US4616130A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection exposure apparatus
Assignee: Canon Inc
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Filing: 1985-04-11
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Granted: 1986-10-07
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Expires: 2005-04-11
Abstract
Abstract A projection exposure apparatus for projecting, onto a semiconductor wafer through a projection lens, an integrated circuit pattern formed on a mask or reticle. An alignment beam having a wavelength different from that for the exposure is used to achieve alignment between the mask and the wafer. A parallel flat plate is detachably disposed between the projection lens and the mask and/or the wafer to prevent a magnification error and/or a focus error of the projection lens which would otherwise be caused upon alignment due to the difference in wavelength.
Inventors
- 👤 Takashi Omata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 03:40
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7003; G03F9/7023; G03F9/7026
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
151 words
A projection exposure apparatus, comprising: means for projecting, in a reduced scale, a pattern of a first object onto a second object; means for transferring the pattern of the first object onto the second object through said projecting means, said transfering means using light of a predetermined wavelength; means for aligning the first object with the second object through said projecting means, said aligning means using a wavelength of light different from that used with said transferring means; and means for correcting a focus error of said projecting means with respect to at least one of the wavelengths used with said transferring means and with said aligning means relative to the other, said correcting means having an optical element for changing the optical path length between said projecting means and the second object, said optical element being detachably introduced into the optical path between said projecting means and the second object.
Claim 2
Dependent Claim
151 words
A projection exposure apparatus, comprising: means for projecting, in a reduced scale, a pattern of a first object onto a second object; means for transferring the pattern of the first object onto the second object through said projecting means, said transfering means using light of a predetermined wavelength; means for aligning the first object with the second object through said projecting means, said aligning means using a wavelength of light different from that used with said transferring means; and means for correcting a focus error of said projecting means with respect to at least one of the wavelengths used with said transferring means and with said aligning means relative to the other, said correcting means having an optical element for changing the optical path length between said projecting means and the second object, said optical element being detachably introduced into the optical path between said projecting means and the second object.
Claim 3
Dependent Claim
15 words
An apparatus according to claim 1, wherein said optical element comprises a parallel flat plate.
Claim 4
Dependent Claim
206 words
A projection exposure apparatus, comprising: means for projecting, in a reduced scale, a pattern of a first object onto a second object; means for transferring, through said projecting means, the pattern of the first object onto the second object, said transferring means using light of a predetermined wavelength; means for aligning the first object with the second object through said projecting means, said aligning means using a wavelength of light different from that used with said transferring means; and means for correcting a magnification error and a focus error of said projecting means with respect to at least one of the wavelengths used with said transferring means and with said aligning means relative to the other, said correcting means having a first optical element for changing the position of an image, to be formed by said projecting means, in a plane perpendicular to the optical axis of said projecting means, and a second optical element for changing the optical path length between said projecting means and the second object, said first optical element being adapted to be disposed between said projecting means and the first object, and said second optical element being detacably introduced into the optical path between said projecting means and the second object.
Claim 5
Dependent Claim
206 words
A projection exposure apparatus, comprising: means for projecting, in a reduced scale, a pattern of a first object onto a second object; means for transferring, through said projecting means, the pattern of the first object onto the second object, said transferring means using light of a predetermined wavelength; means for aligning the first object with the second object through said projecting means, said aligning means using a wavelength of light different from that used with said transferring means; and means for correcting a magnification error and a focus error of said projecting means with respect to at least one of the wavelengths used with said transferring means and with said aligning means relative to the other, said correcting means having a first optical element for changing the position of an image, to be formed by said projecting means, in a plane perpendicular to the optical axis of said projecting means, and a second optical element for changing the optical path length between said projecting means and the second object, said first optical element being adapted to be disposed between said projecting means and the first object, and said second optical element being detacably introduced into the optical path between said projecting means and the second object.
Claim 6
Dependent Claim
20 words
An apparatus according to claim 3, wherein each of said first and second optical elements comprises a parallel flat plate.
Claim 7
Dependent Claim
30 words
An apparatus according to claim 4, wherein said first optical element comprises a plurality of parallel flat plates inclined symmetrically with respect to the optical axis of said projecting means.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-10-06 | 1990-04-07 | 1990-10-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-10-06 | 1994-04-07 | 1994-10-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-10-06 | 1998-04-07 | 1998-10-07 | $7700.00 | Window Closed / Lapsed |