinder and is directly coupled to said gas valve, so that the gas is ejected from the interior of said one electrode, and said one electrode has an inner coaxial cylindrical electrode connected electrically to said one electrode.

Claim 7

An X-ray source as claimed in claim 7, wherein said pair of electrodes comprise a pair of hollow cylindrical electrodes disposed in coaxial relationship with each other.

Claim 8

An X-ray source as claimed in claim 1, further comprising an evacuation system which is coupled to said vacuum vessel to evacuate the inside of said vacuum vessel, and wherein said reflecting plane is opposed to said evacuation system.

Claim 9

An X-ray source as claimed in claim 1, wherein said beam reflector has a plurality of charged particle reflecting portions which are spaced apart from each other.

Claim 10

An X-ray source as claimed in claim 1, further comprising a charged particle remover which has an X-ray passing window and is coaxial with the axis of said pair of electrodes, said charged particle remover being interposed between said pair of electrodes and said X-ray extraction window located below said pair of electrodes.

Claim 11

An X-ray source as claimed in claim 1, wherein said beam reflector has a magnet which is so disposed as to produce a magnetic field for deflecting the incoming charge particles.

Claim 12

An X-ray source as claimed in claim 10, wherein said magnetic field is produced in a direction perpendicular to the direction of extracting the X-rays.

Claim 13

An X-ray source as claimed in claim 10, wherein the reflecting plane of said reflector is disposed in said magnetic field.

Claim 14

An X-ray source as claimed in claim 10, further comprising a magnetic shielding plate which has an X-ray passing window and has a high permeability, said magnetic shielding plate being interposed between said pair of electrodes and said beam reflector.

Claim 15

An X-ray source as claimed in claim 1, wherein the pressure in said gas plenum is in the range of 150 Torr to 1000 Torr.

Claim 16

An X-ray lithography method comprising the steps of: forming a gas jet for the production of a plasma between a pair of cylindrical electrodes substantially in coaxially opposed relationship with each other in a vacuum vessel, at least one of said pair of electrodes having a hole for passing X-rays; applying a voltage between said pair of electrodes to perform discharge therebetween so that a discharge plasma is produced between said pair of electrodes, a linear plasma with a high temperature and a high density being produced by the pinch of the plasma due to its own magnetic field produced by the current flowing through the plasma, so that X-rays are emitted from said linear plasma and derived in the direction of the axis of said linear plasma produced substantially along the axis of said pair of electrodes; extracting said X-rays through both an X-ray passing window of an electrically grounded beam reflector and an X-ray extraction window located below said pair of electrodes along the axis of said pair of electrodes, said beam reflector being interposed between said pair of electrodes and said X-ray extracting window and having a reflecting plane which is inclined at a predetermined angle relative to the axis of said pair of electrodes so that charged particles emitted from said plasma, said plasma, and gases are reflected by said reflecting plane; and exposing a wafer by the emitted X-rays through an X-ray exposure mask, said X-ray exposure mask and said wafer being so arranged along the axis of said linear plasma that the surfaces of said X-ray exposure mask and said wafer are perpendicular to the axis of said linear plasma.

Claim 17

An X-ray lithography method comprising the steps of: forming a gas jet for the production of a plasma between a pair of cylindrical electrodes substantially in coaxially opposed relationship with each other in a vacuum vessel, at least one of said pair of electrodes having a hole for passing X-rays; applying a voltage between said pair of electrodes to perform discharge therebetween so that a discharge plasma is produced between said pair of electrodes, a linear plasma with a high temperature and a high density being produced by the pinch of the plasma due to its own magnetic field produced by the current flowing through the plasma, so that X-rays are emitted from said linear plasma and derived in the direction of the axis of said linear plasma produced substantially along the axis of said pair of electrodes; extracting said X-rays through both an X-ray passing window of an electrically grounded beam reflector and an X-ray extraction window located below said pair of electrodes along the axis of said pair of electrodes, said beam reflector being interposed between said pair of electrodes and said X-ray extracting window and having a reflecting plane which is inclined at a predetermined angle relative to the axis of said pair of electrodes so that charged particles emitted from said plasma, said plasma, and gases are reflected by said reflecting plane; and exposing a wafer by the emitted X-rays through an X-ray exposure mask, said X-ray exposure mask and said wafer being so arranged along the axis of said linear plasma that the surfaces of said X-ray exposure mask and said wafer are perpendicular to the axis of said linear plasma.

Claim 18

An X-ray lithography method as claimed in claim 15, wherein the surfaces of said X-ray exposure mask and said wafer are disposed substantially horizontally.

Claim 19

An X-ray lithography method as claimed in claim 15, wherein the pressure of the gas to be injected to form said gas jet is in the range of 150 Torr to 1000 Torr.

Claim 20

An X-ray lighography method as claimed in claim 15, wherein the pressure of the gas to be injected to form said gas jet is in the range of 150 Toor to 500 Torr.