US4612099A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Reactive ion etching method
Assignee: Panasonic Holdings Corp
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Filing: 1984-07-11
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Granted: 1986-09-16
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Expires: 2004-07-11
Abstract
Abstract According to the present invention, there is used a usual reactive ion etching apparatus (as shown in FIG. 1) including a vacuum vessel (1), exhaust means (2), etching gas supply means (4), plasma generating electrodes (6) and high frequency power supply (7). Substance having a catalytic action (8) is inserted in the etching gas supply means (4), by which the present invention is characterized. According to the present invention, a catalyst having an action of dehydrogenation, dehydrohalogenation or dehalogenation dependent on the molecular structure of a halogenized gas to be used, is inserted in the etching gas supply means in the path thereof, thereby to improve the etching speed and the etching selectively without the use of explosive or injurious gases such as hydrogen, chlorine, hydrogen chloride or hydrogen fluoride as additive gases.
Inventors
- 👤 Masuo Tanno
- 👤 Yuichiro Yamada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 14:30
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P50/26; H10P50/264; H10P50/266; H10P50/267
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
128 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a reactive ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a catalyst for dehydrogenation is used as said substance having a catalytic action, when a halogenized gas containing hydrogen atoms is used as said main composition of the etching gas.
Claim 2
Dependent Claim
128 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a reactive ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a catalyst for dehydrogenation is used as said substance having a catalytic action, when a halogenized gas containing hydrogen atoms is used as said main composition of the etching gas.
Claim 3
Dependent Claim
128 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a reactive ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a catalyst for dehydrohalogenation is used as said substance having a catalytic action, when a halogenized gas containing hydrogen atoms is used as said main composition of the etching gas.
Claim 4
Dependent Claim
128 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a reactive ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a catalyst for dehydrohalogenation is used as said substance having a catalytic action, when a halogenized gas containing hydrogen atoms is used as said main composition of the etching gas.
Claim 5
Dependent Claim
125 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a reactive ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a catalyst for dehalogenation is used as said substance having a catalytic action, when a halogenized gas is used as said main composition of the etching gas.
Claim 6
Dependent Claim
125 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a reactive ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a catalyst for dehalogenation is used as said substance having a catalytic action, when a halogenized gas is used as said main composition of the etching gas.
Claim 7
Dependent Claim
124 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a rective ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a cracking catalyst is used as said substance having a catalytic action, when a halogenized gas is used as said main composition of the etching gas.
Claim 8
Dependent Claim
124 words
In a reactive ion etching method using a halogenized gas as a main composition of an etching gas with the use of a rective ion etching apparatus including a vacuum vessel, exhaust means connected to said vacuum vessel, etching gas supply means, plasma generating electrodes disposed inside or outside of said vacuum vessel, and a high frequency power supply for supplying a high frequency electric power to said electrodes, said reactive ion etching method characterized in that a substance having a catalytic action is inserted in said etching gas supply means in the path thereof, and in that a cracking catalyst is used as said substance having a catalytic action, when a halogenized gas is used as said main composition of the etching gas.
Claim 9
Dependent Claim
28 words
A reactive ion etching method as set forth in claim 1, 2, 3 or 4 wherein a metallic catalyst is used as the substance having a catalytic action.
Claim 10
Dependent Claim
29 words
A reactive ion etching method as set forth in claim 1, 2, 3 or 4 wherein a solid acid-base catalyst is used as the substance having a catalytic action.
Claim 11
Dependent Claim
40 words
A reactive ion etching method as set forth in claim 1, 2, 3 or 4 wherein a catalyst in which a metallic catalyst is carried by a solid acid-base catalyst carrier, is used as the substance having a catalytic action.
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