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US4618562A Expired / Lapsed US ⏱️ 0.0 years remaining

Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor

Assignee: CNA Holdings LLC
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Filing: 1984-12-27
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Granted: 1986-10-21
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Expires: 2004-12-27
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Abstract

Abstract An improved negative working photographic element is prepared by coating a suitable substrate with a photosensitive composition comprising an admixture of two light sensitive diazonium salts and a binder composition comprising a polyvinyl acetate resin and a styrene/maleic acid half ester copolymer. Upon imagewise exposure of the element to actinic radiation through a suitable mask, the unexposed portions are removable with an aqueous alkaline developer.

Inventors

  • 👤 John E. Walls
  • 👤 Shuchen Liu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 06:06
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/021

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 792 words
A photosensitive composition which comprises in admixture: a polyvinyl acetate resin having an average molecular weight in the range of from about 100,000 to less than about 800,000; a styrene end-capped co-polymer of the formula ##STR7## wherein R is a lower aliphatic alcohol residue having from 1 to about 5 carbon atoms and wherein said polymer has an average molecular weight of not more than about 50,000; at least one light sensitive, negative working diazonium salt Diazo 1 which is a light sensitive, substantially linear polymeric diazonium reaction compound comprising repeating units of the condensation product of each of the general types E + X - and Q, in which E + X - is a radical of the compound of the general formula: ##STR8## wherein: --K-- is selected from the group consisting of ##STR9## --S--, --O--, and --CH 2 --, or is absent; R' is selected from the group consisting of phenyl and C 1 to C 4 alkyl substituted phenyl; P and P 1 are selected from the group consisting of C 1 to C 4 alkyl, methoxy, ethoxy, butoxy, or H; P 1 may be the same as P or different; and X - is an anion; and Q is a radical of an oligomer having the structure: ##STR10## wherein: R is selected from the group consisting of ##STR11## n is an integer from 0 to 3; M is an aromatic radical selected from the group consisting of aromatic hydrocarbons, diaryl ethers, diaryl sulfides, diaryl sulfones, diaryl amines, diaryl ketones and diaryl diketones; m is 1 to 6; Y is selected from the group consisting of --CH 2 -- or --CH 2 --O--CH 2 --bridge; and T is the same as R when Y=--CH 2 -- and H-- when Y=--CH 2 --0--CH 2 -- wherein said diazonium compound is prepared by a two-step process consisting essentially of forming a precondensed oligomer component Q and reacting said component Q with radical E + X - such that the ratio of M to E + X - is at least 2:1; and at least one light sensitive, negative working diazonium salt Diazo 2 which is a light sensitive diazonium compound prepared by reacting in the absence of added paraformaldehyde at least one A--N 2 X compound and at least one B 1 compound of the formula E(--CHR.sub.a --OR.sub.b).sub.m in which A--N 2 X is a radical of a compound selected from the group consisting of a compound of the formula ##STR12## wherein R 1 is a phenyl or naphthyl group R' 1 is a phenylene or naphthylene group R 2 is a phenylene group R 3 is a single bond or one of the groups --(CH 2 ) q --NR 4 -- --O--(CH 2 ) r --NR 4 -- --S--(CH 2 ) r --NR 4 -- --S--CH 2 --CO--NR 4 -- --O--R 5 --O-- --O-- --S-- or --CO--NR 4 -- the left-hand free valence of the specified groups is attached to R 1 and the right-hand free valence is attached to R 2 , wherein q is a number from 0 to 5 r is a number from 2 to 5 R 4 is selected from the group consisting of hydrogen, alkyl with 1 to 5 carbon atoms, aralkyl with 7 to 12 carbon atoms, and aryl with 6 to 12 carbon atoms, R 5 is an arylene group having 6 to 12 carbon atoms Y is one of the groups --NH--, and --O-- X is an anion p is a number from 1 to 3 E is a radical obtained by splitting off of m H atoms from a compound free of diazonium group selected from the group consisting of aromatic amines, phenols, thiophenols, phenyl ethers, aromatic thioethers, aromatic heterocyclic compounds, aromatic hydrocarbons and organic acid amides, R a is selected from the group consisting of hydrogen and phenyl, R b is selected from the group consisting of hydrogen, alkyl, ##STR13## wherein n is from 0 to 3 and a phenyl group, and m is an integer from 1 to 10 in a strongly acidic condensation medium and under condensation conditions sufficient to produce a polycondensation product of an aromatic diazonium compound containing, on the average, about 0.1 to 50 B 1 units per unit of A--N 2 X, wherein the total amount of the diazonium compounds ranges from about 20% to about 50% by weight of the composition, and the ratio of Diazo 1 to Diazo 2 is in the range of 1 to about 0.95-1.45; and wherein the polyvinyl acetate resin is present in the amount of from about 8% to about 33%; and wherein the styrene/maleic acid half ester copolymer is present in an amount of from about 25% to about 55% by weight of said composition.
Claim 2
Dependent Claim 792 words
A photosensitive composition which comprises in admixture: a polyvinyl acetate resin having an average molecular weight in the range of from about 100,000 to less than about 800,000; a styrene end-capped co-polymer of the formula ##STR7## wherein R is a lower aliphatic alcohol residue having from 1 to about 5 carbon atoms and wherein said polymer has an average molecular weight of not more than about 50,000; at least one light sensitive, negative working diazonium salt Diazo 1 which is a light sensitive, substantially linear polymeric diazonium reaction compound comprising repeating units of the condensation product of each of the general types E + X - and Q, in which E + X - is a radical of the compound of the general formula: ##STR8## wherein: --K-- is selected from the group consisting of ##STR9## --S--, --O--, and --CH 2 --, or is absent; R' is selected from the group consisting of phenyl and C 1 to C 4 alkyl substituted phenyl; P and P 1 are selected from the group consisting of C 1 to C 4 alkyl, methoxy, ethoxy, butoxy, or H; P 1 may be the same as P or different; and X - is an anion; and Q is a radical of an oligomer having the structure: ##STR10## wherein: R is selected from the group consisting of ##STR11## n is an integer from 0 to 3; M is an aromatic radical selected from the group consisting of aromatic hydrocarbons, diaryl ethers, diaryl sulfides, diaryl sulfones, diaryl amines, diaryl ketones and diaryl diketones; m is 1 to 6; Y is selected from the group consisting of --CH 2 -- or --CH 2 --O--CH 2 --bridge; and T is the same as R when Y=--CH 2 -- and H-- when Y=--CH 2 --0--CH 2 -- wherein said diazonium compound is prepared by a two-step process consisting essentially of forming a precondensed oligomer component Q and reacting said component Q with radical E + X - such that the ratio of M to E + X - is at least 2:1; and at least one light sensitive, negative working diazonium salt Diazo 2 which is a light sensitive diazonium compound prepared by reacting in the absence of added paraformaldehyde at least one A--N 2 X compound and at least one B 1 compound of the formula E(--CHR.sub.a --OR.sub.b).sub.m in which A--N 2 X is a radical of a compound selected from the group consisting of a compound of the formula ##STR12## wherein R 1 is a phenyl or naphthyl group R' 1 is a phenylene or naphthylene group R 2 is a phenylene group R 3 is a single bond or one of the groups --(CH 2 ) q --NR 4 -- --O--(CH 2 ) r --NR 4 -- --S--(CH 2 ) r --NR 4 -- --S--CH 2 --CO--NR 4 -- --O--R 5 --O-- --O-- --S-- or --CO--NR 4 -- the left-hand free valence of the specified groups is attached to R 1 and the right-hand free valence is attached to R 2 , wherein q is a number from 0 to 5 r is a number from 2 to 5 R 4 is selected from the group consisting of hydrogen, alkyl with 1 to 5 carbon atoms, aralkyl with 7 to 12 carbon atoms, and aryl with 6 to 12 carbon atoms, R 5 is an arylene group having 6 to 12 carbon atoms Y is one of the groups --NH--, and --O-- X is an anion p is a number from 1 to 3 E is a radical obtained by splitting off of m H atoms from a compound free of diazonium group selected from the group consisting of aromatic amines, phenols, thiophenols, phenyl ethers, aromatic thioethers, aromatic heterocyclic compounds, aromatic hydrocarbons and organic acid amides, R a is selected from the group consisting of hydrogen and phenyl, R b is selected from the group consisting of hydrogen, alkyl, ##STR13## wherein n is from 0 to 3 and a phenyl group, and m is an integer from 1 to 10 in a strongly acidic condensation medium and under condensation conditions sufficient to produce a polycondensation product of an aromatic diazonium compound containing, on the average, about 0.1 to 50 B 1 units per unit of A--N 2 X, wherein the total amount of the diazonium compounds ranges from about 20% to about 50% by weight of the composition, and the ratio of Diazo 1 to Diazo 2 is in the range of 1 to about 0.95-1.45; and wherein the polyvinyl acetate resin is present in the amount of from about 8% to about 33%; and wherein the styrene/maleic acid half ester copolymer is present in an amount of from about 25% to about 55% by weight of said composition.
Claim 3
Dependent Claim 24 words
The composition of claim 1 wherein the said co-polymer has an average molecular weight in the range of from about 10,000 to about 50,000.
Claim 4
Dependent Claim 24 words
The composition of claim 1 wherein the said resin has an average molecular weight in the range of from about 100,000 to about 700,000.
Claim 5
Dependent Claim 24 words
The composition of claim 1 wherein the said resin has an average molecular weight in the range of from about 100,000 to about 380,000.
Claim 6
Dependent Claim 30 words
The composition of claim 1 wherein Diazo 1 is the condensation product of the homocondensate of 4,4'-bismethoxy methyl diphenyl ether and 3-methoxy-4-diazo-diphenyl amine sulfate, precipitated as the mesitylene sulfonate salt.
Claim 7
Dependent Claim 24 words
The composition of claim 1 wherein Diazo 2 is the polycondensation product of 3-methoxy-4-diazo-diphenyl amine sulfate and 4,4'-bis-methoxy methyl-diphenyl ether, precipitated as mesitylene sulfonate.
Claim 8
Dependent Claim 88 words
The composition of claim 1 wherein the said resin has an average molecular weight in the range of from about 100,000 to about 380,000; and said polymer has an average molecular weight in the range of from about 10,000 to about 50,000; and wherein Diazo 1 is the condensation product of the homocondensate of 4,4'-bis-methoxy methyl diphenyl ether and 3-methoxy-4-diazo-diphenyl amine sulfate, precipitated as the mesitylene sulfonate salt and wherein Diazo 2 is the polycondensation product of 3-methoxy-4-diazo-diphenyl amine sulfate and 4,4'-bis-methoxy methyl-diphenyl ether, precipitated as mesitylene sulfonate.
Claim 9
Dependent Claim 23 words
The composition of claim 1 further comprising one or more ingredients selected from the group consisting of exposure indicators, acid stabilizers and colorants.
Claim 10
Dependent Claim 16 words
A photosensitive element which comprises a substrate and the composition of claim 1 on said substrate.
Claim 11
Dependent Claim 20 words
A lithographic printing plate which comprises an aluminum containing substrate and the composition of claim 1 coated on said substrate.
Claim 12
Dependent Claim 20 words
A lithographic printing plate which comprises an aluminum containing substrate and the composition of claim 7 coated on said substrate.
Claim 13
Dependent Claim 33 words
A lithographic printing plate which comprises an aluminum containing substrate, at least one surface of which has been grained, anodized and hydrophilized; and the composition of claim 1 coated onto said treated surface.
Claim 14
Dependent Claim 41 words
A lithographic printing plate which comprises an aluminum containing substrate, at least one surface of which has been grained, anodized and treated with a polyvinyl phosphoric acid containing hydrophilizing composition; and the composition of claim 7 coated onto said treated surface.
Claim 15
Dependent Claim 32 words
A lithographic printing plate which comprises an aluminum containing substrate, at least one surface of which has been grained and hydrophilized; and the composition of claim 1 coated onto said treated surface.

References Cited (Backward Citations)

US2980534A Cited
US3679419A Cited
US3849392A Cited
GB1313777A Cited
US3890152A Cited
GB1525757A Cited
US4294905A Cited
US4472494A Cited
US4436804A Cited
US4511640A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-10-20 1990-04-21 1990-10-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-10-20 1994-04-21 1994-10-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-10-20 1998-04-21 1998-10-21 $7700.00 Window Closed / Lapsed

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