Method of fabricating integrated semiconductor circuit

Claim 1

A method of fabricating an integrated semiconductor circuit device having a plurality of layers of circuit patterns, comprising forming the circut pattern of at least one of said layers and at least one target mark for a photomask by a direct exposure method using an electron beam, and forming the circuit pattern of at least one of the remaining layers by a light exposure method using the photomask positioned by means of said target mark.

Claim 2

A method of fabricating an integrated semiconductor circuit device having a plurality of layers of circuit patterns, comprising forming the circut pattern of at least one of said layers and at least one target mark for a photomask by a direct exposure method using an electron beam, and forming the circuit pattern of at least one of the remaining layers by a light exposure method using the photomask positioned by means of said target mark.

Claim 3

A method of fabricating an integrated semiconductor circuit device, comprising forming at least one registration mark on a semiconductor wafer, forming a first layer of a circuit pattern on a semiconductor wafer and at least one target mark for a photomask by irradiating the semiconductor wafer with an electron beam by using said registration mark as a reference for locating the circuit pattern correctly on the semiconductor wafer, forming at least one additional semiconductor layer on said wafer, and irradiating said additional semiconductor layer with light through the photomask positioned on the wafer by using said target mark as a reference for correctly positioning the photomask with respect to the wafer.

Claim 4

A method of fabricating an integrated semiconductor circuit device, comprising forming at least one registration mark on a semiconductor wafer, forming a first layer of a circuit pattern on a semiconductor wafer and at least one target mark for a photomask by irradiating the semiconductor wafer with an electron beam by using said registration mark as a reference for locating the circuit pattern correctly on the semiconductor wafer, forming at least one additional semiconductor layer on said wafer, and irradiating said additional semiconductor layer with light through the photomask positioned on the wafer by using said target mark as a reference for correctly positioning the photomask with respect to the wafer.

Claim 5

A method of fabricating an integrated semiconductor circuit device, comprising preparing a photomask which is preliminarily provided with a pattern representative of at least one registration mark to be formed on said semiconductor wafer. forming at least one target mark on a semiconductor wafer by irradiating the semiconductor wafer with an electron beam, forming a first layer of a circuit pattern and at least one registration mark on a semiconductor wafer by irradiating the semiconductor wafer with light through a photomask positioned on the wafer by using said target mark as a reference for correctly positioning the photomask with respect to the wafer, forming at least one additional semiconductor layer on said wafer, irradiating said additional semiconductor layer with an electron beam by using said registration mark as a reference for locating the circuit pattern correctly on the semiconductor wafer, and preparing a photomask which is preliminarily provided with a pattern representative of at least one registration mark to be formed on said semiconductor wafer.

Claim 6

A method of fabricating an integrated semiconductor circuit device, comprising preparing a photomask which is preliminarily provided with a pattern representative of at least one registration mark to be formed on said semiconductor wafer. forming at least one target mark on a semiconductor wafer by irradiating the semiconductor wafer with an electron beam, forming a first layer of a circuit pattern and at least one registration mark on a semiconductor wafer by irradiating the semiconductor wafer with light through a photomask positioned on the wafer by using said target mark as a reference for correctly positioning the photomask with respect to the wafer, forming at least one additional semiconductor layer on said wafer, irradiating said additional semiconductor layer with an electron beam by using said registration mark as a reference for locating the circuit pattern correctly on the semiconductor wafer, and preparing a photomask which is preliminarily provided with a pattern representative of at least one registration mark to be formed on said semiconductor wafer.