Plasma excitation system

Claim 2

A radio frequency exciter apparatus for producing an inductively coupled plasma to excite an analytic sample, comprising: (a) radio frequency generator means for producing electrical power of selected radio frequency, said generator means having power output tuning means, comprised of at least one output tuning inductor means and a tuning capacitor means connected in parallel therewith, for determining said generator radio frequency, said tuning inductor means having a series connection of a first portion, a second, center, portion and a third portion; (b) a separate plasma load circuit connected to said generator means and comprised of a work coil means and a series connected, impedance matching capacitor, wherein said plasma load circuit is directly connected to said output inductor, said work coil means produces an inductively coupled plasma and said impedance matching capacitor means is used to substantially balance the combined inductive reactances of said work coil means and plasma; and (c) control means for controlling the power input into said plasma load circuit to stabilize said plasma and reduce fluctuations thereof; (d) wherein said output tuning inductor means first portion is connected between a first side of said tuning capacitor means and said direct connection to the plasma load circuit, and said center portion is connected between said direct connection to the plasma load ground and a second side of said tuning capacitor means, said connections comprising means for automatically compensating for changing load impedance by shifting the frequency of said generator means.

Claim 3

An apparatus as recited in claim 1, wherein said impedance matching capacitor is a vacuum, variable capacitor.

Claim 4

An apparatus as recited in claim 1, further comprising power supply means for regulating the power input to said radio frequency generator, thereby maintaining a substantially constant generator output voltage.

Claim 5

An apparatus as recited in claim 1, wherein said generator means comprises an electron tube amplifier connected with said output tuning means to provide a Hartley-type radio frequency oscillator.

Claim 6

An apparatus as recited in claim 1, wherein said control means comprises a series circuit comprised of said work coil means and said impedance matching capacitor, wherein said impedance matching capacitor is adjusted to maintain a capacitive impedance which is equal to or greater than the combined inductive impedances of said work coil means and plasma when exciting said sample, so as to increase rf power delivered to said output tuning inductor as said combined inductive impedances are increased by the exciting of said sample.

Claim 7

An apparatus as recited in claim 5, wherein said control means further comprises a variable resistive impedance in said plasma, said resistive impedance being inductively coupled into and through said plasma load circuit and through said direct connection into said output tuning inductor of said generator means, thereby increasing the rf power delivered to said output tuning inductor as said resistive impedance is increased by the exciting of said sample.

Claim 8

A radio frequency excited apparatus for producing an inductively coupled plasma to excite an analytic sample, comprising: (a) a Hartley-type radio frequency generator means for producing electrical power of selected radio frequency, said generator means having power output tuning means comprised of at least one output tuning inductor and tuning capacitor connected in parallel therewith for determining said generator radio frequency, and said tuning inductor having a series connection of a first portion, a second, center portion and a third portion; (b) a separate plasma load circuit coupled to said generator means and comprised of a work coil and a series connected, impedance matching capacitor, wherein said plasma load circuit is directly connected to said output inductor, said work coil is adapted to produce an inductively coupled plasma and said capacitor is adapted to substantially balance the combined inductive reactances of said work coil and plasma; and (c) control means for controlling the power input into said plasma load circuit to stabilize said plasma and reduce fluctuations thereof, which comprises, said impedance matching capacitor adjusted to maintain a capacitive impedance which is equal to or greater than the combined inductive impedances of said work coil and plasma when exciting said sample, and a variable resistive impedance in said plasma, said resistive impedance being inductively coupled into and through said plasma load circuit and through said direct connection into said output tuning inductor of said generator means, thereby increasing the rf power delivered to said output tuning inductor as said resistive impedance and said combined inductive impedances are increased by the exciting of said sample; (d) wherein said output tuning inductor first portion is connected between a first side of said tuning capacitor and said direct connection to the plasma load circuit, said center portion is connected between said direct connection to the plasma load circuit and ground, and said third portion connected between ground and a second side of said tuning capacitor.

Claim 9

A radio frequency excited apparatus for producing an inductively coupled plasma to excite an analytic sample, comprising: (a) a Hartley-type radio frequency generator means for producing electrical power of selected radio frequency, said generator means having power output tuning means comprised of at least one output tuning inductor and tuning capacitor connected in parallel therewith for determining said generator radio frequency, and said tuning inductor having a series connection of a first portion, a second, center portion and a third portion; (b) a separate plasma load circuit coupled to said generator means and comprised of a work coil and a series connected, impedance matching capacitor, wherein said plasma load circuit is directly connected to said output inductor, said work coil is adapted to produce an inductively coupled plasma and said capacitor is adapted to substantially balance the combined inductive reactances of said work coil and plasma; and (c) control means for controlling the power input into said plasma load circuit to stabilize said plasma and reduce fluctuations thereof, which comprises, said impedance matching capacitor adjusted to maintain a capacitive impedance which is equal to or greater than the combined inductive impedances of said work coil and plasma when exciting said sample, and a variable resistive impedance in said plasma, said resistive impedance being inductively coupled into and through said plasma load circuit and through said direct connection into said output tuning inductor of said generator means, thereby increasing the rf power delivered to said output tuning inductor as said resistive impedance and said combined inductive impedances are increased by the exciting of said sample; (d) wherein said output tuning inductor first portion is connected between a first side of said tuning capacitor and said direct connection to the plasma load circuit, said center portion is connected between said direct connection to the plasma load circuit and ground, and said third portion connected between ground and a second side of said tuning capacitor.

Claim 12

An excitation method for producing an inductively coupled plasma, comprising the steps of: (a) generating electrical power of selected radio frequency with a rf generating means having a power output tuning means comprised of at least one output tuning inductor and a tuning capacitor connected in parallel therewith; wherein said tuning inductor has a first portion, a second, center portion and a third portion, connected in series, and said rf generating means includes a Hartley-type oscillator; (b) directing said rf power from said power output tuning means to a plasma load circuit which is directly connected to said tuning inductor and which is comprised of a coupling capacitor connected in series with a separate work coil adapted to produce said inductively coupled plasma, wherein said tuning inductor first portion is connected between a first side of said tuning capacitor and said direct connection to the plasma load circuit, said center portion is connected between said direct connection to the plasma load circuit and ground, and said third portion is connected between ground and a second side of said tuning capacitor; and (c) controlling the power input to said separate work coil and reduce fluctuations thereof by adjusting said coupling capacitor to maintain a capacitive impedance which is equal to or greater than the combined inductive impedances of said work coil and plasma when exciting an analytic sample, and by inductively coupling a variable resistive impedance in said plasma into and through said output tuning inductor of said generator means, thereby increasing the rf power delivered to said output tuning inductor as said resistive impedance and said combined inductive impedances are increased by the exciting of said sample.

Claim 13

An excitation method for producing an inductively coupled plasma, comprising the steps of: (a) generating electrical power of selected radio frequency with a rf generating means having a power output tuning means comprised of at least one output tuning inductor and a tuning capacitor connected in parallel therewith; wherein said tuning inductor has a first portion, a second, center portion and a third portion, connected in series, and said rf generating means includes a Hartley-type oscillator; (b) directing said rf power from said power output tuning means to a plasma load circuit which is directly connected to said tuning inductor and which is comprised of a coupling capacitor connected in series with a separate work coil adapted to produce said inductively coupled plasma, wherein said tuning inductor first portion is connected between a first side of said tuning capacitor and said direct connection to the plasma load circuit, said center portion is connected between said direct connection to the plasma load circuit and ground, and said third portion is connected between ground and a second side of said tuning capacitor; and (c) controlling the power input to said separate work coil and reduce fluctuations thereof by adjusting said coupling capacitor to maintain a capacitive impedance which is equal to or greater than the combined inductive impedances of said work coil and plasma when exciting an analytic sample, and by inductively coupling a variable resistive impedance in said plasma into and through said output tuning inductor of said generator means, thereby increasing the rf power delivered to said output tuning inductor as said resistive impedance and said combined inductive impedances are increased by the exciting of said sample.