US4614433A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Mask-to-wafer alignment utilizing zone plates
Assignee: Nokia Bell Labs
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Filing: 1984-07-09
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Granted: 1986-09-30
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Expires: 2004-07-09
Abstract
Abstract Mask-to-wafer alignment in X-ray lithography is advantageously carried out utilizing zone plate marks formed on the mask and wafer. In practice, it has been observed that the intensity and in some cases even the location of the centroid of the light spot formed by a zone plate mask can vary during alignment as the mask-to-wafer spacing is changed. The present invention is based on the discovery and analysis of the causes of such variations. Based thereon, applicants have devised a modified mask structure which, when used with a wafer in a zone plate alignment system, enables mask-to-wafer alignment to be made more easily and more reliably than was possible heretofore. The modified mask structure includes a localized blocking layer over each zone plate on the mask. This layer allows only a negligible portion of the light employed to illuminate the zone plates on the mask to propagate into the mask-to-wafer space. Also, the modified mask structure includes an antireflection layer that reduces interference effects between light spots imaged by the wafer zone plates and light reflected from the mask. Further, one layer of the modified mask structure is designed to have a quarter-wavelength thickness thereby minimizing interfering light reflected from that layer.
Inventors
- 👤 Martin Feldman
- 👤 Peter A. Heimann
- 👤 William A. Johnson
- 👤 Theodore F. Retajczyk, Jr.
- 👤 Donald L. White
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 07:19
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7073; G03F9/7076; G03F9/7003; G03F9/7023
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
143 words
A process for aligning a mask element with respect to a wafer element during manufacture of integrated-circuit devices on the wafer, wherein each of said mask and wafer elements includes at least one alignment mark, said mask element comprising an antireflection coating on the side thereof opposite to the side that includes said at least one mark and comprising a localized blocking layer encompassing each such mark, said process comprising the step of directing incident coherent radiation at said marks off-normal with respect to the surface of said coating such that reflections from said mask are minimized, and reducing by means of the localized blocking layer that encompasses each such mark the amount of said incident radiation that propagates into the mask-to-wafer space to be reflected from the surface of the wafer element towards said at least one mark on said mask element.
Claim 2
Dependent Claim
143 words
A process for aligning a mask element with respect to a wafer element during manufacture of integrated-circuit devices on the wafer, wherein each of said mask and wafer elements includes at least one alignment mark, said mask element comprising an antireflection coating on the side thereof opposite to the side that includes said at least one mark and comprising a localized blocking layer encompassing each such mark, said process comprising the step of directing incident coherent radiation at said marks off-normal with respect to the surface of said coating such that reflections from said mask are minimized, and reducing by means of the localized blocking layer that encompasses each such mark the amount of said incident radiation that propagates into the mask-to-wafer space to be reflected from the surface of the wafer element towards said at least one mark on said mask element.
Claim 3
Dependent Claim
95 words
In combination in a device fabrication system in which spaced-apart mask and wafer elements are to be aligned with respect to each other by directing incident radiation thereat, said mask element comprising a layer that is transparent to said incident radiation directed at said mask element for alignment purposes, at least one zone plate alignment mark on one side of said layer, and a localized blocking layer encompassing each mask zone plate mark to block said incident radiation from propagating into the mask-to-wafer space and being reflected back from the wafer element to the mark.
Claim 4
Dependent Claim
95 words
In combination in a device fabrication system in which spaced-apart mask and wafer elements are to be aligned with respect to each other by directing incident radiation thereat, said mask element comprising a layer that is transparent to said incident radiation directed at said mask element for alignment purposes, at least one zone plate alignment mark on one side of said layer, and a localized blocking layer encompassing each mask zone plate mark to block said incident radiation from propagating into the mask-to-wafer space and being reflected back from the wafer element to the mark.
Claim 5
Dependent Claim
51 words
A combination as in claim 2 wherein the wafer element includes at least one zone plate alignment mark and the mask element further comprises a transparent membrane in contact with the other side of said transparent layer, and a coating on said membrane constituting an antireflection coating for said incident radiation.
Claim 6
Dependent Claim
22 words
A combination as in claim 3 wherein the thickness of the transparent layer is approximately a quarter-wave thickness for said incident radiation.
Claim 7
Dependent Claim
21 words
A combination as in claim 4 in which said transparent layer comprises a polyimide material and said membrane comprises boron nitride.
Claim 8
Dependent Claim
20 words
A combination as in claim 5 wherein said blocking layer comprises a material that is reflective of said incident radiation.
Claim 9
Dependent Claim
12 words
A combination as in claim 6 wherein said blocking layer comprises aluminum.
Claim 10
Dependent Claim
46 words
A combination as in claim 7 wherein the portions of said transparent layer directly underlying elements of each mask zone plate differ in thickness by approximately a quarter-wavelength of the wavelength of said incident radiation from portions of said transparent layer that lie between said elements.
Claim 11
Dependent Claim
20 words
A combination as in claim 5 wherein said blocking layer comprises a material that is absorptive of said incident radiation.
Claim 12
Dependent Claim
24 words
A combination as in claim 9 wherein said blocking layer comprises a photoresist having therein a dye that is absorptive of said incident radiation.
Claim 13
Dependent Claim
161 words
In combination in a device fabrication system in which spaced-apart mask and wafer elements are to be aligned with respect to each other by directing incident radiation thereat, each of said elements including at least one zone plate alignment mark, said mask element comprising first and second layers that are transparent to said incident radiation directed at said mask element for alignment purposes, said layers having facing surfaces in intimate contact with each other, said at least one zone plate alignment mark being on the other surface of said first layer, and an antireflection coating for said incident radiation on the other surface of said second layer, wherein said first layer has approximately a quarter-wavelength thickness with respect to said incident radiation, and wherein each zone plate alignment mark on the mask element is covered with a layer that blocks said incident radiation from propagating into the mask-to-wafer space and being reflected from the wafer element back to said mask mark.
Claim 14
Dependent Claim
161 words
In combination in a device fabrication system in which spaced-apart mask and wafer elements are to be aligned with respect to each other by directing incident radiation thereat, each of said elements including at least one zone plate alignment mark, said mask element comprising first and second layers that are transparent to said incident radiation directed at said mask element for alignment purposes, said layers having facing surfaces in intimate contact with each other, said at least one zone plate alignment mark being on the other surface of said first layer, and an antireflection coating for said incident radiation on the other surface of said second layer, wherein said first layer has approximately a quarter-wavelength thickness with respect to said incident radiation, and wherein each zone plate alignment mark on the mask element is covered with a layer that blocks said incident radiation from propagating into the mask-to-wafer space and being reflected from the wafer element back to said mask mark.
Claim 15
Dependent Claim
21 words
A combination as in claim 11 wherein said first layer comprises a polyimide material and said second layer comprises boron nitride.
Claim 16
Dependent Claim
28 words
A combination as in claim 12 wherein said antireflection coating comprises a material selected from the group consisting of plasma-deposited fluorocarbon, sputtered silicon dioxide and spun-on siloxane polymer.
Claim 17
Dependent Claim
50 words
A combination as in claim 13 wherein said system comprises an X-ray lithography system designed for operation at the 4.36 Å palladium line and each of said zone plate alignment marks includes three-layer elements comprising tantalum, gold and tantalum, in that order, on the other surface of said first layer.
References Cited (Backward Citations)
US4037969A
Cited
US4326805A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-09-29 | 1990-03-31 | 1990-09-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-09-29 | 1994-03-31 | 1994-09-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-09-29 | 1998-03-31 | 1998-09-30 | $7700.00 | Window Closed / Lapsed |